Patents by Inventor Toshikazu Nishide

Toshikazu Nishide has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6110269
    Abstract: The invention relates to a coating liquid for forming a hydrophilic film. This coating liquid comprises a first sol which is a titania sol; and a second sol which is at least one of a silica sol and an alumina sol. This titania sol is prepared by a method comprising the sequential steps of (a) mixing a first solution containing a titanium alkoxide with a diol represented by at least one of the following general formulas (1) and (2), thereby to prepare a second solution containing a titanium complex formed by a reaction of the titanium alkoxide with the diol; and (b) hydrolyzing the titanium complex in the second solution, thereby to prepare the titania sol. The coating liquid is stable or sufficiently long in pot life, and the hydrophilic film has a long time duration in hydrophilicity and a superior abrasion resistance. ##STR1## wherein R.sub.1 is H or C.sub.p H.sub.2p+1 where p is from 1 to 5, R.sub.2 is C.sub.q H.sub.2q+1 where q is from 1 to 5, R.sub.3 is C.sub.r H.sub.2r where r is from 1 to 3, R.sub.
    Type: Grant
    Filed: January 23, 1998
    Date of Patent: August 29, 2000
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Satoko Sugawara, Toshikazu Nishide, Takashi Seino, Yasuaki Kai
  • Patent number: 5266358
    Abstract: The disclosure relates to a metal oxide film formed on a glass substrate by a sol-gel method using a solution of at least one metal alkoxide or acetylacetonate. Water which is in the amount ranging from 50 to 400 mol % of the at least one metal alkoxide or acetylacetonate, an organic solvent and a catalyst are added to the solution, thereby to form a first sol. To afford water repellency to the oxide film, a fluoroalkylsilane in the amount more than 0.30 mol % of and less than 3.0 mol % of the at least one metal alkoxide or acetylacetonate, or an alkylsilane compound in the amount more than 4.0 mol % of and less than 20 mol % of the at least one metal alkoxide or acetylacetonate, is added to the first sol, thereby forming a second sol. The concentration of the at least one metal alkoxide or acetylacetonate in the second sol is adjusted to fall within the range from 0.005 to 3.0 mol %. The second sol is applied to the glass substrate to form a gel film.
    Type: Grant
    Filed: June 2, 1992
    Date of Patent: November 30, 1993
    Assignee: Nissan Motor Company, Ltd.
    Inventors: Ryuzo Uemura, Toshikazu Nishide, Ichiro Nakamura
  • Patent number: 4467029
    Abstract: A silver halide light-sensitive photographic material comprises a support and a Lippmann emulsion layer on the support containing a silver halide and at least one compound of the following formula in a quantity of at least 3.5.times.10.sup.-3 mole per mole of the silver halide of the Lippmann emulsion layer: ##STR1## wherein Z represents an atomic group necessary to form a heterocyclic ring; Y is a hydrogen atom or --S--R.sub.1 group; R and R.sub.1 are each a hydrogen atom, an alkali-metal atom, ammonium or an alkyl group; X and X.sub.1 are each a divalent organic group; m and m.sub.1 are each 0 or 1; and n is an integer of up to 3, provided if n is 0, Y is --S--R.sub.1 group.The silver halide light-sensitive photographic material is developed in a developer containing at least 0.6 mole per liter of sulfurous ions.
    Type: Grant
    Filed: March 8, 1983
    Date of Patent: August 21, 1984
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Toshikazu Nishide, Akio Kobayashi, Tamio Kitahata