Abstract: An exposure method including the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid arranged between the surface of the object and the final surface of the projection optical system, removing a gas from the fluid having a displaced interface, and projecting a pattern on a mask onto the object via the projection optical system and the fluid.

Abstract: A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, includes a supplier for supplying the resist between the substrate and the mold, and a recovery unit for recovering the resist.

Abstract: A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, includes a supplier for supplying the resist between the substrate and the mold, and a recovery unit for recovering the resist.

Abstract: A tactile-feedback device configured to enable a user to perceive a state of contact with a virtual object includes a plurality of stimulation generating units attached to a user body and a control unit configured to cause the plurality of stimulation generating units to generate stimulations different from each other when the user body is in contact with different surfaces of the virtual object.

Abstract: A plurality of stimulus generators (110), which is used to apply stimuli to the human body, and is laid on the human body of the user, is controlled. A position determination unit (108) determines whether or not a virtual object that forms a virtual space where the user exists is in contact with the human body. When the contact has occurred, a control unit (103) executes drive control of each of a plurality of stimulus generators (110), which are located near a place where the contact is determined, based on the positional relationship between the virtual object and the stimulus generators.

Abstract: A force sense presentation device for presenting a sense of force in virtual space to a user, comprises: a fixed unit which is gripped by the user; a force sense presentation unit which presents a sense of force; an actuator which supplies a driving force and operates the force sense presentation unit relative to the fixed unit; a joint unit which is provided between the fixed unit and the force sense presentation unit, and guides the relative operation of the force sense presentation unit; and a force sense rendering unit which controls the relative operation of the force sense presentation unit by the actuator, wherein the force sense presentation device simulates a device which is gripped and used by the user, and the force sense rendering unit controls the relative operation of the force sense presentation unit based on a position and orientation of the device in the virtual space.

Abstract: The present invention provides a device configured to present the feel of a plane or an object surface to a user using equipment configured to generate physical vibration such as a vibration motor or the like. A plurality of vibration motors including an eccentric rotor are put on a human body, and torque generated at the vibration motor along with an angular velocity fluctuation is provided to a skin surface in the horizontal direction with a different timing. Alternately generating torque by the plurality of vibration motors enables the user to perceive a plane or an object surface.

Abstract: An exposure method including the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid arranged between the surface of the object and the final surface of the projection optical system, removing a gas from the fluid having a displaced interface, and projecting a pattern on a mask onto the object via the projection optical system and the fluid.

Abstract: An exposure apparatus for scanning an exposure spot in an exposure allocated area and for exposing a desired pattern by controlling power of the exposure spot in accordance with an exposure pattern, includes an exposure unit for arranging plural fine exposure elements, for forming plural exposure spots F1 to F9 on an object to be exposed, and for previously defining the exposure allocated areas SA11 to SA19 respectively corresponding to the plural exposure spots F1 to F9, an exposure allocated area adjuster for adjusting the exposure allocated areas SA12 and SA15 in accordance with directions and sizes of offsets (offset amount vectors V2 and V5) of the exposure spots F2 and F5 from a reference position, and an exposure spot controller for controlling the power of the exposure spot in accordance with the exposure pattern corresponding to actual positions of the exposure spots F1 to F9.

Abstract: An exposure apparatus for exposing a predetermined pattern onto an object via a projection optical system includes a pattern generating unit that includes plural pixels, and generates the predetermined pattern by driving the plural pixels, a measuring unit for measuring at least one of optical performance of the pattern generating unit and a driving state of the plural pixels, and a maintenance unit for maintaining the pattern generating unit based on a measuring result by the measuring unit.

Abstract: A processing method for forming a first pattern on a substrate to which a resist is applied includes the steps of pressing an original having a second pattern that has a relief reverse to that of the first pattern, against the resist on the substrate, and irradiating light onto the resist via the original, wherein a size of a concave of the second pattern is greater than a size of a convex of the first pattern corresponding to the concave of the second pattern, and a size of a convex of the second pattern is smaller than a size of a concave of the first pattern corresponding to the convex of the second pattern.

Abstract: An exposure method includes the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid arranged between the surface of the object and the final surface of the projection optical system, and projecting a pattern on a mask onto the object via the projection optical system and the fluid.

Abstract: An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto an object to be exposed, via a liquid that is filled in a space between said projection optical system and the object, and a removing part for removing an air bubble and/or a foreign particle mixed in the liquid by forming a predetermined flow velocity distribution in the liquid.

Abstract: An exposure method includes the steps of introducing fluid to a space between a surface of an object to be exposed, and a final surface of a projection optical system, projecting a pattern on a mask onto the object via the projection optical system and the fluid, wherein the introducing step includes the steps of filling the fluid in the space between the surface of the object and the final surface of the projection optical system, and wherein the filling step changes a capillary attraction of the fluid different from the capillary attraction that operates during the projection step.

Abstract: Disclosed is a fine pattern forming apparatus and a fine pattern inspecting apparatus. In one preferred form, the fine pattern forming apparatus includes a surface irregularity information reading device for detecting a shape signal corresponding to a surface irregularity of a surface of an original, while scanning the surface by use of a first probe, and a surface irregularity information writing device for processing a substrate to be processed, while scanning a surface of the substrate by use of a second probe, wherein an applied electric voltage to the second probe is changed in accordance with the shape signal while a distance between the second probe and the substrate is kept substantially constant, or the distance between the second probe and the substrate is changed in accordance with the shape signal while the applied electric voltage to the second probe is kept substantially constant, such that the substrate is processed in accordance with the surface irregularity of the original.

Abstract: An exposure apparatus includes a projection optical system for projecting a multigradation pattern onto an object, a spatial modulation element that includes plural, two-dimensionally arranged pixels, and forms an optical image by binary control over each pixel, and a superposing optical system for forming the multigradation pattern by superposing the optical images for each row and/or for each column.

Abstract: An exposure method includes the steps of introducing fluid to a space between a surface of an object to be exposed, and a final surface of a projection optical system, projecting a pattern on a mask onto the object via the projection optical system and the fluid, wherein the introducing step includes the steps of filling the fluid in the space between the surface of the object and the final surface of the projection optical system, and wherein the filling step changes a capillary attraction of the fluid different from the capillary attraction that operates during the projection step.

Abstract: A pattern transferring apparatus is disclosed which can prevent damage to a transferred pattern and realize fast mold release regardless of the type of resist. The pattern transferring apparatus transfers a pattern formed on a mold to an object by bringing the mold into contact with the apparatus has a deformer which causes deformation in the mold for releasing the mold from the object. The apparatus transfers a pattern formed on a mold to a photo-curing resin by bringing the mold into contact with the photo-curing resin and applying light thereto to cure the photo-curing resin. The apparatus has an optical system which applies light at an irradiation light intensity to a non-transfer area other than a transfer area where the pattern is to be transferred in the photo-curing resin, the intensity being different from an irradiation light intensity of light applied to the transfer area.

Abstract: One object of the present invention is to provide a pattern transferring mold which can provide a starting area of mold release easily and certainly and a pattern transferring apparatus with the same. A pattern transferring mold is disclosed which is used in a pattern transferring apparatus that brings the mold into contact with a photo-curing resin on a substrate and cures the photo-curing resin by light irradiation to transfer a pattern formed on the mold onto the photo-curing resin. The mold comprises a bottom face which contacts the photo-curing resin, the bottom face portion including a first area in which the pattern is formed and a second area formed outside the first area. The mold has a mold-releasing shape in the second area, the mold-releasing shape providing a starting area of mold release from the cured photo-curing resin.

Abstract: An imprinting machine that brings a mold having a pattern into contact with an object and transfers the pattern onto the object includes a measurement unit that measures a position of the mold when the mold contacts the object.