Patents by Inventor Tsuyoshi Kimura
Tsuyoshi Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160058910Abstract: A particulate decellularized tissue is provided which shows sufficiently effective tissue regeneration and does not show cytotoxicity when used as material for cell culture. In accordance with the method for preparing a particulate decellularized tissue comprising a step of applying a high hydrostatic pressure to animal-derived tissues in a medium, a particulate decellularized tissue is obtained which does not show cytotoxicity but shows the effect of cellular attraction and the effect of induction of cellular differentiation and shows a high effect of tissue regeneration.Type: ApplicationFiled: May 2, 2014Publication date: March 3, 2016Applicants: NATIIONAL UNIVERSITY CORPORATION TOKYO MEDICAL AND DENTAL UNIVERSITY, ADEKA CORPORATIONInventors: Akio KISHIDA, Tsuyoshi KIMURA, Jun NEGISHI, Ken-ichiro HIWATARI, Akiko TASAKI
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Publication number: 20160059378Abstract: The present invention is directed to a method for producing a polishing pad having a polishing layer comprising a sheet of a flexible polyurethane resin foam, the flexible polyurethane resin foam having an Asker D hardness of 30 or less at 25° C., and the method comprising: step A of cooling a block comprising the flexible polyurethane resin foam to be adjusted into an Asker D hardness of 35 or more; and step B of slicing the block, the Asker D hardness of which has been adjusted by the cooling, into a predetermined thickness to yield the sheet of the flexible polyurethane resin foam. The method for producing a polishing pad of the present invention makes it possible to slice, with a good precision, a block comprising a flexible polyurethane resin foam.Type: ApplicationFiled: February 24, 2014Publication date: March 3, 2016Inventor: Tsuyoshi KIMURA
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Publication number: 20160051731Abstract: A hybrid gel comprising a particulate decellularized tissue (obtained by pulverizing animal-derived biological tissues that are decellularized (decellularized biological tissues)), fibrinogen and thrombin; a cell culture material comprising the hybrid gel; a method for preparing the hybrid gel; and a kit comprising a particulate decellularized tissue and a biological tissue adhesive are provided. The hybrid gel of the present invention exerts the effect to promote differentiation and gain of function of stem cells and the therapeutic effect to a variety of diseases.Type: ApplicationFiled: May 2, 2014Publication date: February 25, 2016Applicants: THE CHEMO-SERO-THERAPEUTIC RESEARCH INSTITUTE, NATIONAL UNIVERSITY CORPORATION TOKYO MEDICAL AND DENTAL UNIVERSITY, SAPPORO MEDICAL UNIVERSITY, ADEKA CORPORATIONInventors: Junichi MATSUDA, Sumika MIYABASHIRA, Satomi HARANO, Akio KISHIDA, Tsuyoshi KIMURA, Jun NEGISHI, Tetsuya HIGAMI, Seiichi FUNAMOTO, Ken-ichiro HIWATARI, Akiko TASAKI
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Publication number: 20160054532Abstract: An optical fiber cable is formed with an optical fiber and a coating layer made up of at least one layer provided on the outer periphery of the optical fiber. The material for forming the coating layer is made of a halogen-free resin composition containing polyolefin resin (A) and melt tension enhancer (B).Type: ApplicationFiled: March 20, 2014Publication date: February 25, 2016Applicant: MITSUBISHI RAYON CO., LTD.Inventors: Tsuyoshi KIMURA, Yoshihiro TSUKAMOTO, Kouji ASANO
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Publication number: 20150343604Abstract: The present invention includes a polishing pad production method comprising a step of forming one or more grooves in a surface of a polishing layer comprising a flexible polyurethane foam, wherein the flexible polyurethane foam has an Asker D hardness of 30 or less at 25° C., and the step comprises a step 1 of cooling the polishing layer to adjust the Asker D hardness of the flexible polyurethane foam to 35 or more, and a step 2 of forming one or more grooves in the surface of the polishing layer comprising the flexible polyurethane foam, the Asker D hardness of which has been adjusted by the cooling. According to the polishing pad production method of the present invention, it is possible to provide a polishing pad production method capable of performing grooving in a polishing layer with a high precision when the polishing layer comprises a flexible polyurethane foam.Type: ApplicationFiled: October 18, 2013Publication date: December 3, 2015Applicant: TOYO TIRE & RUBBER CO., LTD.Inventor: Tsuyoshi KIMURA
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Publication number: 20150343596Abstract: A circular polishing pad includes a circular polishing layer having XY grid grooves on a polishing surface. The center point of the circular polishing layer is offset in a region (Z) (including imaginary straight lines) enclosed by three imaginary straight lines (A, B, and C) each shifted by a groove pitch of 5% in relation to reference lines defined by an X groove or a Y groove. The circular polishing pad can minimize polishing unevenness on the surface of a material to be polished.Type: ApplicationFiled: December 4, 2013Publication date: December 3, 2015Inventor: Tsuyoshi KIMURA
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Publication number: 20150336234Abstract: The present invention relates to a method for producing a layered circular polishing pad, comprising steps of forming, in a circular polishing sheet, concentric grooves and an outer circumferential region having a width of ½ or more of a groove pitch of the concentric grooves; and bonding the circular polishing sheet and a supporting layer to each other with a bonding member interposed therebetween to produce a layered polishing sheet. According to the present invention, it is possible to provide a method for producing a layered circular polishing pad in which the polishing layer and the supporting layer are not easily peeled from each other.Type: ApplicationFiled: October 18, 2013Publication date: November 26, 2015Inventor: Tsuyoshi KIMURA
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Patent number: 9156126Abstract: An object of the invention is to provide a polishing pad that is prevented from slurry leaks and has high optical detection accuracy. The present invention relates to a polishing pad comprising a polishing region, a cushion layer, and a support film layered in this order, wherein a light-transmitting region is provided on the support film and in an opening part that passes through the polishing region and the cushion layer; the light-transmitting region has a peripheral part and a recessed part on the surface of a polishing platen-side; the support film is layered on the peripheral part; and the support film is not layered on the recessed part, which remains open.Type: GrantFiled: August 24, 2012Date of Patent: October 13, 2015Assignee: TOYO TIRE & RUBBER CO., LTD.Inventor: Tsuyoshi Kimura
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Publication number: 20150266077Abstract: A stretch forming system has jaws clamping a workpiece at end edge portions, a die disposed between the jaws and coming into contact with the workpiece, and a plurality of control axes changing relative positions and orientations of the jaws with respect to the die, and has a jaw path calculating unit calculating paths of the relative positions and orientations of the jaws with respect to the die when the workpiece is wrapped onto the die by moving the die in a vertical direction under a restricting condition that the positions and orientations of the jaws are freely changeable except for movement in a vertical direction being regulated, and a control axis operation pattern calculating unit calculating operation patterns of the plurality of the control axes achieving the paths of the jaws.Type: ApplicationFiled: October 9, 2013Publication date: September 24, 2015Applicant: KAWASAKI JUKOGYO KABUSHIKI KAISHAInventors: Tsuyoshi Kimura, Seishiro Kawano, Shinichi Nakano, Fumihiro Honda
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Patent number: 9126304Abstract: An object of the present invention is to provide a polishing pad which enables high accuracy optical end-point detection in a state where polishing is carrying out, and which can prevent slurry leakage from a polishing layer to a cushion layer even in the case of being used for a long period. Another object is to provide a method for producing a semiconductor device using the polishing pad. The present invention relates to a polishing pad in which a polishing layer having a polishing region and a light-transmitting region, and a cushion layer having a through hole are laminated via a double-sided adhesive sheet such that the light-transmitting region and the through hole are laid one upon another, wherein a transparent member is stuck on an adhesive layer of the double-sided adhesive sheet in the through hole.Type: GrantFiled: April 7, 2011Date of Patent: September 8, 2015Assignee: TOYO TIRE & RUBBER CO., LTD.Inventor: Tsuyoshi Kimura
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Publication number: 20150210597Abstract: An oxide ceramic having a principal component formed of a ferrite compound containing at least Sr, Co, and Fe, and zirconium in an amount of 0.05 to 1.0 wt. % on an oxide equivalent basis, and a ceramic electronic component using the oxide ceramic.Type: ApplicationFiled: April 9, 2015Publication date: July 30, 2015Inventors: Sakyo Hirose, Tsuyoshi Kimura
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Patent number: 9075213Abstract: Provided is a plastic optical fiber cable including a plastic optical fiber 12 comprising of a core 11A and a cladding 11B, and a jacketing layer covering the plastic optical fiber 12, in which the jacketing layer includes at least two layers of an inner layer 13 and an outer layer 14, the inner layer 13 is formed of a resin comprising of a copolymer of ethylene and a (meth)acrylic compound, and the outer layer 14 is formed of a fluorine-based resin. A plastic optical fiber cable excellent in flame retardance, appearance, and processability at the time of use is obtained from the plastic optical fiber cable described above.Type: GrantFiled: September 14, 2012Date of Patent: July 7, 2015Assignee: MITSUBISHI RAYON CO., LTD.Inventors: Tsuyoshi Kimura, Yoshihiro Tsukamoto, Kouji Asano
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Publication number: 20150174725Abstract: The purpose of the present invention is to provide a method for manufacturing a laminated polishing pad in which a polishing layer and a support layer resist delamination even when heated to high temperature due to long-time polishing, and the support layer is less likely to wrinkle. This method for manufacturing a laminated polishing pad, comprising the steps of: preparing a laminate comprising a polishing layer, a support layer, and a hot-melt adhesive member placed between the polishing layer and the support layer; and allowing the laminate to pass between a pair of lamination rolls so that the polishing layer and the support layer are bonded with the hot-melt adhesive member to form a laminated polishing sheet, wherein in the laminate, the ratio TD1 (TD length of the polishing layer)/TD2 (TD length of the support layer) is constantly adjusted to 0.3 or more.Type: ApplicationFiled: May 20, 2013Publication date: June 25, 2015Inventor: Tsuyoshi Kimura
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Patent number: 9018099Abstract: An object of the present invention is to provide a polishing pad that is prevented from causing an end-point detection error due to a reduction in light transmittance from the early stage to the final stage of the process, and to provide a method of producing a semiconductor device with the polishing pad. The present invention is directed to a polishing pad, comprising a polishing layer comprising a polishing region and a light-transmitting region, wherein a polishing side surface of the light-transmitting region is subjected to a surface roughness treatment, and the light-transmitting region has a light transmittance of 40% to 60% at a wavelength of 600 nm before use.Type: GrantFiled: March 12, 2008Date of Patent: April 28, 2015Assignee: Toyo Tire & Rubber Co., Ltd.Inventors: Kazuyuki Ogawa, Atsushi Kazuno, Tsuyoshi Kimura, Tetsuo Shimomura
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Patent number: 8993648Abstract: A polishing pad capable of maintaining a high level of dimensional stability during absorption of moisture or water includes a polishing layer including a polyurethane foam having fine cells, wherein the polyurethane foam includes a cured product of a reaction of an isocyanate-terminated prepolymer (A), a polymerized diisocyanate, and a chain extender, and the isocyanate-terminated prepolymer (A) includes an isocyanate monomer, a high molecular weight polyol (a), and a low molecular weight polyol. A method for manufacturing such a polishing pad includes mixing a first component containing an isocyanate-terminated prepolymer with a second component containing a chain extender and curing the mixture to form a polyurethane foam. The pad so made is used in the manufacture of semiconductor devices.Type: GrantFiled: August 16, 2007Date of Patent: March 31, 2015Assignee: Toyo Tire & Rubber Co., Ltd.Inventors: Yoshiyuki Nakai, Tsuyoshi Kimura, Atsushi Kazuno, Kazuyuki Ogawa, Tetsuo Shimomura
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Publication number: 20150059253Abstract: A polishing pad capable of maintaining a high level of dimensional stability during absorption of moisture or water includes a polishing layer including a polyurethane foam having fine cells, wherein the polyurethane foam includes a cured product of a reaction of an isocyanate-terminated prepolymer (a), a polymerized diisocyanate, and a chain extender, and the isocyanate-terminated prepolymer (a) includes an isocyanate monomer, a high molecular weight polyol (a), and a low molecular weight polyol. A method for manufacturing such a polishing pad includes mixing a first component containing an isocyanate-terminated prepolymer with a second component containing a chain extender and curing the mixture to form a polyurethane foam. The pad so made is used in the manufacture of semiconductor devices.Type: ApplicationFiled: November 10, 2014Publication date: March 5, 2015Applicant: TOYO TIRE & RUBBER CO., LTD.Inventors: Yoshiyuki NAKAI, Tsuyoshi KIMURA, Atsushi KAZUNO, Kazuyuki OGAWA, Tetsuo SHIMOMURA
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Patent number: 8899092Abstract: A bending apparatus for corrugating a sheet-like material can comprise a support member, a feed mechanism, a bending member, a hold-down member, and a driving mechanism. The support member can comprise a support surface with corrugations. The feed mechanism can be configured to feed the support member in increments of one pitch of the support member corrugations. The bending member can be configured to reciprocate between a retracted position and an actuated position mating with a corrugation on the support surface so material laying on the support surface is bent along the support member corrugation. The hold-down member can be configured to be reciprocated between a retracted position and an actuated position holding the material against the support surface. The drive mechanism can be configured to sequentially reciprocate the bending member and the hold-down member so the hold-down member presses down the material and the bending member bends the material.Type: GrantFiled: June 17, 2011Date of Patent: December 2, 2014Assignee: Kabushiki Kaisha F.C.C.Inventors: Kensuke Oguri, Tsuyoshi Kimura
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Publication number: 20140341518Abstract: Provided is a plastic optical fiber cable including a plastic optical fiber 12 comprising of a core 11A and a cladding 11B, and a jacketing layer covering the plastic optical fiber 12, in which the jacketing layer includes at least two layers of an inner layer 13 and an outer layer 14, the inner layer 13 is formed of a resin comprising of a copolymer of ethylene and a (meth)acrylic compound, and the outer layer 14 is formed of a fluorine-based resin. A plastic optical fiber cable excellent in flame retardance, appearance, and processability at the time of use is obtained from the plastic optical fiber cable described above.Type: ApplicationFiled: September 14, 2012Publication date: November 20, 2014Inventors: Tsuyoshi Kimura, Yoshihiro Tsukamoto, Kouji Asano
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Publication number: 20140213151Abstract: An object of the invention is to provide a polishing pad that is prevented from slurry leaks and has high optical detection accuracy. The present invention relates to a polishing pad comprising a polishing region, a cushion layer, and a support film layered in this order, wherein a light-transmitting region is provided on the support film and in an opening part that passes through the polishing region and the cushion layer; the light-transmitting region has a peripheral part and a recessed part on the surface of a polishing platen-side; the support film is layered on the peripheral part; and the support film is not layered on the recessed part, which remains open.Type: ApplicationFiled: August 24, 2012Publication date: July 31, 2014Applicant: TOYO TIRE & RUBBER CO., LTD.Inventor: Tsuyoshi Kimura
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Publication number: 20140133812Abstract: A composition for jacketing an optical fiber including a modified PPE resin containing a polyphenylene ether resin and a thermoplastic resin compatible with the polyphenylene ether resin, and a non halogen-based flame retardant, in which a nitrogen compound is included as the non halogen-based flame retardant and the content of nitrogen element in the composition is in the range of 100000 to 300000 ppm as measured by an elementary analysis.Type: ApplicationFiled: June 14, 2012Publication date: May 15, 2014Applicant: MITSUBISHI RAYON CO., LTD.Inventors: Tsuyoshi Kimura, Yoshihiro Tsukamoto, Kouji Asano, Akira Yoshioka, Rie Akihara