Patents by Inventor Tsutomu Hatanaka

Tsutomu Hatanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140014644
    Abstract: A heating device includes a substrate in a form of a face plate that is positioned above a base plate, on which a wafer is placed, and to which a film heater for heating wafer is provided, columns that are vertically provided between the base plate and the face plate and support the face plate, and tension members that pull the face plate toward the base plate. The columns and the tension members are positioned to support or pull at least a part of the face plate corresponding to a placement region of the wafer. Each of the tension members includes a shaft having an upper end locked by the face plate and a lower end penetrating the base plate and a coil spring that is positioned on the base plate and biases the lower end of the shaft downward.
    Type: Application
    Filed: March 28, 2012
    Publication date: January 16, 2014
    Applicants: TOKYO ELECTRON LIMITED, KOMATSU LTD.
    Inventors: Hironori Akiba, Kazuhiko Kubota, Tsutomu Hatanaka, Yuichi Sakai, Akira Yonemizu, Kazuhiko Ooshima
  • Publication number: 20140014643
    Abstract: A heating device includes a base plate and a face plate that is provided above the base plate and on which a wafer is placed. The face plate includes an aluminum substrate, a film heater that is provided to the aluminum substrate and heats the wafer, and a gap ball that is disposed on the aluminum substrate and interposed between the aluminum substrate and the wafer. The aluminum substrate is provided with a second attachment hole into which the gap ball is press-fitted. The gap ball is held only by an inner wall of the second attachment hole by being press-fitted.
    Type: Application
    Filed: March 28, 2012
    Publication date: January 16, 2014
    Applicants: TOKYO ELECTRON LIMITED, KOMATSU LTD.
    Inventors: Hironori Akiba, Kazuhiko Kubota, Tsutomu Hatanaka, Yuichi Sakai, Akira Yonemizu, Kazuhiko Ooshima
  • Patent number: 6592645
    Abstract: A process for the production of fine powder of metallic nickel which comprises a first step of dissolving nickel carbonate and/or nickel hydroxide in aqueous ammonia or in an aqueous solution of ammonia and at least one selected from the group consisting of ammonium carbonate, ammonium hydrogencarbonate, a carbonate of an alkali metal and a hydrogencarbonate of an alkali metal to prepare an aqueous solution of a nickel salt; converting the aqueous solution of a nickel salt to a W/O emulsion, and then removing volatile components including ammonia from the droplets to form precipitates of nickel carbonate in the droplets, thereby providing fine spherical particles of nickel carbonate; and a second step of heating the particles of nickel carbonate in the presence of a fusion preventive agent that is a compound of at least one element selected from the group consisting of alkaline earth elements, aluminum, silicon and rare earth elements in an atmosphere of hydrogen, thereby reducing the nickel carbonate to meta
    Type: Grant
    Filed: July 18, 2001
    Date of Patent: July 15, 2003
    Assignee: Sakai Chemical Industry Co., Ltd.
    Inventors: Hideto Mizutani, Minoru Yoneda, Toshihiro Sugaya, Hiroyoshi Urasumi, Chiyo Honda, Hiroshi Nakao, Tsutomu Hatanaka, Shinji Ohgama, Kiyoshi Fukai, Kazuhiko Nagano, Shigefumi Kamisaka, Kazunobu Abe
  • Patent number: 6311506
    Abstract: A control unit is disclosed for controlling a refrigerating machine in such a way that a refrigerating power exceeding the required performance is secured while the control unit has a function of bypassing hot gas by means of a hot gas bypass line. A temperature-responsive valve is mounted in the hot gas bypass line in addition to a pressure regulating valve. If a preset temperature Tr of a brine becomes equal to or higher than a given temperature (0° C.), the temperature-responsive valve opens the bypass line. If the preset temperature Tr becomes lower than the given temperature, the temperature-responsive valve closes the bypass line.
    Type: Grant
    Filed: July 7, 1999
    Date of Patent: November 6, 2001
    Assignee: Komatsu Ltd.
    Inventors: Norio Takahashi, Tsutomu Hatanaka, Toshiyuki Kamei
  • Patent number: 6197273
    Abstract: The invention provides a process for production of fine spherical particles of a carbonate or a hydroxide of nickel, cobalt or copper which comprises: dissolving a carbonate or a hydroxide of nickel, cobalt or copper having the general formula (I) M(CO3)x/2.(OH)y wherein M represents Ni, Co or Cu, and x and y are numerals satisfying the followings: 0≦x≦2, 0≦y≦2 and x+y=2, in aqueous ammonia, converting the resulting solution to a W/O emulsion containing droplets of the solution in a non-aqueous medium, and then removing volatile components including ammonia from within the droplets, thereby precipitating a basic carbonate or a hydroxide of a metal selected from nickel, cobalt and copperin the droplets.
    Type: Grant
    Filed: March 22, 2000
    Date of Patent: March 6, 2001
    Assignee: Sakai Chemical Industry Co., Ltd.
    Inventors: Kazuhiko Nagano, Kazunobu Abe, Shigefumi Kamisaka, Kiyoshi Fukai, Tsutomu Hatanaka, Shinji Ohgama, Hiroshi Nakao, Minoru Yoneda, Hideto Mizutani
  • Patent number: 6148909
    Abstract: A temperature control system which performs control of an object whose temperature is to be controlled as accurately as possible. The system comprises: a chiller located in a fluid circulating and supplying system, for cooling a thermal fluid returning from a vacuum chamber, a first flow control valve located in the fluid circulating and supplying system in a position between the chiller and the vacuum chamber, a bypass passage for splitting and supplying thermal fluid returning from the vacuum chamber to a position between the first flow control valve and the vacuum chamber, before it reaches the chiller, a second flow control valve located in the bypass passage, and a halogen lamp heater located in the fluid circulating and supplying system in a position between a confluence point of the bypass passage and the vacuum chamber, for adjusting the temperature of the thermal fluid passing therethrough to a set temperature.
    Type: Grant
    Filed: January 25, 1999
    Date of Patent: November 21, 2000
    Assignee: Komatsu Ltd.
    Inventors: Masashi Osanai, Shunsuke Miyamoto, Tomohisa Sato, Hiroaki Takechi, Tsutomu Hatanaka, Norio Takahashi, Toshiyuki Kamei, Takumi Sugihara, Isao Shibata, Hironori Akiba