Abstract: A plurality of liquid crystal modules is vertically and horizontally arranged, each of which is supplied light by a light source via optical fibers. A screen can be wound up at a cabinet. An image from each of the plurality of liquid crystal modules does not interfere one another because a light shielding board is installed.

Abstract: A dichroic mirror for reflecting red light for optical separating and a dichroic mirror for reflecting red light for optical synthesizing are installed on the same plane in an image generating apparatus of the present invention. In addition, a dichroic mirror for reflecting blue light for optical separating and a dichroic mirror for reflecting blue light for optical synthesizing are installed on the same plane. Accordingly, a compact configuration can be realized. Since a main reflecting mirror is a rotating elliptic mirror and a lamp is located on a focus or around the focus, a lighting equipment which irradiates conic luminous flux can be realized.

Abstract: A spatial frequency filter used in a pattern defect detection device, including a pattern which includes a black spot having a diameter expanded by a controlled amount in comparison with the diameter of a black spot on a photosensitive plate obtained by exposure by diffracted light from a pattern on a model specimen.

Abstract: This invention relates to a method and apparatus for analyzing a plurality of elements that are present on the surface of a material of interest or in its neighborhood, as well as a thin-film forming apparatus that is capable of measuring the composition of a sample during thin film formation in the process of semi-conductor fabrication. The apparatus are characterized in that a detector is isolated from the light and heat generated in a sample making mechanism by means of a shield which is not only heat-resistant but also transmissive of fluorescent X-ray containing soft X-rays of 1 Kev and below and that a mirror for total reflection of X-rays which is equipped with slits capable of adjusting the incident and exit angles of fluorescent X-rays from the sample excited with an excitation source as well as the ranges of those angles is provided either at the entrance or exit of said shield or at both.

Abstract: A spatial frequency filter used in a pattern defect detection device, including a pattern which includes a black spot having a diameter expanded by a controlled amount in comparison with the diameter of a black spot on a photosensitive plate obtained by exposure by diffracted light from a pattern on a model specimen

Abstract: An inspection device for detecting defects in a periodic pattern on a semiconductor wafer includes a laser oscillator. In the exposure process, light emitted from the laser oscillator is divided into a subject beam and a reference beam. The subject beam is guided to a semiconductor wafer having a periodic pattern thereon by mirrors and a beam expander. The light scattered from the specimen is collected by a lens on a photographic plate. The reference beam is guided to the photographic plate via a second beam expander and another mirror. The intensity of the reference beam is adjusted to a level at which the reference beams interferes on the photographic plate with the light scattered from defects in the periodic pattern and collected by the lens. Thus, a hologram of the defects in the pattern is recorded on the photographic plate. After development, the photographic plate is returned to its original position and used to form a holographic image of the defects with a transmitted regeneration light beam.

Abstract: A fine-particle measuring apparatus designed to measure fine particles attached to the surface of a substrate of a semiconductor device set in a processing unit for formation of films, etching, cleaning, etc. and fine particles suspended in the space above the substrate surface by the use of scattering of a laser beam caused by these fine particles.

Abstract: A fine-particle measuring apparatus designed to measure fine particles attached to the surface of a substrate for a semiconductor device set in a processing unit for formation of films, etching, cleaning, etc. and fine particles suspended in the space above the substrate surface by the use of scattering of a laser beam caused by these fine particles. The measuring apparatus comprises a laser beam scanning mechanism for irradiating a measuring space with a laser beam the angular position of which is minutely modulated at a predetermined frequency, a photodetector which receives light scattered by a fine particle and converts the received light into an electrical signal, and a signal processor which extracts from the electrical signal output by the photodetector a signal component whose frequency is the same as or double that of a modulating signal for the minute scanning with the laser beam and which has a constant phase difference in terms of time with respect to the modulating signal.

Abstract: A measuring apparatus for measuring a physical property of a substance using radiation has a source of radiation for irradiating the substance, a radiation detector which is disposed on the opposite side of the substance from the radiation source, a mask for allowing radiaton to enter the radiation detector only along n prescribed pathways, and a signal processing and calculating device for calculating the physical property of the substance based on the radiation which is incident upon the radiation detector. The mask has n different mask patterns each comprising a plurality of pattern elements which allow the passage of radiation and which can be positioned between the substance and the radiation detector in alignment with the radiation pathways.

Abstract: A method of imaging an object by the ultrasonic or electromagnetic wave by mechanically or electronically scanning the ultrasonic or electromagnetic wave transmitting/receiving system to transmit the ultrasonic or electromagnetic wave beam spreading in space of the object and using the trace (TOF locus) from the transmission to the reception while receiving the reflected wave from the object, and sequentially reproducing the line image at the central line of the synthetic aperture range using the received signal group from the scanning points in the synthetic aperture range to sequentially image the area to be imaged while scanning the ultrasonic or electromagnetic wave transmitting/receiving system. An imaging apparatus applied with the method has a relatively simple hardware structure for reproducing the image and is also able to perform the operation in real time.

Abstract: An apparatus for determining the mass of each of the constituents of a substance to be measured, per unit volume of the same, is disclosed. The apparatus includes a detector disposed at the position to receive energy of back scattered photons produced by a radiation directed on a substance to be measured and systems of measurement, which are smaller in number by one than the kinds of the constituents under investigation, and the signal from the detector is processed for measuring intensity of the energy components unique to each of the constituents.

Abstract: The gas and water content of crude oil flowing through a pipeline is measured using a flow restriction in the pipeline, a radioactive source for providing separate radiation energies for each component to be measured, a detector for detecting the radiation transmitted by the various components to generate a first set of signals, pressure gauges upstream of and in the flow restriction for providing a second set of signals, and a signal processor for correlating the signals to provide mass flowrate values indicative of the relative proportions of the components of the mixture. The temperature of the mixture in the flow restriction can also be measured and fed to the signal processor for ensuring that accurate values of flowrate are obtained when temperatures vary.

Abstract: A loop is constructed in which an output of a two-dimensional integrator is fed back through an exponential function unit for each pixel of a picture signal, a difference between the output and an input picture signal of the corresponding pixel of a next frame is taken and the difference is input to the corresponding element of the two-dimensional integrator, whereby relative standard deviations of quantum noise of an output picture are made constant at all positions of a screen.

Abstract: A neutron ionization chamber of the gamma ray compensation type comprises a neutron-sensing ionization chamber portion having an electrode surface coated with a material for sensing neutrons, a gamma ray-sensing ionization chamber portion which has a low neutron sensitivity in comparison with the neutron sensitivity of said neutron-sensing material, a device for substracting ionization currents in the gamma ray-sensing ionization chamber portion from ionization currents in the neutron-sensing ionization chamber portion, and a coating material which is coated on an electrode surface of the gamma ray-sensing ionization chamber portion, the coating material including a material for sensing neutrons the percentage of which is less than the the percentage of the neutron sensing material of the neutron sensing ionization chamber portion.

Abstract: A method of improving the radiation resistant characteristic of a BF.sub.3 proportional counter, comprising a tube having electrodes provided thereon and BF.sub.3 gas filled therein, by subjecting the counter before use to any one of 10.sup.4 -2.times.10.sup.5 R gamma ray, 10.sup.4 -2.times.10.sup.5 R X-ray, or 10.sup.10 -10.sup.11 nvt thermal neutron with a direct current high voltage applied between the above stated electrodes. The counter thus adapted exhibits little deterioration even in the surroundings of strong gamma ray, X-ray, and thermal neutron flux, and can maintain a stable operation. In particular, since the upper limit of the radiation amount in the process of improving the radiation resistant characteristic is set at a low value, the remaining life of the BF.sub.3 proportional counter is not shortened unduely.

Abstract: An improved long operating lifetime ionization chamber type neutron detector for use within a nuclear reactor. The chamber contains uranium U-235 as the neutron sensitive material and helium or argon fill gas. The atom rate of U-235 to fill gas is from 0.45 to 1.8 for helium, and 2.3 to 9 for argon.

Abstract: An ionization chamber comprises a plurality of cylindrical electrodes which are coaxially arranged, and a casing which holds the cylindrical electrodes in it under the condition allowing the axial shifting of the edges of the cylindrical electrodes but preventing the radial shifting of the cylindrical electrodes whereby the slight relative deviation of parts for the ionization chamber can be minimized during use at high temperature or during a severe thermal cycle.

Abstract: A gamma-ray compensated ionization chamber having cylindrical multiplex electrodes comprises first cylindrical multiplex electrodes and second cylindrical multiplex electrodes being arranged in reverse orders to that of the first cylindrical multiplex electrodes in the longitudinal direction of the cylindrical electrodes to prevent the deterioration of compensating characteristics caused by the variation of an external temperature and variation of gamma-ray spectrum.