Patents by Inventor Toshio Uemura
Toshio Uemura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8629126Abstract: Disclosed are quinolone derivatives characterized in that these have lower alkyl, cycloalkyl or the like at the 1-position; —N(R0)C(O)-lower alkylene-CO2R0, lower alkylene-CO2R0, lower alkenylene-CO2R0, —O-lower alkylene-CO2R0, —O-(lower alkylene which may be substituted with —CO2R0)-aryl or —O-lower alkenylene-CO2R0 (wherein R0 is H or lower alkyl) at the 3-position; halogen at the 6-position; and amino group substituted with a substituent group having a ring structure at the 7-position, respectively, or pharmaceutically acceptable salts thereof, has excellent P2Y12 inhibitory activity. The quinolone derivatives have excellent platelet aggregation inhibitory activity. A method of using the compounds is also disclosed.Type: GrantFiled: February 2, 2012Date of Patent: January 14, 2014Assignee: Astellas Pharma Inc.Inventors: Yuji Koga, Takao Okuda, Susumu Watanuki, Takashi Kamikubo, Fukushi Hirayama, Hiroyuki Moritomo, Jiro Fujiyasu, Michihito Kageyama, Toshio Uemura, Jun Takasaki
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Publication number: 20120136025Abstract: Disclosed are quinolone derivatives characterized in that these have lower alkyl, cycloalkyl or the like at the 1-position; —N(R0)C(O)-lower alkylene-CO2R0, lower alkylene-CO2R0, lower alkenylene-CO2R0, —O-lower alkylene-CO2R0, —O-(lower alkylene which may be substituted with —CO2R0)-aryl or —O-lower alkenylene-CO2R0 (wherein R0 is H or lower alkyl) at the 3-position; halogen at the 6-position; and amino group substituted with a substituent group having a ring structure at the 7-position, respectively, or pharmaceutically acceptable salts thereof, has excellent P2Y12 inhibitory activity. The quinolone derivatives have excellent platelet aggregation inhibitory activity. A method of using the compounds is also disclosed.Type: ApplicationFiled: February 2, 2012Publication date: May 31, 2012Applicant: ASTELLAS PHARMA INC.Inventors: Yuji KOGA, Takao OKUDA, Susumu WATANUKI, Takashi KAMIKUBO, Fukushi HIRAYAMA, Hiroyuki MORITOMO, Jiro FUJIYASU, Michihito KAGEYAMA, Toshio UEMURA, Jun TAKASAKI
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Patent number: 8133882Abstract: Provided are quinolone derivatives having a lower alkyl or cycloalkyl at the 1-position; —N(R0)C(O)-lower alkylene-CO2R0, lower alkylene-CO2R0, lower alkenylene-CO2R0, —O-lower alkylene-CO2R0, —O-(lower alkylene which may be substituted with —CO2R0)-aryl or —O-lower alkenylene-CO2R0 (wherein R0 is H or lower alkyl) at the 3-position; halogen at the 6-position; and amino group substituted with a substituent group having a ring structure at the 7-position, respectively, or pharmaceutically acceptable salts thereof. Pharmaceutical composition containing the quinolone derivatives and methods of using the compositions are provided.Type: GrantFiled: March 14, 2007Date of Patent: March 13, 2012Assignee: Astellas Pharma IncInventors: Yuji Koga, Takao Okuda, Susumu Watanuki, Takashi Kamikubo, Fukushi Hirayama, Hiroyuki Moritomo, Jiro Fujiyasu, Michihito Kageyama, Toshio Uemura, Jun Takasaki
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Publication number: 20090197834Abstract: [Problem] To provide a compound having excellent platelet aggregation inhibitory activity. [Means for Resolution] It was found that quinolone derivatives characterized in that these have lower alkyl, cycloalkyl or the like at the 1-position; —N(R0)C(O)-lower alkylene-CO2R0, lower alkylene-CO2R0, lower alkenylene-CO2R0, —O-lower alkylene-CO2R0, —O-(lower alkylene which may be substituted with —CO2R0)-aryl or —O-lower alkenylene-CO2R0 (wherein R0 is H or lower alkyl) at the 3-position; halogen at the 6-position; and amino group substituted with a substituent group having a ring structure at the 7-position, respectively, or pharmaceutically acceptable salts thereof, has excellent P2Y12 inhibitory activity. In addition, it was confirmed that these quinolone derivatives also have excellent platelet aggregation inhibitory activity. Based on the above, these quinolone derivatives or pharmaceutically acceptable salts thereof are useful as platelet aggregation inhibitors.Type: ApplicationFiled: March 14, 2007Publication date: August 6, 2009Applicant: ASTELLAS PHARMA INC.Inventors: Yuji Koga, Takao Okuda, Susumu Watanuki, Takashi Kamikubo, Fukushi Hirayama, Hiroyuki Moritomo, Jiro Fujiyasu, Michihito Kageyama, Toshio Uemura, Jun Takasaki
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Publication number: 20070254861Abstract: A method for the prevention and/or treatment of peripheral arterial disease by compound (I) or its pharmaceutically salts are provided. The compound (I) or its pharmaceutically salts have inhibitory activity against heterotrimeric G protein Gq/11.Type: ApplicationFiled: March 1, 2007Publication date: November 1, 2007Applicant: Astellas Pharma Inc.Inventors: Tomihisa Kawasaki, Hajime Takamatsu, Toshio Uemura
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Patent number: 6717202Abstract: A first silicon film is so formed as to extend along the inner surface of trenches 52 formed in a silicon oxide film 50, an oxide film is formed on the surface of the first silicon film, and a second amorphous silicon film is further deposited. Heat-treatment is applied to the surface of the second amorphous silicon film for seeding silicon nuclei and for promoting grain growth, and a granular silicon crystal 57 is grown from the second amorphous silicon film. In this way, the resistance of a lower electrode 59 of a capacitance device can be lowered.Type: GrantFiled: October 17, 2002Date of Patent: April 6, 2004Assignees: Renesas Technology Corp., Hitachi ULSI Systems Co., Ltd.Inventors: Yasuhiro Sugawara, Ryouichi Furukawa, Toshio Uemura, Akira Takamatsu, Hirohiko Yamamoto, Tadanori Yoshida, Masayuki Ishizaka, Shinpei Iljima, Yuzuru Ohji
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Publication number: 20030038325Abstract: A first silicon film is so formed as to extend along the inner surface of trenches 52 formed in a silicon oxide film 50, an oxide film is formed on the surface of the first silicon film, and a second amorphous silicon film is further deposited. Heat-treatment is applied to the surface of the second amorphous silicon film for seeding silicon nuclei and for promoting grain growth, and a granular silicon crystal 57 is grown from the second amorphous silicon film. In this way, the resistance of a lower electrode 59 of a capacitance device can be lowered.Type: ApplicationFiled: October 17, 2002Publication date: February 27, 2003Inventors: Yasuhiro Sugawara, Ryouichi Furukawa, Toshio Uemura, Akira Takamatsu, Hirohiko Yamamoto, Tadanori Yoshida, Masayuki Ishizaka, Shinpei Iijima, Yuzuru Ohji
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Patent number: 6524927Abstract: A first silicon film is so formed as to extend along the inner surface of trenches 52 formed in a silicon oxide film 50, an oxide film is formed on the surface of the first silicon film, and a second amorphous silicon film is further deposited. Heat-treatment is applied to the surface of the second amorphous silicon film for seeding silicon nuclei and for promoting grain growth, and a granular silicon crystal 57 is grown from the second amorphous silicon film. In this way, the resistance of a lower electrode 59 of a capacitance device can be lowered.Type: GrantFiled: September 7, 1999Date of Patent: February 25, 2003Assignees: Hitachi, Ltd., Hitachi ULSI Systems Co., Ltd.Inventors: Yasuhiro Sugawara, Ryouichi Furukawa, Toshio Uemura, Akira Takamatsu, Hirohiko Yamamoto, Tadanori Yoshida, Masayuki Ishizaka, Shinpei Iljima, Yuzuru Ohji
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Patent number: 4545307Abstract: A coal combustion apparatus capable of improving NO.sub.x reduction to a large extent is provided, which apparatus comprises a pulverized coal-feeding pipe (abbreviated to coal pipe) inserted into a burner throat on the lateral wall of a combustion furnace and for feeding the coal and air into the furnace; a means for feeding the coal and air into the coal pipe; a secondary air passageway formed between the coal pipe and a secondary air-feeding pipe provided on the outer peripheral side of the coal pipe; a ternary air passageway formed on the outer peripheral side of the secondary air-feeding pipe; a means for feeding air or an oxygen-containing gas into the secondary air passageway and that into the ternary air passageway; and a bluff body having a cross-section of a L-letter form provided at the tip end of the coal pipe.Type: GrantFiled: June 4, 1984Date of Patent: October 8, 1985Assignee: Babcock-Hitachi Kabushiki KaishaInventors: Shigeki Morita, Tadahisa Masai, Shigeto Nakashita, Toshio Uemura, Fumio Kouda, Tsuyoshi Nawata
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Patent number: 4308806Abstract: An incinerator for burning waste including a hollow body having an opened upper end and an opened lower end, a bottom plate closing the lower end, a central opening provided in the bottom plate for introducing pressurized oxidizing gas into the hollow body, a plurality of circumferentially disposed openings provided in the bottom plate for introducing pressurized oxidizing gas into the hollow body, an oxidizing gas feeding means for supplying gas to the central opening and the circumferentially disposed openings, heat transfer medium particles provided in the hollow body and fluidized by the oxidizing gas introduced into the hollow body and a means for feeding waste into the hollow body.Type: GrantFiled: July 20, 1979Date of Patent: January 5, 1982Assignee: Babcock-Hitachi Kabushiki KaishaInventors: Toshio Uemura, Yoshiki Watanabe, Yoji Masumoto, Tomihisa Ishikawa, Noboru Kajimoto, Shin Kawada
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Patent number: 4281605Abstract: This invention relates to an apparatus of regenerating fluidizing medium employed in a fluidized-bed incinerator, wherein the sticking matter attached to the fluidizing medium employed in the incinerator in the process of burning up in the incinerator the ash collected from power plant boiler exhaust gases (EP ash) is removed from the fluidizing medium chemically and physically.Type: GrantFiled: September 4, 1979Date of Patent: August 4, 1981Assignee: Babcock-Hitachi Kabushiki KaishaInventors: Toshio Uemura, Hiroshi Kagabu, Kenji Arisaki, Noboru Kajimoto, Shinshi Akatsuka, Takuaki Fujimoto
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Patent number: 4177742Abstract: An incinerator for burning waste including a hollow body having an opened upper end and an opened lower end, a bottom plate closing the lower end, a central opening provided in the bottom plate for introducing pressurized oxidizing gas into the hollow body, a plurality of circumferentially disposed openings provided in the bottom plate for introducing pressurized oxidizing gas into the hollow body, an oxidizing gas feeding means for supplying gas to the central opening and the circumferentially disposed openings, heat transfer medium particles provided in the hollow body and fluidized by the oxidizing gas introduced into the hollow body and a means for feeding waste into the hollow body.Type: GrantFiled: April 5, 1978Date of Patent: December 11, 1979Assignee: Babcock-Hitachi Kabushiki KaishaInventors: Toshio Uemura, Yoshiki Watanabe, Yoji Masumoto, Tomihisa Ishikawa, Noboru Kajimoto, Shin Kawada