Patents by Inventor Tsuguhiro Tago
Tsuguhiro Tago has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9193904Abstract: This invention is concerning an etchant composition used to etch a silicon-containing film formed on a target substrate. The etchant composition includes at least one selected from the group consisting of an organic compound containing a hydroxyl group, an organic compound containing a carbonyl group, an inorganic acid and inorganic salt, hydrofluoric acid, ammonium fluoride and an organic acid.Type: GrantFiled: August 17, 2012Date of Patent: November 24, 2015Assignee: HAYASHI PURE CHEMICAL IND., LTD.Inventors: Atsushi Matsui, Mayumi Kimura, Tsuguhiro Tago
-
Publication number: 20140235064Abstract: This invention is concerning an etchant composition used to etch a silicon-containing film formed on a target substrate. The etchant composition includes at least one selected from the group consisting of an organic compound containing a hydroxyl group, an organic compound containing a carbonyl group, an inorganic acid and inorganic salt, hydrofluoric acid, ammonium fluoride and an organic acid.Type: ApplicationFiled: August 17, 2012Publication date: August 21, 2014Applicant: HAYASHI PURE CHEMICAL IND., LTD.,Inventors: Atsushi Matsui, Mayumi Kimura, Tsuguhiro Tago
-
Patent number: 8557711Abstract: The present invention aims to provide an etching solution composition which enables to etch a metal film in a controllable manner, form a desired definite tapered shape, and obtain a smooth surface without causing etching solution exudation trace. Said problems have been solved by the present invention, which is an etching solution composition for etching metal films containing one or more surfactants selected from the group consisting of alkyl sulfate or perfluoroalkenyl phenyl ether sulfonic acid and the salts thereof.Type: GrantFiled: January 12, 2009Date of Patent: October 15, 2013Assignees: Kanto Kagaku Kabushiki Kaisha, Sanyo Electric Co., Ltd., Sanyo Semiconductor Manufacturing Co., Ltd.Inventors: Kazuhiro Fujikawa, Tsuguhiro Tago
-
Patent number: 8545716Abstract: A metal film such as an aluminum film or an aluminum alloy film is etched with good controllability, preventing a resist from bleeding, to have a proper taper configuration and superior flatness. A water solution containing a phosphoric acid, a nitric acid, and an organic acid salt is used as an etching liquid composition used to etch the metal film on a substrate. The organic acid salt is composed of one kind selected from a group consisting of an aliphatic monocarboxylic acid, an aliphatic polycarboxylic acid, an aliphatic oxicarboxylic acid, an aromatic monocarboxylic acid, an aromatic polycarboxylic acid and an aromatic oxycarboxylic acid, and one kind selected from a group consisting of an ammonium salt, an amine salt, a quaternary ammonium salt, and an alkali metal salt. In addition, a concentration of the organic acid salt ranges from 0.1% to 20% by weight.Type: GrantFiled: July 16, 2008Date of Patent: October 1, 2013Assignees: Hayashi Pure Chemical Ind., Ltd., Sanyo Electric Co., Ltd., SANYO Semiconductor Manufacturing Co., Ltd., Sanyo Semiconductor Co., Ltd.Inventors: Tsuguhiro Tago, Tomotake Matsuda, Mayumi Kimura, Tetsuo Aoyama
-
Publication number: 20100230631Abstract: A metal film such as an aluminum film or an aluminum alloy film is etched with good controllability, preventing a resist from bleeding, to have a proper taper configuration and superior flatness. A water solution containing a phosphoric acid, a nitric acid, and an organic acid salt is used as an etching liquid composition used to etch the metal film on a substrate. The organic acid salt is composed of one kind selected from a group consisting of an aliphatic monocarboxylic acid, an aliphatic polycarboxylic acid, an aliphatic oxicarboxylic acid, an aromatic monocarboxylic acid, an aromatic polycarboxylic acid and an aromatic oxycarboxylic acid, and one kind selected from a group consisting of an ammonium salt, an amine salt, a quaternary ammonium salt, and an alkali metal salt. In addition, a concentration of the organic acid salt ranges from 0.1% to 20% by weight.Type: ApplicationFiled: July 16, 2008Publication date: September 16, 2010Inventors: Tsuguhiro Tago, Tomotake Matsuda, Mayumi Kimura, Tetsuo Aoyama
-
Publication number: 20090218542Abstract: An etchant composition contains (a) an alkaline compound mixture of an organic alkaline compound and inorganic alkaline compound and (b) a silicon-containing compound. The organic alkaline compound is composed of one or more ingredients from quaternary ammonium hydroxide and ethylenediamine. The inorganic alkaline compound is composed of one or more ingredients from sodium hydroxide, potassium hydroxide, ammonia and hydrazine. The silicon-containing inorganic compound is composed of one or more ingredients from metal silicon, fumed silica, colloidal silica, silica gel, silica sol, diatomaceous earth, acid clay and activated clay, and the silicon-containing organic compound is composed of one or more ingredients from quaternary ammonium salts of alkyl silicate and quaternary ammonium salts of alkyl silicic acid.Type: ApplicationFiled: February 26, 2009Publication date: September 3, 2009Applicants: Hayashi Pure Chemical Ind, Ltd., SANYO ELECTRIC CO., LTD., Sanyo Semiconductor Co., Ltd., SANYO Semiconductor Manufacturing Co., LtdInventors: Kenji Isami, Mayumi Kimura, Tetsuo Aoyama, Tsuguhiro Tago
-
Publication number: 20090124091Abstract: The present invention aims to provide an etching solution composition which enables to etch a metal film in a controllable manner, form a desired definite tapered shape, and obtain a smooth surface without causing etching solution exudation trace. Said problems have been solved by the present invention, which is an etching solution composition for etching metal films containing one or more surfactants selected from the group consisting of alkyl sulfate or perfluoroalkenyl phenyl ether sulfonic acid and the salts thereof.Type: ApplicationFiled: January 12, 2009Publication date: May 14, 2009Applicants: Kanto Kagaku Kabushiki Kaisha, Sanyo Electric Co., Ltd., Sanyo Semiconductor Manufacturing Co., Ltd.Inventors: Kazuhiro Fujikawa, Tsuguhiro Tago
-
Publication number: 20050136672Abstract: The present invention aims to provide an etching solution composition which enables to etch a metal film in a controllable manner, form a desired definite tapered shape, and obtain a smooth surface without causing etching solution exudation trace. Said problems have been solved by the present invention, which is an etching solution composition for etching metal films containing one or more surfactants selected from the group consisting of alkyl sulfate or perfluoroalkenyl phenyl ether sulfonic acid and the salts thereof.Type: ApplicationFiled: December 2, 2004Publication date: June 23, 2005Applicants: Kanto Kagaku Kabushiki Kaisha, Sanyo Electric Co., Ltd., Niigata Sanyo Electronic Co., Ltd.Inventors: Kazuhiro Fujikawa, Tsuguhiro Tago