Patents by Inventor Tsutomu Negishi
Tsutomu Negishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240096584Abstract: There is provided a sample milling apparatus capable of mitigating heat damage to a sample. The apparatus mills the sample by irradiating it with an ion beam and includes: an ion source for emitting the ion beam; and a shield plate placed on the sample and covering a part of the sample. The shield plate includes: a shield surface on which the ion beam impinges; and a bottom surface connected to the shield surface and forming a bottom edge. The bottom surface is smaller in area than the shield surface.Type: ApplicationFiled: September 15, 2023Publication date: March 21, 2024Inventors: Munehiro Kozuka, Tsutomu Negishi, Tatsuhito Kimura
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Patent number: 11837437Abstract: A specimen machining device for machining a specimen by irradiating the specimen with an ion beam includes an ion source for irradiating the specimen with the ion beam, a specimen stage for holding the specimen, a camera for photographing the specimen, an information provision unit for providing information indicating an expected machining completion time, and a storage unit for storing past machining information. The information provision unit performs processing for calculating the expected machining completion time based on the past machining information, processing for acquiring an image photographed by the camera, processing for calculating a machining speed based on the acquired image, and processing for updating the expected machining completion time based on the machining speed.Type: GrantFiled: June 3, 2022Date of Patent: December 5, 2023Assignee: JEOL Ltd.Inventors: Tatsuhito Kimura, Munehiro Kozuka, Tsutomu Negishi, Hisashi Kawahara
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Publication number: 20220392739Abstract: A specimen machining device for machining a specimen by irradiating the specimen with an ion beam includes an ion source for irradiating the specimen with the ion beam, a shielding member disposed on the specimen to block the ion beam, a specimen stage for holding the specimen, a camera for photographing the specimen, a coaxial illumination device for irradiating the specimen with illumination light along an optical axis of the camera, and a processing unit for determining whether to terminate the machining based on an image photographed by the camera. The processing unit performs processing for acquiring information indicating a target machined width, processing for acquiring the image, processing for measuring a machined width on the acquired image, and processing for terminating the machining when the measured machined width equals or exceeds the target machined width.Type: ApplicationFiled: June 3, 2022Publication date: December 8, 2022Inventors: Munehiro Kozuka, Tsutomu Negishi, Tatsuhito Kimura, Yoshikazu Ishikawa, Hisashi Kawahara
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Publication number: 20220392744Abstract: A specimen machining device for machining a specimen by irradiating the specimen with an ion beam includes an ion source for irradiating the specimen with the ion beam, a specimen stage for holding the specimen, a camera for photographing the specimen, an information provision unit for providing information indicating an expected machining completion time, and a storage unit for storing past machining information. The information provision unit performs processing for calculating the expected machining completion time based on the past machining information, processing for acquiring an image photographed by the camera, processing for calculating a machining speed based on the acquired image, and processing for updating the expected machining completion time based on the machining speed.Type: ApplicationFiled: June 3, 2022Publication date: December 8, 2022Inventors: Tatsuhito Kimura, Munehiro Kozuka, Tsutomu Negishi, Hisashi Kawahara
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Patent number: 11043355Abstract: An ion milling apparatus includes a sample holder, a vacuum chamber, an evacuation section, a vacuum gauge, a heater, a gas inlet assembly, and a control section. The evacuation section vents gas in the interior space of the vacuum chamber. The vacuum gauge measures the pressure in the interior space of the vacuum chamber. The heater heats the sample holder. The gas inlet assembly admits a dry gas containing no moisture into the interior space of the vacuum chamber. When the pressure in the interior space has reached below a given pressure, the control section controls the gas inlet assembly based on information about the pressure in the interior space so as to admit the dry gas into the vacuum chamber.Type: GrantFiled: December 3, 2019Date of Patent: June 22, 2021Assignee: JEOL LTD.Inventor: Tsutomu Negishi
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Patent number: 10930467Abstract: A sample holder system includes a sample holder and a sample adjusting unit. The sample holder includes a shielding plate, a holder body, a holding portion, and a fastening mechanism. The fastening mechanism fastens the holding portion to the holder body, the fastening mechanism preventing the holding portion from swinging when the holding portion is fastened to the holder body. The sample adjusting unit includes a position adjusting jig that comes into contact with the holding portion, and a swinging mechanism that supports the position adjusting jig such that the position adjusting jig is swingable.Type: GrantFiled: June 11, 2018Date of Patent: February 23, 2021Assignee: JEOL Ltd.Inventor: Tsutomu Negishi
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Publication number: 20200185187Abstract: An ion milling apparatus includes a sample holder, a vacuum chamber, an evacuation section, a vacuum gauge, a heater, a gas inlet assembly, and a control section. The evacuation section vents gas in the interior space of the vacuum chamber. The vacuum gauge measures the pressure in the interior space of the vacuum chamber. The heater heats the sample holder. The gas inlet assembly admits a dry gas containing no moisture into the interior space of the vacuum chamber. When the pressure in the interior space has reached below a given pressure, the control section controls the gas inlet assembly based on information about the pressure in the interior space so as to admit the dry gas into the vacuum chamber.Type: ApplicationFiled: December 3, 2019Publication date: June 11, 2020Inventor: Tsutomu Negishi
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Publication number: 20180358201Abstract: A sample holder system includes a sample holder and a sample adjusting unit. The sample holder includes a shielding plate, a holder body, a holding portion, and a fastening mechanism. The fastening mechanism fastens the holding portion to the holder body, the fastening mechanism preventing the holding portion from swinging when the holding portion is fastened to the holder body. The sample adjusting unit includes a position adjusting jig that comes into contact with the holding portion, and a swinging mechanism that supports the position adjusting jig such that the position adjusting jig is swingable.Type: ApplicationFiled: June 11, 2018Publication date: December 13, 2018Inventor: Tsutomu Negishi
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Patent number: 9507139Abstract: A specimen holder is used for an optical microscope, comprising: a specimen support that supports a specimen to enable the specimen to tilt relative to the optical axis of the optical microscope; an adjustment plate that has an observation surface for making observations using the optical microscope; and an adjustment plate support that supports the adjustment plate, so that the angle formed by the optical axis and the observation surface is larger than the angle formed by the optical axis and a specimen surface of the specimen.Type: GrantFiled: November 18, 2015Date of Patent: November 29, 2016Assignee: JEOL Ltd.Inventors: Tsutomu Negishi, Tooru Kasai
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Publication number: 20160139398Abstract: A specimen holder is used for an optical microscope, comprising: a specimen support that supports a specimen to enable the specimen to tilt relative to the optical axis of the optical microscope; an adjustment plate that has an observation surface for making observations using the optical microscope; and an adjustment plate support that supports the adjustment plate, so that the angle formed by the optical axis and the observation surface is larger than the angle formed by the optical axis and a specimen surface of the specimen.Type: ApplicationFiled: November 18, 2015Publication date: May 19, 2016Inventors: Tsutomu Negishi, Tooru Kasai
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Publication number: 20150311028Abstract: A sample preparation apparatus (100) is used to prepare a cross section of a sample (S) by irradiating it with an ion beam. The apparatus (100) includes an ion beam generator (10), a shield plate (40) disposed to cover a part of the sample (S) to shield the sample (S) from the ion beam, and a controller (82) controlling the ion beam generator (10). The controller (82) controls performance of first and second operations. In the first operation, the ion beam is accelerated by a first accelerating voltage and hits the sample (S) while the sample (S) and the shield plate (40) are located in a given positional relationship. In the second operation, the ion beam is accelerated by a second accelerating voltage lower than the first accelerating voltage and hits the sample (S) while the given positional relationship is maintained.Type: ApplicationFiled: February 25, 2015Publication date: October 29, 2015Inventor: Tsutomu Negishi
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Patent number: 8716683Abstract: An ion beam processing system (100) processes the sample (S) mounted on a sample stage (30) by irradiating the sample with an ion beam in a sample chamber (2). The system has a sample container (20) including a cover portion (26) formed to be detachably mountable to a base portion (24), the sample stage (30) on which the container (20) is detachably mountable, and cover mounting/dismounting apparatus (40) for mounting and dismounting the cover portion (26) from outside the sample chamber (2).Type: GrantFiled: November 19, 2012Date of Patent: May 6, 2014Assignee: JEOL Ltd.Inventor: Tsutomu Negishi
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Publication number: 20110008264Abstract: A rodent repelling method which uses smoke. The rodent repelling method of the invention is a method for repelling a rodent, which uses a smoke generated by thermal decomposition of azodicarbonamide as an active ingredient and the aforementioned smoke is diffused to a smoke quantity of 45 cpm or more.Type: ApplicationFiled: December 17, 2007Publication date: January 13, 2011Applicant: Earth Chemical Co., Ltd.Inventors: Tsutomu Negishi, Tomihiro Kobori, Kei Ishii, Masanaga Yamaguchi
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Patent number: 7154616Abstract: In case a file is prepared by executing an application, the fee for the use of the application is charged according to whether such file is subjected to an output process. Thus the user of the application need not pay the fee for the use of the application for the mere preparation of the file by using the application.Type: GrantFiled: April 24, 2001Date of Patent: December 26, 2006Assignee: Canon Kabushiki KaishaInventors: Yoshihiko Watanabe, Jiro Kojima, Masayuki Yoshida, Tsuneaki Kurumida, Tsutomu Negishi, Yuichiro Yamasawa, Yoshio Kimura, Yoshiji Kanamoto
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Patent number: 6888137Abstract: There is disclosed a scanning electron charged-particle beam instrument facilitating a search for a desired field of view on a specimen. Also, a method of observing a specimen image with this instrument is disclosed. In field of view search mode, low-magnification images are gained from plural regions on the specimen. The image signals gained from the regions are sent to corresponding image memories and stored there. At the same time, the X and Y coordinates of the specimen at the low magnification are stored. If the image is rotated, the angular position and the direction are simultaneously stored. The image signals stored in the image memories are supplied to a CRT, and plural specimen images are displayed on the CRT. If a human operator selects a desired one out of the displayed images, a control unit controls a stage control unit according to coordinates read out, driving an X-Y translation stage.Type: GrantFiled: June 14, 2000Date of Patent: May 3, 2005Assignee: JEOL Ltd.Inventors: Atsushi Yamada, Tsutomu Negishi, Toshiharu Kobayashi, Norio Watanabe
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Patent number: 6804016Abstract: There is disclosed a control apparatus for a scanner/printer including a unit for generating print data described in a page description language, a unit for generating a command regarding a scanner for scanning an original image, and a unit for producing the print data and the command regarding the scanner to a common device through a network.Type: GrantFiled: June 19, 1997Date of Patent: October 12, 2004Assignee: Canon Kabushiki KaishaInventors: Yasuhiko Hashimoto, Susumu Sugiura, Yoshikazu Yokomizo, Yoshinobu Mita, Makoto Takaoka, Mitsumasa Sugiyama, Shigetada Kobayashi, Junichi Shishizuka, Tsutomu Negishi, Osamu Yamada, Yukari Toda, Kazuhiro Saito, Masanari Toda, Yasuo Fukuda
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Patent number: 6787770Abstract: This disclosure is directed to a method of inspecting how contact holes or via holes are formed in a sample, such as a wafer. An electron beam is directed to the contact holes in succession. An absorbed current flowing through the sample is detected by a current amplifier. Data about the obtained absorbed current is stored in a memory. The electric current flowing through a reference sample and ground is measured, and the relation of the current to the etch depths of contact holes into the substrate is previously found. A control unit compares data about the measured current with the previously found relation and determines the depths of holes of interest into the substrate (i.e., inspects how they are etched).Type: GrantFiled: January 30, 2002Date of Patent: September 7, 2004Assignee: JEOL Ltd.Inventors: Naoki Kikuchi, Tsutomu Negishi, Yuki Ono
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Publication number: 20030104639Abstract: This disclosure is directed to a method of inspecting how contact holes or via holes are formed in a sample, such as a wafer. An electron beam is directed to the contact holes in succession. An absorbed current flowing through the sample is detected by a current amplifier. Data about the obtained absorbed current is stored in a memory. The electric current flowing through a reference sample and ground is measured, and the relation of the current to the etch depths of contact holes into the substrate is previously found. A control unit compares data about the measured current with the previously found relation and determines the depths of holes of interest into the substrate (i.e., inspects how they are etched).Type: ApplicationFiled: January 30, 2002Publication date: June 5, 2003Applicant: JEOL Ltd.Inventors: Naoki Kikuchi, Tsutomu Negishi, Yuki Ono
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Patent number: 6444991Abstract: There is disclosed a scanning electron charged-particle beam instrument in which the image does not escape during rotation even if the center of mechanical rotation is not coincident with the center of the image. The instrument is so operated that the center position of the image is fixed when a mechanical rotation is made if the center of mechanical rotation is not coincident with the center of the image. For this purpose, when the specimen stage assembly is rotated mechanically, the X-stage of the specimen stage assembly is driven to move in the X-direction. The Y-stage of the stage assembly is driven to move in the Y-direction. The distance L between the center of mechanical rotation and the moving speed of the X-Y stage are interlinked. The apparent speed of the rotational speed of the image on the viewing screen is made constant irrespective of the distance L. In practice, the moving speed of the X-Y stage is increased with increasing the distance L.Type: GrantFiled: July 19, 2000Date of Patent: September 3, 2002Assignee: Jeol Ltd.Inventors: Atsushi Yamada, Tsutomu Negishi, Toshiharu Kobayashi, Norio Watanabe
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Publication number: 20020051164Abstract: In case a file is prepared by executing an application, the fee for the use of the application is charged according to whether such file is subjected to an output process. Thus the user of the application need not pay the fee for the use of the application for the mere preparation of the file by using the application.Type: ApplicationFiled: April 24, 2001Publication date: May 2, 2002Inventors: Yoshihiko Watanabe, Jiro Kojima, Masayuki Yoshida, Tsuneaki Kurumida, Tsutomu Negishi, Yuichiro Yamasawa, Yoshio Kimura, Yoshiji Kanamoto