Patents by Inventor Toshihiro Aoshima
Toshihiro Aoshima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230227375Abstract: According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.Type: ApplicationFiled: March 7, 2023Publication date: July 20, 2023Inventors: Junichi IWASAWA, Toshihiro AOSHIMA
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Patent number: 11623898Abstract: According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.Type: GrantFiled: January 14, 2019Date of Patent: April 11, 2023Assignee: Toto Ltd.Inventors: Junichi Iwasawa, Toshihiro Aoshima
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Patent number: 10759710Abstract: Disclosed is provision of a ceramic coat having an excellent low-particle generation as well as a method for assessing the low-particle generation of the ceramic coat. A composite structure including a substrate and a structure which is formed on the substrate and has a surface, wherein the structure includes a polycrystalline ceramic and the composite structure has luminance Sa satisfying a specific value calculated from a TEM image analysis thereof, can be suitably used as an inner member of a semiconductor manufacturing apparatus required to have a low-particle generation.Type: GrantFiled: March 8, 2019Date of Patent: September 1, 2020Assignee: Toto Ltd.Inventors: Junichi Iwasawa, Hiroaki Ashizawa, Takuma Wada, Ryoto Takizawa, Toshihiro Aoshima, Yuuki Takahashi, Atsushi Kinjo
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Publication number: 20190276368Abstract: Disclosed is provision of a ceramic coat having an excellent low-particle generation as well as a method for assessing the low-particle generation of the ceramic coat. A composite structure including a substrate and a structure which is formed on the substrate and has a surface, wherein the structure includes a polycrystalline ceramic and the composite structure has luminance Sa satisfying a specific value calculated from a TEM image analysis thereof, can be suitably used as an inner member of a semiconductor manufacturing apparatus required to have a low-particle generation.Type: ApplicationFiled: March 8, 2019Publication date: September 12, 2019Inventors: Junichi IWASAWA, Hiroaki ASHIZAWA, Takuma WADA, Ryoto TAKIZAWA, Toshihiro AOSHIMA, Yuuki TAKAHASHI, Atsushi KINJO
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Publication number: 20190144347Abstract: According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.Type: ApplicationFiled: January 14, 2019Publication date: May 16, 2019Inventors: Junichi IWASAWA, Toshihiro AOSHIMA
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Patent number: 10221105Abstract: According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.Type: GrantFiled: December 27, 2013Date of Patent: March 5, 2019Assignee: Toto Ltd.Inventors: Junichi Iwasawa, Toshihiro Aoshima
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Publication number: 20160332921Abstract: According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.Type: ApplicationFiled: December 27, 2013Publication date: November 17, 2016Applicant: TOTO LTD.Inventors: Junichi IWASAWA, Toshihiro AOSHIMA
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Patent number: 9153417Abstract: It is an object of the present invention to provide a back scattered electron detector suitable for implementing a method for determining beforehand in which region of a sample an X-ray detector can obtain an accurate X-ray detection image and perform an appropriate analysis. A Coax-BSE detector which is a back scattered electron detector includes a BSE element, a support member that supports the BSE element, and a fixing member to fix the support member to the X-ray detector, in which the fixing member fixes the support member by clamping a side portion on the distal end side which is an X-ray receiving side of a housing that covers the X-ray detector.Type: GrantFiled: May 24, 2014Date of Patent: October 6, 2015Assignees: TOTOLTD., Hitachi High-Technologies CorporationInventor: Toshihiro Aoshima
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Patent number: 9053902Abstract: In order to provide a charged-particle radiation apparatus capable of evaluating and distinguishing the analysis position in a sample subjected to X-ray analysis in the stage before performing X-ray elemental analysis, and also making it possible for an analyst to perform, in a short period of time and without reworking, analysis for which high reliability is ensured, the present invention provides a charged-particle radiation apparatus provided with an X-ray detector, wherein a first back scattered electron detector (15) on the same axis as the X-ray detection surface of the X-ray detector (12 (25-30)) is disposed integrally with or independently from the X-ray detector (12), an X-ray signal being detected by the X-ray detector (12) simultaneously with or separately from detection of a back scattered electron signal by the first back scattered electron detector (15).Type: GrantFiled: November 12, 2012Date of Patent: June 9, 2015Assignees: Hitachi High-Technologies Corporation, TOTO LTD.Inventors: Yuta Ebine, Shinichi Tomita, Sukehiro Ito, Toshihiro Aoshima
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Patent number: 9030798Abstract: An electrostatic chuck comprises: a dielectric substrate having a protrusion and a planar surface part. The protrusion is formed on a major surface of the dielectric substrate. An adsorption target material is mounted on the major surface. The planar surface part is formed in a periphery of the protrusion. The dielectric substrate is formed from a polycrystalline ceramics sintered body. A top face of the protrusion is a curved surface, and a first recess is formed in the top face to correspond to crystal grains that appear on the surface. The planar surface part has a flat part, and a second recess is formed in the flat part. A depth dimension of the first recess is greater than a depth dimension of the second recess. The electrostatic chuck can suppress the generation of particles and can easily recover a clean state of the electrostatic chuck surface.Type: GrantFiled: August 11, 2011Date of Patent: May 12, 2015Assignee: Toto Ltd.Inventors: Kaduko Ishikawa, Junji Yonezawa, Toshihiro Aoshima, Yoshihide Hayashida
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Patent number: 8971010Abstract: An electrostatic chuck comprises: a dielectric substrate having a protrusion and a planar surface part. The protrusion is formed on a major surface of the dielectric substrate. An adsorption target material is mounted on the major surface. The planar surface part is formed in a periphery of the protrusion. The dielectric substrate is formed from a polycrystalline ceramics sintered body. A top face of the protrusion is a curved surface, and a first recess is formed in the top face to correspond to crystal grains that appear on the surface. The planar surface part has a flat part, and a second recess is formed in the flat part. A depth dimension of the first recess is greater than a depth dimension of the second recess. The electrostatic chuck can suppress the generation of particles and a method for manufacturing the electrostatic chuck is provided.Type: GrantFiled: August 11, 2011Date of Patent: March 3, 2015Assignee: Toto Ltd.Inventors: Kaduko Ishikawa, Junji Yonezawa, Toshihiro Aoshima
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Publication number: 20140339436Abstract: It is an object of the present invention to provide a back scattered electron detector suitable for implementing a method for determining beforehand in which region of a sample an X-ray detector can obtain an accurate X-ray detection image and perform an appropriate analysis. A Coax-BSE detector which is a back scattered electron detector includes a BSE element, a support member that supports the BSE element, and a fixing member to fix the support member to the X-ray detector, in which the fixing member fixes the support member by clamping a side portion on the distal end side which is an X-ray receiving side of a housing that covers the X-ray detector.Type: ApplicationFiled: May 24, 2014Publication date: November 20, 2014Inventor: Toshihiro Aoshima
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Publication number: 20140284477Abstract: In order to provide a charged-particle radiation apparatus capable of evaluating and distinguishing the analysis position in a sample subjected to X-ray analysis in the stage before performing X-ray elemental analysis, and also making it possible for an analyst to perform, in a short period of time and without reworking, analysis for which high reliability is ensured, the present invention provides a charged-particle radiation apparatus provided with an X-ray detector, wherein a first back scattered electron detector (15) on the same axis as the X-ray detection surface of the X-ray detector (12 (25-30)) is disposed integrally with or independently from the X-ray detector (12), an X-ray signal being detected by the X-ray detector (12) simultaneously with or separately from detection of a back scattered electron signal by the first back scattered electron detector (15)Type: ApplicationFiled: November 12, 2012Publication date: September 25, 2014Inventors: Yuta Ebine, Shinichi Tomita, Sukehiro Ito, Toshihiro Aoshima
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Publication number: 20130201598Abstract: An electrostatic chuck comprises: a dielectric substrate having a protrusion and a planar surface part. The protrusion is formed on a major surface of the dielectric substrate. An adsorption target material is mounted on the major surface. The planar surface part is formed in a periphery of the protrusion. The dielectric substrate is formed from a polycrystalline ceramics sintered body. A top face of the protrusion is a curved surface, and a first recess is formed in the top face to correspond to crystal grains that appear on the surface. The planar surface part has a flat part, and a second recess is formed in the flat part. A depth dimension of the first recess is greater than a depth dimension of the second recess. The electrostatic chuck can suppress the generation of particles and a method for manufacturing the electrostatic chuck is provided.Type: ApplicationFiled: August 11, 2011Publication date: August 8, 2013Applicant: TOTO LTD.Inventors: Kaduko Ishikawa, Junji Yonezawa, Toshihiro Aoshima
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Publication number: 20130201597Abstract: An electrostatic chuck comprises: a dielectric substrate having a protrusion and a planar surface part. The protrusion is formed on a major surface of the dielectric substrate. An adsorption target material is mounted on the major surface. The planar surface part is formed in a periphery of the protrusion. The dielectric substrate is formed from a polycrystalline ceramics sintered body. A top face of the protrusion is a curved surface, and a first recess is formed in the top face to correspond to crystal grains that appear on the surface. The planar surface part has a flat part, and a second recess is formed in the flat part. A depth dimension of the first recess is greater than a depth dimension of the second recess. The electrostatic chuck can suppress the generation of particles and can easily recover a clean state of the electrostatic chuck surface.Type: ApplicationFiled: August 11, 2011Publication date: August 8, 2013Applicant: TOTO LTD.Inventors: Kaduko Ishikawa, Junji Yonezawa, Toshihiro Aoshima, Yoshihide Hayashida
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Publication number: 20090284893Abstract: An electrostatic chuck of the invention includes a ceramic dielectric made of a sintered body containing alumina and titanium oxide, with maximum particle size of segregation bodies of titanium compounds being smaller than average particle size of alumina, the ceramic dielectric having a volume resistivity of 108 ?cm or more and 1013 ?cm or less at room temperature.Type: ApplicationFiled: May 11, 2009Publication date: November 19, 2009Applicant: Toto Ltd.Inventors: Masami Ando, Toshihiro Aoshima
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Patent number: 6699606Abstract: A sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body. The surface glaze layer has a center line average roughness Ra of less than 0.07 &mgr;m as measured with a stylus type surface roughness tester according to JIS B 0651-1996.Type: GrantFiled: February 5, 2003Date of Patent: March 2, 2004Assignee: Toto Ltd.Inventors: Mitsuyoshi Machida, Koichi Hayashi, Hirotaka Ishibashi, Tomoyasu Ichiki, Masaaki Ito, Masami Ando, Atsushi Kitamura, Toshihiro Aoshima, Katsuhiro Kawakami, Satoshi Horiuchi, Makoto Hayakawa
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Publication number: 20030134107Abstract: A sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body. The surface glaze layer has a center line average roughness Ra of less than 0.07 &mgr;m as measured with a stylus type surface roughness tester according to JIS B 0651-1996.Type: ApplicationFiled: February 5, 2003Publication date: July 17, 2003Inventors: Mitsuyoshi Machida, Koichi Hayashi, Hirotaka Ishibashi, Tomoyasu Ichiki, Masaaki Ito, Masami Ando, Atsushi Kitamura, Toshihiro Aoshima, Katsuhiro Kawakami, Satoshi Horiuchi, Makoto Hayakawa
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Patent number: 6548162Abstract: Sanitary wares having a controlled surface are disclosed which are less likely to be stained or soiled and/or possess excellent gloss. The first sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body, wherein the surface glaze layer has a center line average roughness Ra of less than 0.07 &mgr;m. This sanitary ware is advantageous in that stains or soils are much less likely to be adhered to the surface thereof and, even when adhered to the surface thereof, can be removed by a weak water stream. The second sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body, wherein the surface glaze layer has a kurtosis Rku of less than 2.70. This sanitary ware advantageously possesses excellent surface gloss.Type: GrantFiled: January 27, 2000Date of Patent: April 15, 2003Assignee: Toto Ltd.Inventors: Mitsuyoshi Machida, Koichi Hayashi, Hirotaka Ishibashi, Tomoyasu Ichiki, Masaaki Ito, Masami Ando, Atsushi Kitamura, Toshihiro Aoshima, Katsuhiro Kawakami, Satoshi Horiuchi, Makoto Hayakawa