Patents by Inventor Toshiyuki Iijima

Toshiyuki Iijima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electrophotographic photoreceptor comprising amorphous silicon and amorphous carbon buffer layer
    Patent number: 4833055
    Abstract: An electrophotographic photoreceptor comprises a conductive base, a photoconductive layer formed of amophous silicon on the conductive base, a buffer layer on the photoconductive layer, and a surface layer covering the photoconductive layer through the buffer layer, wherein the buffer layer is formed of amorphous carbon.
    Type: Grant
    Filed: June 4, 1987
    Date of Patent: May 23, 1989
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Toyoki Kazama, Koichi Aizawa, Kenichi Hara, Toshiyuki Iijima, Yukio Takano
  • Electrophotographic photosensitive material comprising amorphous carbon protective layer containing hydrogen and fluorine
    Patent number: 4770966
    Abstract: A photosensitive material comprising a photosensitive layer composed of an amorphous silicon-based material formed on an electrically conductive support, and a surface layer formed on said photosensitive layer, the surface layer being composed of amorphous carbon containing hydrogen and fluorine has improved printing durability and humidity resistance.
    Type: Grant
    Filed: March 12, 1987
    Date of Patent: September 13, 1988
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Toyoki Kazama, Koichi Aizawa, Kenichi Hara, Toshiyuki Iijima, Yukio Takano
  • Electrophotographic light-sensitive element with amorphous C overlayer
    Patent number: 4675265
    Abstract: Electrophotographic light-sensitive elements according to the invention comprise(a) a conductive support;(b) a photoconductive layer; and(c) a surface protective layer.The conductive support is formed in a sheet-like or cylindrical shape from any suitable conductive material, and acts as an electrode of the light-sensitive element as well as acting as a physical support. The photoconductive layer comprises amorphous hydrogenated silicon having a high absorption efficiency and photoconductivity. The a--Si:H of a photoconductive layer may contain other elements such as fluorine, carbon, nitrogen and germanium, and may be doped with elements belonging to groups III and V of the periodic table. The surface protective layer is the outermost layer of an electrophotographic light-sensitive element according to the invention, and imparts resistance to environmental conditions. The surface protective layer comprises hydrogenated amorphous carbon, and may additionally contain silicon, nitrogen, oxygen or fluorine.
    Type: Grant
    Filed: March 25, 1986
    Date of Patent: June 23, 1987
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Toyoki Kazama, Koichi Aizawa, Kiyoto Yamaguchi, Kenichi Hara, Toshiyuki Iijima
  • Apparatus for improving the performance of non-crystalline silicon photosensitive material in an electronic copier
    Patent number: 4623243
    Abstract: An apparatus for forming images on a photosensitive material of non-crystalline silicon where the deterioration of image quality from charge storage effects is reduced by charging the photosensitive material at a polarity opposite that of its initial charging prior to the image forming irradiation of photosensitive material.
    Type: Grant
    Filed: May 13, 1983
    Date of Patent: November 18, 1986
    Assignees: Fuji Electric Co., Ltd., Fuji Electric Corporate Research & Development Limited
    Inventors: Toshiyuki Iijima, Hedeki Kina, Masaharu Nanba