Abstract: This invention relates to a cleaning apparatus for cleaning workpieces such as semiconductors and other electronic devices by using chloro-fluoro-carbon solvent such as R113. Chloro-fluoro-carbon vapor is drawn from a lateral position of a layer of chloro-fluoro-carbon vapor through a suction duct and is cooled and liquefied in a collecting tank. The resulting liquid is returned to a cleaning tank through a return duct. This feature allows the gas generated from the chloro-fluoro-carbon vapor to be collected for repeated use, reduces the amount of chloro-fluoro-carbon solvent consumption, and prevents air pollution by the chloro-flouoro-carbon gas. Further, the entire apparatus may readily be constructed as a unit, thus at low manufacturing cost.

Abstract: An apparatus for testing leaks comprises a steeping bath, a boiling bath at one side of the steeping bath, a water separating bath at the other opposite side of the steeping bath and an overhead vapor bath covering those baths which has a cooling device for condensing a fluorocarbon vapor over the separating bath; the so-condensed liquid fluorocarbon drops into the steeping bath for testing an air tightness of sealed containers, boxes or the likes having an internal pressure, wherein the liquid fluorocarbon overflowing from the steeping bath into the boiling bath is boiled therein for circulation and purification of said liquid.