Patents by Inventor Toshitsugu Suwa

Toshitsugu Suwa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Manufacturing method of synthetic silica glass
    Patent number: 6094940
    Abstract: A method of manufacturing synthetic silica glass includes the steps of pressurizing a liquid storage tank including a liquid silicon compound therein, generating bubbles in the liquid silicon compound using a foamer, removing the bubbles using a degasser, displacing the liquid silicon compound into a vaporizer while controlling an amount of the liquid silicon compound displaced by a liquid mass flow meter, mixing the displaced liquid silicon compound with a carrier gas to generate a gaseous silicon compound, injecting the gaseous silicon compound into a synthesis furnace, and forming synthetic silica glass by hydrolyzing the gaseous silicon compound in the synthesis furnace.
    Type: Grant
    Filed: March 11, 1999
    Date of Patent: August 1, 2000
    Assignee: Nikon Corporation
    Inventors: Seishi Fujiwara, Norio Komine, Hiroki Jinbo, Toshitsugu Suwa