Abstract: The Ga2O3-based single crystal substrate has an amount of warpage of ?50 ?m or more and 50 ?m or less (including 0 ?m) on a main surface. The method of manufacturing a Ga2O3-based single crystal substrate includes processing a substrate from a Ga2O3-based single crystal grown according to an induction heating type single crystal growth method to have an amount of warpage of ?50 ?m or more and 50 ?m or less (including 0 ?m) on a main surface.

Abstract: To provide a probe 1 for use in a cantilever 2 of an scanning probe microscope (SPM) manufacturable in a simple manufacturing process and usable while allowing full use of the properties of single-crystalline material and a cantilever 2 using that probe. A probe 1 disposed at the tip of beam part 2a of a cantilever 2 used for an SPM, wherein the probe 1 comprises a needle-like part 1a having a length of not less than 10 ?m or and a flat plate part 1b having a face contacting a beam part of the cantilever, the needle-like part 1a and the flat plate part 1b are integrally formed with a single-crystalline material, and at least one side face of the flat plate part 1b contains a flat surface 1c in order to indicate the crystal orientation of the single-crystalline material.

Abstract: To provide a probe 1 for use in a cantilever 2 of an scanning probe microscope (SPM) manufacturable in a simple manufacturing process and usable while allowing full use of the properties of single-crystalline material and a cantilever 2 using that probe. A probe 1 disposed at the tip of beam part 2a of a cantilever 2 used for an SPM, wherein the probe 1 comprises a needle-like part 1a having a length of not less than 10 m or and a flat plate part 1b having a face contacting a beam part of the cantilever, the needle-like part 1a and the flat plate part 1b are integrally formed with a single-crystalline material, and at least one side face of the flat plate part 1b contains a flat surface 1c in order to indicate the crystal orientation of the single-crystalline material.

Abstract: A refractive index controlled diffractive optical element having a two-dimensional refractive index distribution to be written on a transparent material, wherein a first refractive index region with a refractive index n1 and width d1 is formed in a transparent material, and the ith refractive index region with a refractive index ni (assuming ni?ni?1) and a width di is formed adjacent to the (i?1)th refractive index region and opposite to the (i ?2)th refractive index region (at an arbitrary side of the (i?1)th refractive index region when i=2) where i is an integer within a range of 2?i?x. Accordingly, a diffractive optical element simultaneously having high diffraction efficiency to a particular order and thinness of the element itself can be obtained.

Abstract: [Object of the Invention] To provide a probe 1 for use in a cantilever 2 of an scanning probe microscope (SPM) manufacturable in a simple manufacturing process and usable while allowing full use of the properties of single-crystalline material and a cantilever 2 using that probe. [Solution] A probe 1 disposed at the tip of beam part 2a of a cantilever 2 used for an SPM, wherein the probe 1 comprises a needle-like part 1a having a length of not less than 10 ?m or and a flat plate part 1b having a face contacting a beam part of the cantilever, the needle-like part 1a and the flat plate part 1b are integrally formed with a single-crystalline material, and at least one side face of the flat plate part 1b contains a flat surface 1c in order to indicate the crystal orientation of the single-crystalline material.

Abstract: A refractive index controlled diffractive optical element having a two-dimensional refractive index distribution to be written on a transparent material, wherein a first refractive index region with a refractive index n1 and width d1 is formed in a transparent material, and the ith refractive index region with a refractive index ni (assuming ni?ni-1) and a width di is formed adjacent to the (i?1)th refractive index region and opposite to the (i?2)th refractive index region (at an arbitrary side of the (i?1)th refractive index region when i=2) where i is an integer within a range of 2?i?x. Accordingly, a diffractive optical element simultaneously having high diffraction efficiency to a particular order and thinness of the element itself can be obtained.