Patents by Inventor Trevor Edward Wilantewicz
Trevor Edward Wilantewicz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11963320Abstract: Glass-based article including a first surface and a second surface opposing the first surface defining a thickness (t), and a stress profile are disclosed having a thickness (t) of about 3 millimeters or less, and wherein all points of the stress profile between a thickness range from about 0·t up to 0.3·t and from greater than 0.7·t, comprise a tangent with a slope that is less than about ?0.1 MPa/micrometers or greater than about 0.1 MPa/micrometers. Also disclosed are glass-based articles having a thickness (t) in a range of 0.1 mm and 2 mm; and wherein at least one point of the stress profile in a first thickness range from about 0·t up to 0.020·t and greater than 0.98·t comprises a tangent with a slope of from about ?200 MPa/micrometer to about ?25 MPa/micrometer or about 25 MPa/micrometer to about 200 MPa/micrometer, and wherein all points of the stress profile in a second thickness range from about 0.035·t and less than 0.Type: GrantFiled: October 6, 2022Date of Patent: April 16, 2024Assignee: Corning IncorporatedInventors: Timothy Michael Gross, Xiaoju Guo, Pascale Oram, Kevin Barry Reiman, Rostislav Vatchev Roussev, Vitor Marino Schneider, Trevor Edward Wilantewicz
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Publication number: 20230348290Abstract: Described herein is a plasma resistant protective coating composition and bulk composition that provides enhanced erosion and corrosion resistance upon the coating composition's or the bulk composition's exposure to harsh chemical environment (such as hydrogen based and/or halogen based chemistries) and/or upon the coating composition's or the bulk composition's exposure to high energy plasma. Also described herein is a method of coating an article with a plasma resistant protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits a reduced number of yttrium based particles.Type: ApplicationFiled: June 30, 2023Publication date: November 2, 2023Inventors: Christopher Laurent Beaudry, Vahid Firouzdor, Joseph Frederick Sommers, Trevor Edward Wilantewicz, Hyun-Ho Doh, Joseph Frederick Behnke
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Patent number: 11724965Abstract: Glass-based articles have a first surface and a second surface opposing the first surface defining a thickness (t) and a center between the first surface and the second surface, the glass-based article containing Li2O, ion-exchanged potassium and ion-exchanged sodium. The glass-based article has a stress profile including a hump stress region extending from the first surface (or a point below the first surface) to an apex in a range of 0.001·t and 0.1·t. Compressive stress at the apex is from 25 to 750 MPa. The hump region comprises an area of increasing stress and an area of decreasing stress. Depth of compression is from 0.1·t to 0.25·t. A tensile stress region extends from the depth of compression to a maximum tensile stress.Type: GrantFiled: January 23, 2019Date of Patent: August 15, 2023Assignee: Corning IncorporatedInventors: Vitor Marino Schneider, Trevor Edward Wilantewicz
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Publication number: 20230057346Abstract: Glass-based article including a first surface and a second surface opposing the first surface defining a thickness (t), and a stress profile are disclosed having a thickness (t) of about 3 millimeters or less, and wherein all points of the stress profile between a thickness range from about 0·t up to 0.3·t and from greater than 0.7·t, comprise a tangent with a slope that is less than about ?0.1 MPa/micrometers or greater than about 0.1 MPa/micrometers. Also disclosed are glass-based articles having a thickness (t) in a range of 0.1 mm and 2 mm; and wherein at least one point of the stress profile in a first thickness range from about 0·t up to 0.020·t and greater than 0.98·t comprises a tangent with a slope of from about ?200 MPa/micrometer to about ?25 MPa/micrometer or about 25 MPa/micrometer to about 200 MPa/micrometer, and wherein all points of the stress profile in a second thickness range from about 0.035·t and less than 0.Type: ApplicationFiled: October 6, 2022Publication date: February 23, 2023Inventors: Timothy Michael Gross, Xiaoju Guo, Pascale Oram, Kevin Barry Reiman, Rostislav Vatchev Roussev, Vitor Marino Schneider, Trevor Edward Wilantewicz
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Publication number: 20210403337Abstract: Described herein is a plasma resistant protective coating composition and bulk composition that provides enhanced erosion and corrosion resistance upon the coating composition's or the bulk composition's exposure to harsh chemical environment (such as hydrogen based and/or halogen based chemistries) and/or upon the coating composition's or the bulk composition's exposure to high energy plasma. Also described herein is a method of coating an article with a plasma resistant protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits a reduced number of yttrium based particles.Type: ApplicationFiled: June 25, 2021Publication date: December 30, 2021Inventors: Christopher Laurent Beaudry, Vahid Firouzdor, Joseph Frederick Sommers, Trevor Edward Wilantewicz, Hyun-Ho Doh, Joseph Frederick Behnke
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Publication number: 20210047237Abstract: Glass-based articles have a first surface and a second surface opposing the first surface defining a thickness (t) and a center between the first surface and the second surface, the glass-based article containing Li2O, ion-exchanged potassium and ion-exchanged sodium. The glass-based article has a stress profile including a hump stress region extending from the first surface (or a point below the first surface) to an apex in a range of 0.001·t and 0.1t. Compressive stress at the apex is from 25 to 750 MPa. The hump region comprises an area of increasing stress and an area of decreasing stress. Depth of compression is from 0.1·t to 0.25·t. A tensile stress region extends from the depth of compression to a maximum tensile stress.Type: ApplicationFiled: January 23, 2019Publication date: February 18, 2021Inventors: VITOR MARINO SCHNEIDER, TREVOR EDWARD WILANTEWICZ
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Patent number: 10612129Abstract: Provided herein are ion-implanted glass based articles with improved flaw suppression properties. The ion-implanted glass based articles generally have a final indent fracture threshold (IFT) load of at least 650 grams, and/or a scratch threshold force of at least 10 N, which represents at least 1.25-fold enhancement compared to the glass based article prior to ion-implantation. Factors affecting the efficacy of the ion implantation process can include the IFT load of the starting glass or glass ceramic substrate (native IFT load), ion type, ion dose, implant energy, beam current, and glass temperature.Type: GrantFiled: June 22, 2017Date of Patent: April 7, 2020Assignee: CORNING INCORPORATEDInventors: Sarko Cherekdjian, Benedict Osobomen Egboiyi, William Brashear Mattingly, III, Michael Yoshiya Nishimoto, Toshihiko Ono, Prakash Chandra Panda, Trevor Edward Wilantewicz
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Publication number: 20190208652Abstract: Glass-based article including a first surface and a second surface opposing the first surface defining a thickness (t), and a stress profile are disclosed having a thickness (t) of about 3 millimeters or less, and wherein all points of the stress profile between a thickness range from about 0·t up to 0.3·t and from greater than 0.7·t, comprise a tangent with a slope that is less than about ?0.1 MPa/micrometers or greater than about 0.1 MPa/micrometers. Also disclosed are glass-based articles having a thickness (t) in a range of 0.1 mm and 2 mm; and wherein at least one point of the stress profile in a first thickness range from about 0·t up to 0.020·t and greater than 0.98·t comprises a tangent with a slope of from about ?200 MPa/micrometer to about ?25 MPa/micrometer or about 25 MPa/micrometer to about 200 MPa/micrometer, and wherein all points of the stress profile in a second thickness range from about 0.035·t and less than 0.Type: ApplicationFiled: March 6, 2019Publication date: July 4, 2019Inventors: Timothy Michael Gross, Xiaoju Guo, Pascale Oram, Kevin Barry Reiman, Rostislav Vatchev Roussev, Vitor Marino Schneider, Trevor Edward Wilantewicz
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Patent number: 10271442Abstract: Glass-based article including a first surface and a second surface opposing the first surface defining a thickness (t), and a stress profile are disclosed having a thickness (t) of about 3 millimeters or less, and wherein all points of the stress profile between a thickness range from about 0·t up to 0.3·t and from greater than 0.7·t, comprise a tangent with a slope that is less than about ?0.1 MPa/micrometers or greater than about 0.1 MPa/micrometers. Also disclosed are glass-based articles having a thickness (t) in a range of 0.1 mm and 2 mm; and wherein at least one point of the stress profile in a first thickness range from about 0·t up to 0.020·t and greater than 0.98·t comprises a tangent with a slope of from about ?200 MPa/micrometer to about ?25 MPa/micrometer or about 25 MPa/micrometer to about 200 MPa/micrometer, and wherein all points of the stress profile in a second thickness range from about 0.035·t and less than 0.Type: GrantFiled: April 7, 2017Date of Patent: April 23, 2019Assignee: Corning IncorporatedInventors: Timothy Michael Gross, Xiaoju Guo, Pascale Oram, Kevin Barry Reiman, Rostislav Vatchev Roussev, Vitor Marino Schneider, Trevor Edward Wilantewicz
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Publication number: 20170369989Abstract: Provided herein are ion-implanted glass based articles with improved flaw suppression properties. The ion-implanted glass based articles generally have a final indent fracture threshold (IFT) load of at least 650 grams, and/or a scratch threshold force of at least 10 N, which represents at least 1.25-fold enhancement compared to the glass based article prior to ion-implantation. Factors affecting the efficacy of the ion implantation process can include the IFT load of the starting glass or glass ceramic substrate (native IFT load), ion type, ion dose, implant energy, beam current, and glass temperature.Type: ApplicationFiled: June 22, 2017Publication date: December 28, 2017Inventors: Sarko Cherekdjian, Benedict Osobomen Egboiyi, William Brashear Mattingly, III, Michael Yoshiya Nishimoto, Toshihiko Ono, Parkash Chandra Panda, Trevor Edward Wilantewicz
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Publication number: 20170295657Abstract: Glass-based article including a first surface and a second surface opposing the first surface defining a thickness (t), and a stress profile are disclosed having a thickness (t) of about 3 millimeters or less, and wherein all points of the stress profile between a thickness range from about 0·t up to 0.3·t and from greater than 0.7·t, comprise a tangent with a slope that is less than about ?0.1 MPa/micrometers or greater than about 0.1 MPa/micrometers. Also disclosed are glass-based articles having a thickness (t) in a range of 0.1 mm and 2 mm; and wherein at least one point of the stress profile in a first thickness range from about 0·t up to 0.020·t and greater than 0.98·t comprises a tangent with a slope of from about ?200 MPa/micrometer to about ?25 MPa/micrometer or about 25 MPa/micrometer to about 200 MPa/micrometer, and wherein all points of the stress profile in a second thickness range from about 0.035·t and less than 0.Type: ApplicationFiled: April 7, 2017Publication date: October 12, 2017Inventors: Timothy Michael Gross, Xiaoju Guo, Pascale Oram, Kevin Barry Reiman, Rostislav Vatchev Roussev, Vitor Marino Schneider, Trevor Edward Wilantewicz