Abstract: A storage apparatus includes a flash memory that includes multiple blocks; and a control portion that reads data written in the block and writes the data into the block. The flash memory includes one block set having n pieces of the blocks including BR1 to BRn. A write data and a write flag are capable of being written into each of blocks BRi, the write data being written in accordance with a request, the write flag indicating that the write data has been written into a target block BRj. In accordance with a write request, the control portion performs an erasure process, a first write process, and a second write process. The erasure process erases the data including the write data and the write flag. The first write process writes the new write data into the block BRl. The second write process writes the write flag into a block BRm.

Abstract: A storage apparatus includes a flash memory that includes multiple blocks; and a control portion that reads data written in the block and writes the data into the block. The flash memory includes one block set having n pieces of the blocks including BR1 to BRn. A write data and a write flag are capable of being written into each of blocks BRi, the write data being written in accordance with a request, the write flag indicating that the write data has been written into a target block BRj. In accordance with a write request, the control portion performs an erasure process, a first write process, and a second write process. The erasure process erases the data including the write data and the write flag. The first write process writes the new write data into the block BRl. The second write process writes the write flag into a block BRm.

Abstract: In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.

Abstract: In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.

Abstract: To record data in a flash memory, upon detecting that a current destination memory block is full, a control apparatus records data in a destination memory block one block by one block, with “in-advance” data erasure of the next memory block and by determining if data erasure of the next memory block is successful. When data erasure of the next memory block fails, such memory block is designated as broken, and such memory block is excluded from a group of blocks to be used as recording destination. After determining the data erasure result of a yet-next memory block is successful, the required data is copied to the yet-next memory block. Therefore, even when one of the blocks is broken, a sequential data recording in the flash memory is performed without increasing the number of data copy operations between blocks.

Abstract: In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.

Abstract: In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.

Abstract: In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.

Abstract: To record data in a flash memory, upon detecting that a current destination memory block is full, a control apparatus records data in a destination memory block one block by one block, with “in-advance” data erasure of the next memory block and by determining if data erasure of the next memory block is successful. When data erasure of the next memory block fails, such memory block is designated as broken, and such memory block is excluded from a group of blocks to be used as recording destination. After determining the data erasure result of a yet-next memory block is successful, the required data is copied to the yet-next memory block. Therefore, even when one of the blocks is broken, a sequential data recording in the flash memory is performed without increasing the number of data copy operations between blocks.

Abstract: A uniform thin phase-shifting photomask blank can be formed by depositing a thin film on a substrate by a reactive sputtering technique while passing, at least four times, the substrate over a sputtering target. In the formation of the blank, NO gas is used as the reactive gas, a target composed of a mixture of molybdenum and silicon is used as the sputtering target and a transparent substrate is used as the thin film-forming substrate to form, on the transparent substrate, a light-transmitting film capable of transmitting light rays having an intensity, which cannot substantially contribute to the exposure. In addition, the film is formed, on the substrate, through an opening having a sufficiently enlarged length along the substrate-conveying direction so that even regions whose deposition rate of the target component is not more than 90% of the maximum level thereof also contribute to the film-formation.

Abstract: A uniform thin phase-shifting photomask blank can be formed by depositing a thin film on a substrate by a reactive sputtering technique while passing, at least four times, the substrate over a sputtering target. In the formation of the blank, NO gas is used as the reactive gas, a target composed of a mixture of molybdenum and silicon is used as the sputtering target and a transparent substrate is used as the thin film-forming substrate to form, on the transparent substrate, a light-transmitting film capable of transmitting light rays having an intensity, which cannot substantially contribute to the exposure. In addition, the film is formed, on the substrate, through an opening having a sufficiently enlarged length along the substrate-conveying direction so that even regions whose deposition rate of the target component is not more than 90% of the maximum level thereof also contribute to the film-formation.

Abstract: A uniform thin phase-shifting photomask blank can be formed by depositing a thin film on a substrate by a reactive sputtering technique while passing, at least four times, the substrate over a sputtering target. In the formation of the blank, NO gas is used as the reactive gas, a target composed of a mixture of molybdenum and silicon is used as the sputtering target and a transparent substrate is used as the thin film-forming substrate to form, on the transparent substrate, a light-transmitting film capable of transmitting light rays having an intensity, which cannot substantially contribute to the exposure. In addition, the film is formed, on the substrate, through an opening having a sufficiently enlarged length along the substrate-conveying direction so that even regions whose deposition rate of the target component is not more than 90% of the maximum level thereof also contribute to the film-formation.

Abstract: In an air conditioning apparatus for a vehicle, plural electrical heating members are integrated with a heater core for heating air. The air conditioning apparatus includes a first control unit for determining number of the electrical heating members to be operated, and a second control unit for controlling electrical power supplied to each of the electrical heating members based on the number determined by the first control unit. The second control unit preferentially supplies electrical power to an electrical heating member plated at a side of a foot opening through which air blown toward a lower side of a passenger compartment. Thus, the lower side of the passenger compartment can be preferentially quickly heated by heat generated from the electrical heating members.

Abstract: A phase-shifting photomask blank is made by sputtering a target of molybdenum suicide with a sputtering gas to which nitric monoxide is added in a ratio of 2.65-6.47% by volume. A nitrided-oxide film of molybdenum silicide as a phase-shifting film is formed on a transparent substrate. A base phase-shifting film may be formed on a transparent substrate and then a nitrided-oxide film of molybdenum silicide as a surface layer may be formed on top of the base phase-shifting film by sputtering a target of molybdenum silicide with a sputtering gas to which nitric monoxide is added in a ratio of 0.59-6.47% by volume. The transparent substrate on which the nitrided-oxide film of molybdenum slicide is formed may be subjected to a heat treatment at a temperature of 200.degree. C. or more.

Abstract: A phase-shifting photomask blank is made by sputtering a target of molybdenum silicide with a sputtering gas to which nitric monoxide is added in a ratio of 2.65-6.47% by volume. A nitrided-oxide film of molybdenum silicide as a phase-shifting film is formed on a transparent substrate. A base phase-shifting film may be formed on a transparent substrate and then a nitrided-oxide film of molybdenum silicide as a surface layer may be formed on top of the base phase-shifting film by sputtering a target of molybdenum silicide with a sputtering gas to which nitric monoxide is added in a ratio of 0.59-6.47% by volume. The transparent substrate on which the nitrided-oxide film of molybdenum slicide is formed may be subjected to a heat treatment at a temperature of 200.degree. C. or more.

Abstract: In a collapsible bed structure for bed-ridden invalids, a bed section is provided on an upper open end of a bathtub, the bed section having at least first, second and third bed plates each pivotably connected at their neighboring side. A link structure is provided to change the bed section between a rest position in which the first, second and third bed plates are horizontally supported and an operative position in which the first, second and third bed plates are supported in a chair-shaped configuration within the bathtub. A pedestal plate is pivotably placed at one end by a hinge to the first plate of the bed section, the pedestal plate having a rack operative to move the pedestal plate upward around the hinge so as to raise the haunches of an occupant lying on the bed section to expedite the occupant's divestiture.

Abstract: Ultra high-strength hydraulic cement compositions with extremely low water-to-cement ratio of 10-30% and having high fluidity and improved capability of preventing slump loss, from which high-quality ultra high-strength hardened concrete and mortar can be obtained with superior workability, contain a binder composed of cement or a mixture of cement and a microscopic powder admixture, aggregates, water and a cement dispersion agent composed of water-soluble vinyl copolymers obtained by aqueous solution radical polymerization of five specified kinds of monomers at a ratio within a specified range The unit content of the binder is 400-1300kg/m.sup.3, the water-to-binder ratio is 10-30% and the content of cement dispersion agent is 0.1-2.0 weight parts for 100 weight parts of the binder.

Abstract: Cement dispersion agents containing a graft copolymer composed of four kinds of constituent unit each having a specified structure can provide improved fluidity to cementing compositions, prevent slump loss after the kneading process and reduce the drying shrinkage of hardened concrete produced at the same time.

Abstract: Fluidizing property is provided to a hyraulic cement composition by adding a cement dispersion agent to the composition by 0.01-2 weight % with respect to its solid cement component. The cement dispersion agent contains a water-soluble vinyl copolymer which is obtainable by copolymerization of at least first monomer shown by Formula A given below, second monomer shown by Formula B given below and third monomer shown by Formula C given below at copolymerization rate of 10-50/3-25/80-40 by weight: ##STR1## where R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are H or CH.sub.3, R.sup.5 is alkyl group with 1-3 carbon atoms, M.sup.1 and M.sup.2 are alkali metal, alkali earth metal, ammonium or organic amine, and n is an integer in the range 5-25. Such a dispersion agent is produced by aqueous solution polymerization of monomers of these kinds at a weight ratio within the range given above in the presence of a radical polymerization initiating agent.

Abstract: A cement dispersion agent contains a water-soluble vinyl copolymer having numerical average molecular weight of 2000-15000 which is obtainable by copolymerization of at least three kinds of monomers shown by Formulas A, B and C given below at copolymerization ratio of 10-50/3-25/80-40 by weight: ##STR1## where R.sup.1, R.sup.2, and R.sup.3 are H or CH.sub.3, R.sup.4 is alkyl group with 1-3 carbon atoms, M.sup.1 and M.sup.2 are alkali metal, alkali earth metal, ammonium or organic amine, and n is an integer in the range 5-25. Such a dispersion agent is produced by aqueous solution polymerization of monomers of these kinds at a weight ratio within the range given above in the presence of a radical polymerization initiating agent. Fluidizing property can be provided to a hydraulic cement composition like concrete, cement paste and mortar by adding an agent of this invention by 0.01-0.2 wt % by solid cement component.