Patents by Inventor Trung T. Le

Trung T. Le has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for RF compensation in plasma assisted atomic layer deposition
    Patent number: 9624578
    Abstract: Methods for depositing film on substrates are provided. In these embodiments, the substrates are processed in batches. Due to changing conditions within a reaction chamber as additional substrates in the batch are processed, various film properties may trend over the course of a batch. The methods herein can be used to address the trending of film properties over the course of a batch. More specifically, film property trending is minimized by changing the amount of RF power used to process substrates over the course of the batch. Such methods are sometimes referred to as RF compensation methods.
    Type: Grant
    Filed: September 30, 2014
    Date of Patent: April 18, 2017
    Assignee: Lam Research Corporation
    Inventors: Jun Qian, Frank L. Pasquale, Adrien LaVoie, Chloe Baldasseroni, Hu Kang, Shankar Swaminathan, Purushottam Kumar, Paul Franzen, Trung T. Le, Tuan Nguyen, Jennifer Petraglia, David Charles Smith, Seshasayee Varadarajan
  • METHOD AND APPARATUS FOR RF COMPENSATION IN PLASMA ASSISTED ATOMIC LAYER DEPOSITION
    Publication number: 20160090650
    Abstract: The embodiments herein relate to methods, apparatus, and systems for depositing film on substrates. In these embodiments, the substrates are processed in batches. Due to changing conditions within a reaction chamber as additional substrates in the batch are processed, various film properties may trend over the course of a batch. Disclosed herein are methods and apparatus for minimizing the trending of film properties over the course of a batch. More specifically, film property trending is minimized by changing the amount of RF power used to process substrates over the course of the batch. Such methods are sometimes referred to as RF compensation methods.
    Type: Application
    Filed: September 30, 2014
    Publication date: March 31, 2016
    Inventors: Jun Qian, Frank L. Pasquale, Adrien LaVoie, Chloe Baldasseroni, Hu Kang, Shankar Swaminathan, Purushottam Kumar, Paul Franzen, Trung T. Le, Tuan Nguyen, Jennifer Petraglia, David Charles Smith, Seshasayee Varadarajan