Patents by Inventor Toshimi Aoyama
Toshimi Aoyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20010033981Abstract: The present invention provides a photosensitive resin composition which comprises an urethane resin obtained by reacting (A) a carboxyl group-containing polymer having an acid value of 30 mg KOH/g or more and a glass transition temperature of 30° C. or more, (B) a compound having two isocyanate groups in one molecule, (C) a compound having two hydroxyl groups in one molecule and (D) a photopolymerizable unsaturated monomer having one hydroxyl group in one molecule, and a photopolymerization initiator, and a resin plate for flexography using the photosensitive resin composition, whereby the photosensitive resin composition having water developing properties, high in sensitivity and impact resilience, and excellent in water resistance, ink resistance and press life of a hardened portion forming a line pattern area of a printing plate material and the resin plate for flexography prepared by the use of the photosensitive resin composition can be provided.Type: ApplicationFiled: June 5, 2001Publication date: October 25, 2001Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Toshiya Takagi, Koji Kahara, Toshimi Aoyama, Nobuhiro Kobayashi, Masatoshi Yoshida
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Patent number: 6291133Abstract: The present invention provides a photosensitive resin composition which comprises an urethane resin obtained by reacting (A) a carboxyl group-containing polymer having an acid value of 30 mg KOH/g or more and a glass transition temperature of 30° C. or more, (B) a compound having two isocyanate groups in one molecule, (C) a compound having two hydroxyl groups in one molecule and (D) a photopolymerizable unsaturated monomer having one hydroxyl group in one molecule, and a photopolymerization initiator, and a resin plate for flexography using the photosensitive resin composition, whereby the photosensitive resin composition having water developing properties, high in sensitivity and impact resilience, and excellent in water resistance, ink resistance and press life of a hardened portion forming a line pattern area of a printing plate material and the resin plate for flexography prepared by the use of the photosensitive resin composition can be provided.Type: GrantFiled: May 25, 1999Date of Patent: September 18, 2001Assignees: Tokyo Ohka Kogyo Co. Ltd., Nippon Shokubai Co. Ltd.Inventors: Toshiya Takagi, Toshimi Aoyama, Koji Kahara, Nobuhiro Kobayashi, Masatoshi Yoshida
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Patent number: 6010824Abstract: A photosensitive resin composition comprising a polymeric binder, an ethylenically unsaturated monomer and a photopolymerization initiator is disclosed. Also, a PS plate using the same is disclosed. The photopolymerization initiator comprises at least one compound selected from specific triazine compounds having a bromine atom on the substituted phenyl nucleus thereof and specific trihalomethyl-containing triazine compounds. The composition has high photosensitivity sufficient for exposure with an argon laser light and satisfactory developability. Additionally disclosed is a photosensitive resin composition comprising a polymeric binder, a monomer having an ethylenically unsaturated double bond and photopolymerization initiators including an acridine compound and a specific triazine compound. This second photosensitive resin composition has high sensitivity, high resolution and a wide development margin.Type: GrantFiled: July 8, 1997Date of Patent: January 4, 2000Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Hiroshi Komano, Takeshi Iwai, Katsuyuki Ohta, Toshimi Aoyama, Kiyoshi Uchikawa
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Patent number: 5645974Abstract: Compositions comprising a linear base polymer, an ethylenically unsaturated addition-polymerizable compound and a combination of (A) a 1-benzoyl-1-amino-substituted-1-benzylalkane with (B) an .alpha.-phenyl-.alpha.,.alpha.-dialkoxyacetophenone as photopolymerization initiator are suitable for the production of thick-film printing plates.Type: GrantFiled: April 22, 1996Date of Patent: July 8, 1997Assignees: Tokyo Ohka Kogyo, K.K., Ciba-Geigy CorporationInventors: Katsuyuki Ohta, Toshiya Takagi, Toshimi Aoyama
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Patent number: 5545281Abstract: An integrated circuit connecting method that includes connecting electrode pads on an integrated circuit device to electrode terminals on a base with metal bumps interposed, the electrode terminals being formed in registry with the electrode pads.Type: GrantFiled: March 25, 1994Date of Patent: August 13, 1996Assignees: NEC Corporation, Tokyo Ohka Kogyo Co., Ltd.Inventors: Koji Matsui, Mitsuru Kimura, Kazuaki Utsumi, Eiichi Ogawa, Hiroshi Komano, Toshimi Aoyama
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Patent number: 5541038Abstract: Compositions comprising a linear base polymer, an ethylenically unsaturated addition-polymerizable compound and a combination of (A) a 1-benzoyl-1-amino-substituted-1-benzylalkane with (B) an .alpha.-phenyl-.alpha.,.alpha.-dialkoxyacetophenone as photopolymerization initiator are suitable for the production of thick-film printing plates.Type: GrantFiled: April 5, 1995Date of Patent: July 30, 1996Assignees: Ciba-Geigy Corporation, Tokyo Ohka Kogyo, K.K.Inventors: Katsuyuki Ohta, Toshiya Takagi, Toshimi Aoyama
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Patent number: 5498498Abstract: Disclosed is a photosensitive resin composition for use in a light-shielding film, comprising a photosensitive resin and a light-shielding coloring material, wherein light transmission properties after formation of the light-shielding film are controlled by the light-shielding coloring material so that (i) the light transmission through the light-shielding film is 1% or more in at least one wavelength of a light wavelength region of from 330 nm to less than 425 nm, and (ii) the light transmission through the light-shielding film is 2% or less in a light wavelength region of from 425 to 650 nm.Type: GrantFiled: August 1, 1994Date of Patent: March 12, 1996Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Kiyoshi Uchikawa, Hiroshi Komano, Toshimi Aoyama, Katsuyuki Ohta
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Patent number: 5368991Abstract: Disclosed is a photosensitive resin composition for use in a light-shielding film, comprising a photosensitive resin and a light-shielding coloring material, wherein light transmission properties after formation of the light-shielding film are controlled by the light-shielding coloring material so that (i) the light transmission through the light-shielding film is 1% or more in at least one wavelength of a light wavelength region of from 330 nm to less than 425 nm, and (ii) the light transmission through the light-shielding film is 2% or less in a light wavelength region of from 425 to 650 nm.Type: GrantFiled: July 21, 1993Date of Patent: November 29, 1994Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Kiyoshi Uchikawa, Hiroshi Komano, Toshimi Aoyama, Katsuyuki Ohta
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Patent number: 5318651Abstract: A method of bonding first and second circuit boards includes applying a light-sensitive adhesive over the first electrodes on a first circuit board and the areas where the first electrodes are not formed, and drying the applied adhesive to form a light-sensitive adhesive layer having the light-sensitive adhesive layer exposed selectively to active rays of light and performing development to remove only the light-sensitive adhesive layer on the first electrodes, and then performing a heat treatment to impart bonding quality to the light-sensitive adhesive layer remaining between adjacent first electrodes, placing the first and second circuit boards one on top of the other and thermocompressing the two circuit boards to have the first electrodes connected electrically to the second electrodes to form a single circuit board; and performing a heat treatment and/or exposure to active rays of light on the formed single circuit board.Type: GrantFiled: November 19, 1992Date of Patent: June 7, 1994Assignees: Nec Corporation, Tokyo Ohka Kogyo Co., Ltd.Inventors: Koji Matsui, Mitsuru Kimura, Kazuaki Utsumi, Eiichi Ogawa, Hiroshi Komano, Toshimi Aoyama
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Patent number: 5185235Abstract: The remover solution of the invention comprises (A) from 35 to 80% by weight of an alcoholic solvent such as ethylene glycol monoethyl ether, (B) from 10 to 40% by weight of an organic solvent which is a halogenated hydrocarbon solvent, e.g., 1,2-dichlorobenzene and methylene chloride, an ether solvent, e.g., tetrahydrofuran, or an aromatic solvent, e.g., benzene and xylene, and (C) from 0.1 to 25% by weight of a quaternay ammonium compound such as tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxide. Different from conventional remover solutions which only can swell cured photoresist compositions, the inventive remover solution has a power to completely dissolve a cured photoresist layer to give a quite satisfactory result in the removing works of patterned photoresist layers in the manufacture of semiconductor devices.Type: GrantFiled: March 30, 1990Date of Patent: February 9, 1993Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Hiromitsu Sato, Kenji Tazawa, Toshimi Aoyama
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Patent number: 5087552Abstract: The invention provides a photosensitive resin composition useful as a solder resist, etching resist or plating resist in the manufacture of printed circuit boards to exhibit excellent resistance against heat and chemicals and good adhesion to the substrate surface. The composition essentially comprises (a) a copolymeric resin of an .alpha.,.beta.-unsaturated dicarboxylic acid anhydride and an ethylenically unsaturated polymerizable compound, of which the acid anhydride units are partially esterified with an unsaturated alcohol and a saturated alcohol, and (b) a photopolymerization initiator. The composition may further comprise optional ingredients such as (c) a photopolymerizable monomeric compound, (d) an epoxy-based resin and (e) an aromatic diamine compound.Type: GrantFiled: October 13, 1989Date of Patent: February 11, 1992Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoki Horigome, Kenji Tazawa, Toshimi Aoyama
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Patent number: 4933260Abstract: A water-based photopolymerizable resin composition is disclosed which is suitable for the preparation of a relief printing plate by the photolithographic techniques. The inventive composition, which basically comprises a water-soluble polymer, e.g., poly(vinyl alcohol), a photopolymerizable monomer and a photopolymerization initiator, is characterized in that at least a part of the photopolymerizable monomer is N-tetrahydrofurfuryloxymethyl acrylamide or N-tetrahydrofurfuryloxymethyl methacrylamide. By virtue of this unique ingredient in the composition, the printing plate prepared from the inventive composition is imparted with improved fidelity of pattern reproduction and durability in printing as a consequence of increased hardness and pliability to be freed from the drawback of crack formation in printing even on a cylinder of small diameter under a cold and low-humidity condition.Type: GrantFiled: August 31, 1989Date of Patent: June 12, 1990Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Naoya Katsumata, Syunzi Nakazato, Katsuyuki Ohta, Toshimi Aoyama
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Patent number: 4767642Abstract: This invention is a method for preventing sticking of a resin plate surface by coating the solution of binder and photopolymerizable monomer on the surface of a photosensitive resin composed of binder, photopolymerizable monomer, and photopolymerization initiator, developing relief images by a photomechanical process, and then by drying the coating solution.Type: GrantFiled: February 10, 1987Date of Patent: August 30, 1988Assignee: Photopoly Ohka Co., Ltd.Inventors: Takaaki Shimizu, Katsuyuki Ota, Toshimi Aoyama, Setsuo Nojima
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Patent number: 4557996Abstract: The invention provides an improved method for the so-called dry-film process for forming a pattern-wise photoresist layer on the substrate surface in which a substrate is overlaid and laminated with a preformed film of a photosensitive composition called a dry film and photolithographically processed. In the inventive method, different from conventional dry-film processes, the substrate plate is first provided with a protecting layer of a photosensitive composition containing a halation inhibitor and the lamination with a dry film is performed without removing the protecting layer. After pattern-wise exposure to light, development of the photosensitive layer is undertaken by use of a developer solvent capable of dissolving both of the protecting layer and the pattern-forming layer. Despite the intervention of the protecting layer, the resolving power and image reproducibility are excellent.Type: GrantFiled: May 29, 1984Date of Patent: December 10, 1985Assignee: Photopoly Ohka Co., Ltd.Inventors: Toshimi Aoyama, Hiroyuki Tohda, Kazuo Kato, Hisashi Nakane
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Patent number: 4384011Abstract: A process for producing novel resinous gravure printing plates comprises coating on a printing substrate such as a cylinder a radiation-curable resin coating composition containing in a specific ratio a soluble polyamide resin and a radiation-polymerizable monomer or the like dissolved in a solvent, curing the coated film by irradiation with actinic rays, and engraving the resulting cured film. As a result, a novel resinous gravure printing plate having excellent engraving property, printing durability, and solvent resistance is produced.Type: GrantFiled: September 14, 1981Date of Patent: May 17, 1983Assignees: Dai Nippon Insatsu Kabushiki Kaisha, Tokyo Ohka Kogyo Kabushiki KaishaInventors: Toshimi Aoyama, Bonpei Kato, Hiroyuki Tohda, Eiichi Tachibana, Shinichi Hikosaka
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Patent number: 4209581Abstract: A photocurable soluble resin suitable for manufacturing photosensitive resin plates obtained by polycondensing an alkylol derivative or an alkylated alkylol derivative of urea or thiourea with an N-alkylolacrylamide or N-alkylolmethacrylamide in the presence of an acid or an ammonium salt thereof or by reacting urea or thiourea with formaldehyde to form a linear polycondensation product and then grafting an N-alkylolacrylamide or N-alkylolmethacrylamide on the linear polycondensation product in the presence of an acid or an ammonium salt thereof. This soluble resin is incorporated with known soluble resins such as soluble nylon, photosensitizers and thermal polymerization inhibitors and mixed thoroughly to obtain a soluble photosensitive resin composition.Type: GrantFiled: September 25, 1978Date of Patent: June 24, 1980Assignee: Tokyo Ohka Kogyo Kabushiki KaishaInventors: Hiroshi Takanashi, Toshimi Aoyama, Hisashi Nakane
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Patent number: 4045231Abstract: A photosensitive resin composition for flexographic printing plates comprising styrene-butadiene block copolymer containing 35 - 50% by weight of styrene, at least one liquid prepolymer having a molecular weight of 1,000 - 5,000 selected from the group consisting of polybutadiene and butadiene-styrene copolymer, at least one photopolymerizable monomer containing at least one vinyl group, such as tetraethyleneglycol diacrylate, a photopolymerization initiator such as benzophenone, and a thermopolymerization inhibitor optionally added. This photosensitive resin composition affords relief images suitable for use in flexographic printing.Type: GrantFiled: February 18, 1976Date of Patent: August 30, 1977Assignee: Tokyo Ohka Kogyo Kabushiki KaishaInventors: Hiroyuki Toda, Eiichi Otomegawa, Toshimi Aoyama, Hisashi Nakane