Abstract: A processing apparatus having a laser light source for oscillating a pulse in response to a predetermined trigger signal and irradiating the beam emitted from the laser light source to an object to process the object comprises a position detection unit for detecting a position of a dimmer removably mounted in a light path of the emitted beam, and trigger control means for generating a trigger pulse train for causing the pulse oscillation type laser light source to emit light and sending out the light emission trigger pulse train to the laser light source when the position of the dimmer is within a predetermined allowable range around a predetermined target set position.

Abstract: An exposure apparatus, such as a stepper, uses a laser light source requiring new gas introduction from time to time. The timing of new gas addition and partial gas replacement is controlled so that the exposure apparatus is not adversely affected. In one embodiment, the timing is such that gas introduction or replacement occurs during interruption of exposure operation, which does not start again until the fluctuation of the output of laser light caused by gas introduction or replacement is stabilized.

Abstract: An exposure control apparatus for controlling exposure quantity of pulse energy to a resist, when pattern of a rectile is transcribed to the resist on a wafer, using pulse energy accompanied by energy variation within a predetermined range per each emission, i.e., coherent or non-coherent light energy, or pulse energy other than light, such as X-ray.

Abstract: A laser processor provided with a pulse oscillating laser light source, an exciter for exciting the laser light source on a trigger signal for pusle oscillation, a beam quality adjusting device for adjusting a beam quality as monitoring the pulse-oscillated laser light partly at least, a working apparatus for exposing or processing a workpiece by projecting the adjusted laser light thereon. The laser light from a laser light source side is intercepted by a shutter while it is not used on a sequence on a working apparatus side, thereby operating the laser light source for self-oscillation at a low frequency of 1 to 2 hz, for example; the laser light source is then operated for self-oscillation at a frequency higher than that with the shutter closed therefor when a quality abnormal signal is generated from an abnormal detector upon detection of a beam quality coming outside a standard.