Patents by Inventor Tosiyuki Yamamoto

Tosiyuki Yamamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor device and a manufacturing method of the same
    Patent number: 6709880
    Abstract: There is disclosed a method for forming micro patterns in a semiconductor integrated circuit device with high productivity and high accuracy. A photolithography having high throughput and electron beam lithography using a reticle and having relatively high throughput and high resolution are selectively used so as to obtain highest throughput while satisfying accuracy and resolution required for each product/layer. In the case of using the electron beam lithography, a non-complementary reticle and a complementary reticle are selectively used so as to obtain highest throughput while satisfying required accuracy and resolution. Thus, productivity and integration can be improved for the semiconductor integrated circuit device.
    Type: Grant
    Filed: June 17, 2002
    Date of Patent: March 23, 2004
    Assignees: Hitachi, Ltd., Hitachi ULSI Systems, Co., Ltd.
    Inventors: Jiro Yamamoto, Fumio Murai, Tsuneo Terasawa, Tosiyuki Yamamoto
  • Semiconductor device and a manufacturing method of the same
    Publication number: 20030054580
    Abstract: There is disclosed a method for forming micro patterns in a semiconductor integrated circuit device with high productivity and high accuracy. A photolithography having high throughput and electron beam lithography using a reticle and having relatively high throughput and high resolution are selectively used so as to obtain highest throughput while satisfying accuracy and resolution required for each product/layer. In the case of using the electron beam lithography, a non-complementary reticle and a complementary reticle are selectively used so as to obtain highest throughput while satisfying required accuracy and resolution. Thus, productivity and integration can be improved for the semiconductor integrated circuit device.
    Type: Application
    Filed: June 17, 2002
    Publication date: March 20, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Jiro Yamamoto, Fumio Murai, Tsuneo Terasawa, Tosiyuki Yamamoto
  • Quinolizinone compounds, and pharmaceutical composition comprising the same, useful as anti-ulcerative and anti-allergic agents
    Patent number: 4698349
    Abstract: The invention relates to novel quinolizinone compounds, of inhibitory activity on allergies and ulcers, of the formula: ##STR1## wherein R.sup.1 is carboxy, carbamoyl Y.sup.1, phenylcarbamoyl which may have hydroxy, cyano or thiocarbamoyl,R.sup.7 is hydrogen or aryl selected from phenyl, tolyl, xylyl, cumenyl, naphthyl and biphenylyl;R.sup.2 is hydrogen, hydroxy, lower alkyl or lower alkoxy; andR.sup.
    Type: Grant
    Filed: August 30, 1985
    Date of Patent: October 6, 1987
    Assignee: Fujisawa Pharmaceutical Co., Ltd.
    Inventors: Yoshihiko Kitaura, Teruo Oku, Hideo Hirai, Tosiyuki Yamamoto, Masashi Hashimoto
  • Quinolizinone compounds and pharmaceutical composition comprising the same, useful as anti-ulcerative and anti-allergic agents
    Patent number: 4650804
    Abstract: The invention relates to novel quinolizinone compounds having inhibitory activity on allergies and ulcers, of the formula: ##STR1## wherein R.sup.1 is tetrazolylcarbamoyl;R.sup.7 is hydrogen or aryl selected from phenyl, tolyl, xylyl, cumenyl, naphthyl and biphenylyl;R.sup.2 is hydrogen, hydroxy, lower alkyl or lower alkoxy;R.sup.
    Type: Grant
    Filed: March 18, 1985
    Date of Patent: March 17, 1987
    Assignee: Fujisawa Pharmaceutical Co., Ltd.
    Inventors: Yoshihiko Kitaura, Teruo Oku, Hideo Hirai, Tosiyuki Yamamoto, Masashi Hashimoto