Abstract: Embodiments of the invention are directed to methods and systems of purging of transfer containers, such as standardized mechanical interface (SMIF) pods. In particular, purified purge gases can purify front operated unified pods (FOUPs) and other non hermetically sealed transfer containers, such that the containers can be interfaced with a sealed chamber (e.g., a semiconductor processing tool) without detrimentally contaminating the environment of the sealed chamber with organics and other harmful contaminants. The methods and systems may be used to transfer objects, such as wafers, semiconductor components, and other materials requiring exposure to extremely clean environments, during electronic materials manufacturing and processing. Transfer containers specifically configured to promote purging of the container's enclosure are also described.

Abstract: A method for hydride gas purification uses materials having at least one lanthanide metal or lanthanide metal oxide. The method reduces contaminants to less than 100 parts per billion (ppb), preferably 10 ppb, more preferably 1 ppb. The material can also include transition metals and transition metal oxides, rare earth elements and other metal oxides. The invention also includes materials for use in the method of the invention.