Abstract: [Object] To provide a take-up type vacuum deposition apparatus capable of preventing a thermal deformation of a base material due to charged particles leaked from a neutralization unit without an increase in size of the apparatus. [Solving Means] A take-up type vacuum deposition apparatus according to the present invention includes a charge capturing body provided between a cooling can roller and a neutralization unit that captures charged particles floating from the neutralization unit toward the can roller. Accordingly, the charged particles leaked from the neutralization unit are prevented from reaching the can roller, which suppresses variation in a bias potential applied to the can roller for bringing it into close contact with a base material, and keeps stable electrostatic force with respect to the base material. Accordingly, adhesion force between the base material and the cooling roller can be kept stable, and thus a thermal deformation of the base material can be suppressed.

Abstract: [Object] To carry out high-quality deposition processing while effectively maintaining a function of cleaning a can roller by a cleaning unit. [Solving Means] In the present invention, prior to deposition onto a base film, a cleaning unit is brought into contact with a cooling can roller to clean the can roller rotating in a non-cooled state, whereby it becomes possible to prevent excessive cooling of the cleaning unit and inhibit fallaway of removed dust so that the cleaning unit can efficiently carry out dust removal processing of the cooling roller. In addition, by canceling an in-contact state of the cleaning unit and the can roller after the end of the cleaning, the cleaning unit can be prevented from being cooled by a cooling operation of the can roller during deposition, thus making it possible to hold the dust removed from a circumferential surface of the can roller without letting it fall away.