Abstract: There is provided a material for an anode buffer lay which permits the use of an organic solvent as a solvent an anode buffer layer-forming solution, and is capable forming an anode buffer layer that does not dissolve even win coated with a luminescent layer-forming material solution containing an organic solvent as a solvent, and which is capable of producing an organic EL element having high electrical power efficiency and long life.

Abstract: There is provided a material for an anode buffer layer which permits the use of an organic solvent as a solvent of an anode buffer layer-forming solution, and is capable of forming an anode buffer layer that does not dissolve even when coated with a luminescent layer-forming material solution containing an organic solvent as a solvent, and which is capable of producing an organic EL element having high electrical power efficiency and long life.

Abstract: [Problem] To provide an organic light-emitting element material which can be favorably used for obtaining an organic light-emitting element that emits light with high luminance, exhibits high external quantum efficiency and has excellent durability. [Solution to Problem] An organic light-emitting element material which is a high-molecular compound including k % by mol (0<k?100) of a constitutional unit represented by the following formula (1a) and n % by mol (0?n<100 and k+n=100) of a constitutional unit represented by the following formula (1b).

Abstract: A charge-transporting polymer including a unit derived from at least one polymerizable compound represented by formula (1), formula (2) and formula (3): where R1 to R3 are as defined herein.

Abstract: Hydroxycitric acid derivatives and salts thereof are provided which are useful as active ingredients of skin external preparations and cosmetics. Also provided are processes for production of the hydroxycitric acid derivatives, and skin external preparations and cosmetics containing the hydroxycitric acid derivatives. Specific hydroxycitric acid derivatives or salts thereof are produced wherein at least one of the hydroxyl groups of hydroxycitric acid or least one of the hydroxyl groups and at least one carboxyl group of hydroxycitric acid are modified to linkage moieties breakable by biological enzyme reaction. The hydroxycitric acid derivatives or salts thereof are added in skin external preparations and cosmetics.

Abstract: In a method of forming an electrically conductive lamination pattern, an insulating film is formed on a surface of a chromium-containing bottom layer, before an aluminum-containing top layer is formed over the insulating film, so that the insulating film separates the aluminum-containing top layer from the chromium-containing bottom layer. A first selective wet etching process is carried out for selectively etching the aluminum-containing top layer with a first etchant. A second selective wet etching process is carried out for selectively etching the chromium-containing bottom layer with a second etchant in the presence the insulating film which suppresses a hetero-metal-contact-potential-difference between the chromium-containing bottom layer and the aluminum-containing top layer during the second selective wet etching process.

Abstract: A method for manufacturing a TFT panel of an LCD device includes the steps of wet etching a multilayer metallic structure including a high-melting-point metal film (HMPM) film, Al film and another HMPM film while using side etching technique by using a photoresist mask, hot-water washing the side walls of the Al film after the wet etching, and dry etching for configuring the channel region of a TFT in each pixel, and removing the photoresist mask. The presence of the photoresist mask and the protection film prevents corrosion of Al caused by plasma of the etching gas in the dry etching.

Abstract: A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the ?- and/or ?-position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.

Abstract: The invention provides an organic polymer light-emitting material, which is obtained by (co)polymerizing one or more polymerizable compounds having a substituent in which a polymerizable double bond moiety represented by formula (2): (the symbols have the same meanings as defined in the Description) is bonded to one of the carbon atoms of an aromatic ring, wherein at least one of the polymerizable compounds is an iridium complex represented by formula (1): (the symbols have the same meanings as defined in the Description). The material has a high emission efficiency and an good film-formability, and is suitably used for production of large-area device and mass-production thereof. Further, the invention provides organic light-emitting elements using the material in its light-emitting layer, and area light sources and image display devices using the element.

Abstract: Hydroxycitric acid derivatives and salts thereof are provided which are useful as active ingredients of skin external preparations and cosmetics. Also provided are processes for production of the hydroxycitric acid derivatives, and skin external preparations and cosmetics containing the hydroxycitric acid derivatives. Specific hydroxycitric acid derivatives or salts thereof are produced wherein at least one of the hydroxyl groups of hydroxycitric acid or least one of the hydroxyl groups and at least one carboxyl group of hydroxycitric acid are modified to linkage moieties breakable by biological enzyme reaction. The hydroxycitric acid derivatives or salts thereof are added in skin external preparations and cosmetics.

Abstract: A method for manufacturing a TFT panel of an LCD device includes the steps of wet etching a multilayer metallic structure including a high-melting-point metal film (HMPM) film, Al film and another HMPM film while using side etching technique by using a photoresist mask, hot-water washing the side walls of the Al film after the wet etching, and dry etching for configuring the channel region of a TFT in each pixel, and removing the photoresist mask. The presence of the photoresist mask and the protection film prevents corrosion of Al caused by plasma of the etching gas in the dry etching.

Abstract: In a method of forming an electrically conductive lamination pattern, an insulating film is formed on a surface of a chromium-containing bottom layer, before an aluminum-containing top layer is formed over the insulating film, so that the insulating film separates the aluminum-containing top layer from the chromium-containing bottom layer. A first selective wet etching process is carried out for selectively etching the aluminum-containing top layer with a first etchant. A second selective wet etching process is carried out for selectively etching the chromium-containing bottom layer with a second etchant in the presence the insulating film which suppresses a hetero-metal-contact-potential-difference between the chromium-containing bottom layer and the aluminum-containing top layer during the second selective wet etching process.

Abstract: In a method of forming an electrically conductive lamination pattern, an insulating film is formed on a surface of a chromium-containing bottom layer, before an aluminum-containing top layer is formed over the insulating film, so that the insulating film separates the aluminum-containing top layer from the chromium-containing bottom layer. A first selective wet etching process is carried out for selectively etching the aluminum-containing top layer with a first etchant. A second selective wet etching process is carried out for selectively etching the chromium-containing bottom layer with a second etchant in the presence the insulating film which suppresses a hetero-metal-contact-potential-difference between the chromium-containing bottom layer and the aluminum-containing top layer during the second selective wet etching process.

Abstract: A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the ?- and/or ?-position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.

Abstract: The object is to provide a photosensitive resin which is improved in the environmental problem or working environment problem, reduced in the load on a production apparatus and enhanced in the safety during transportation or storage while maintaining the resolution, etching resistance and low cost of conventional liquid photosensitive resin compositions. Another object is to provide a production process of a printed wiring board, where the non-uniformity of film thickness or liquid dripping at the time of coating a photosensitive resin on a printed board by a dipping method is reduced and high quality and excellent productivity are ensured. The objects were achieved by using a photosensitive resin composition comprising a specific compound having two or more polymerizable unsaturated bonds within one molecule, a photopolymerization initiator, water, and a thixotropic agent, and, if necessary, an amine.

Abstract: In a method of forming an electrically conductive lamination pattern, an insulating film is formed on a surface of a chromium-containing bottom layer, before an aluminum-containing top layer is formed over the insulating film, so that the insulating film separates the aluminum-containing top layer from the chromium-containing bottom layer. A first selective wet etching process is carried out for selectively etching the aluminum-containing top layer with a first etchant. A second selective wet etching process is carried out for selectively etching the chromium-containing bottom layer with a second etchant in the presence the insulating film which suppresses a hetero-metal-contact-potential-difference between the chromium-containing bottom layer and the aluminum-containing top layer during the second selective wet etching process.

Abstract: A photosensitive coloring composition for color filters using coloring compositons containd (A) a binder resin having an amido group and a carboxyl group and (B) a coloring material has excellent photosensitivity and has improved dispersibility upon producing in particular a coloring composition containing a black pigment such as a carbon black. Use of (A) an epoxy(meth)acrylate resin can further improve the photosensitivity and from a black matrix having sufficient film strenght and low reflectivity. Furhter, use of a modified carbon black treated with a compound having a isocyanate group and an ethylenically unsaturaged bond in a molecule as the coloring material can give rise to a photosensitive resin composition excellent in optically opaque property, photosensitivity and dispersion stability.

Abstract: A method for manufacturing a TFT panel of an LCD device includes the steps of wet etching a multilayer metallic structure including a high-melting-point metal film (HMPM) film, Al film and another HMPM film while using side etching technique by using a photoresist mask, hot-water washing the side walls of the Al film after the wet etching, and dry etching for configuring the channel region of a TFT in each pixel, and removing the photoresist mask. The presence of the photoresist mask and the protection film prevents corrosion of Al caused by plasma of the etching gas in the dry etching.

Abstract: A voltage of a front channel 42 (gate side wiring) of a thin film transistor is made equal to a voltage of a back channel 44 (liquid crystal alignment side) thereof by electrically connecting a gate electrode 2 and a back channel electrode 82 through a gate contact hole 10 to a semiconductor layer 4 constituting the thin film transistor. The thin film transistor is fabricated through four patterning steps by simultaneously etching the semiconductor layer and a transparent electrode by using a photo resist on the front channel.

Abstract: A stabilizer for thermally stabilizing an organic borate salt represented by formula (1) is disclosed, comprising a compound having one or two nitrogen-containing 5- or 6-membered heterocyclic ring having a double bond within the ring, a compound having a primary, secondary or tertiary amino group, or a compound having a thiol group. Also disclosed are a photosensitive composition comprising the stabilizer, an organic borate salt and if desired, a sensitizing dye or further a bisimidazole compound; a polymerizable composition comprising the photosensitive composition having added thereto at least one monomer having one or more ethylenically unsaturated bond and if desired, a high molecular polymer or further a pigment; and a colored pattern formed by using the polymerizable composition.