Patents by Inventor Tsuyoshi Kurosawa
Tsuyoshi Kurosawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150093507Abstract: A method of producing a structure containing a phase-separated structure, the method including: a step of forming a layer of a neutralization film; a step of form a layer containing a mixture of a plurality of block copolymers having different periods; and a step of phase-separating the layer containing the plurality of block copolymers.Type: ApplicationFiled: September 23, 2014Publication date: April 2, 2015Inventors: Tsuyoshi Kurosawa, Daiju Shiono, Ken Miyagi, Tasuku Matsumiya, Kenichiro Miyashita, Katsumi Ohmori
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Publication number: 20150044371Abstract: A method of producing a structure containing a phase-separated structure, including applying a neutralization film to a substrate to form a layer of a neutralization film; applying a block copolymer having a plurality of polymers bonded thereto, and a weight average molecular weight of 150,000 or more to the layer of the neutralization film, so as to form a layer containing the block copolymer and having a coating film thickness of 23 nm or less; and phase-separating the layer containing the block copolymer.Type: ApplicationFiled: August 6, 2014Publication date: February 12, 2015Inventors: Tsuyoshi Kurosawa, Daiju Shiono, Ken Miyagi, Tasuku Matsumiya, Kenichiro Miyashita, Katsumi Ohmori
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Publication number: 20140238954Abstract: A method of producing a structure containing a phase-separated structure, including forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit; forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer; and subjecting the layer containing the block copolymer on which the top coat film is formed to phase separation by thermal annealing.Type: ApplicationFiled: February 20, 2014Publication date: August 28, 2014Applicants: Tokyo Institute of Technology, Tokyo Ohka Kogyo Co., Ltd.Inventors: Tasuku Matsumiya, Takehiro Seshimo, Katsumi Ohmori, Ken Miyagi, Daiju Shiono, Kenichiro Miyashita, Tsuyoshi Kurosawa, Teruaki Hayakawa
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Patent number: 8795947Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) including a structural unit (a0) represented by general formula (a0-1) and a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid (R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; W represents —COO—, a —CONH— group or a divalent aromatic hydrocarbon group; Y1 and Y2 represent a divalent linking group or a single bond; R?1 represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms; R?2 represents a monovalent aliphatic hydrocarbon group; and R2 represents an —SO2— containing cyclic group).Type: GrantFiled: March 19, 2013Date of Patent: August 5, 2014Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Hirano, Makiko Irie, Kotaro Endo, Tsuyoshi Kurosawa
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Publication number: 20130252171Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) including a structural unit (A) represented by general formula (a0-1) and a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid (R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; W represents —COO—, a —CONH— group or a divalent aromatic hydrocarbon group; Y1 and Y2 represent a divalent linking group or a single bond; represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms; R?2 represents a monovalent aliphatic hydrocarbon group; and R2 represents an —SO2— containing cyclic group).Type: ApplicationFiled: March 19, 2013Publication date: September 26, 2013Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Hirano, Makiko Irie, Kotaro Endo, Tsuyoshi Kurosawa
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Publication number: 20130243958Abstract: An undercoat agent which is used for phase separating a layer including a block copolymer having a plurality of blocks bonded formed on a substrate, wherein the undercoat agent contains a resin component, the resin component includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer, including: a step (1) in which the undercoat agent is applied to a substrate to form a layer containing the undercoat agent; a step (2) in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and a step (3) in which a phase containing at least one block of the plurality of blocks constituting the block coType: ApplicationFiled: March 8, 2013Publication date: September 19, 2013Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Takahiro Senzaki, Ken Miyagi, Tsuyoshi Kurosawa, Daiju Shiono, Tasuku Matsumiya, Kenichiro Miyashita, Katsumi Ohmori
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Patent number: 8518629Abstract: A resist composition for immersion exposure, including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing compound (C) represented by general formula (c-1) (in formula (c-1), R1 represents an organic group which may contain a polymerizable group; X represents a divalent organic group having an acid dissociable portion; and R2 represents an organic group having a fluorine atom).Type: GrantFiled: August 26, 2011Date of Patent: August 27, 2013Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tsuyoshi Kurosawa, Hiroaki Shimizu
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Patent number: 8479531Abstract: There is provided a liquid containing bag capable of supplying mixture directly to a cooling cylinder from the bag without depending on gravity and without moving the mixture into a hopper. A liquid containing bag 5 comprises a bag main body 21 containing a liquid and having flexibility, and an outer layer member 23 disposed outside the bag main body 21, capable of forming a sealed space between the outer layer member and the bag main body 21, and having flexibility. Therefore, for example, when compressed air is sealed between the outer layer member 23 and the bag main body 21, an volume of the sealed space between them is enlarged, and the liquid cooled in the bag main body 21 can be pushed to the outside.Type: GrantFiled: July 3, 2003Date of Patent: July 9, 2013Assignee: Sanyo Electric Co., Ltd.Inventors: Kazuya Maeda, Tsuyoshi Kurosawa, Takeshi Ishii, Koichiro Ikemoto
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Patent number: 8475997Abstract: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.Type: GrantFiled: December 23, 2011Date of Patent: July 2, 2013Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Daiju Shiono, Tomoyuki Hirano, Sanae Furuya, Takahiro Dazai, Hiroaki Shimizu, Tsuyoshi Kurosawa, Hideto Nito, Tsuyoshi Nakamura
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Publication number: 20130065180Abstract: A resist composition comprising: a base component (A) which exhibits changed solubility in a developing solution under action of acid; an acid-generator component (B) which generates acid upon exposure; and a compound (D1) including of a cation moiety which contains a quaternary nitrogen atom, and an anion moiety represented by formula (d1-an1) or (d1-an2) shown below. In the formulas, X represents a cyclic aliphatic hydrocarbon group of 3 to 30 carbon atoms which may have a substituent; and Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent.Type: ApplicationFiled: September 6, 2012Publication date: March 14, 2013Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Tsuyoshi Kurosawa, Kotaro Endo, Yuta Iwasawa, Yoshitaka Komuro, Akiya Kawaue
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Patent number: 8349534Abstract: A positive resist composition including: a polymeric compound (A1) having a structural unit (a0) that contains a “cyclic group containing —SO2—” on the side chain terminal, and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group; an acid generator component (B); and a fluorine-containing resin component having a structural unit (f1) represented by general formula (f1-0): wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Q0 represents a single bond or a divalent linking group having a fluorine atom; and RX0 represents an acid dissociable, dissolution inhibiting group-containing group which may contain a fluorine atom, with the provision that at least one fluorine atom is contained in formula (f1-0).Type: GrantFiled: March 4, 2010Date of Patent: January 8, 2013Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tsuyoshi Kurosawa, Hiroaki Shimizu
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Publication number: 20120308931Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and an acid generator containing compounds represented by general formulas (b1) and (b2) shown below X-Q1-Y1—SO3?A+??(b 1) in which Q1 represents a divalent linking group containing an oxygen atom, Y1 represents an alkylene group of 1-4 carbons which may have a substituent or a fluorinated alkylene group 1-4 carbons which may have a substituent, X represents an alicyclic hydrocarbon group of 3-30 carbons which may have a substituent, and A+ represents an organic cation R1—Y5—SO2?A+??(b 2) in which R1 represents a monovalent chain-like aliphatic hydrocarbon group containing a hetero atom at an arbitrary position, Y5 represents an alkylene group of 1-4 carbons which may have a substituent or a fluorinated alkylene group of 1-4 carbons which may have a substituent, and A+ represents an organic cation.Type: ApplicationFiled: March 29, 2012Publication date: December 6, 2012Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Tsuyoshi Kurosawa, Kotaro Endo, Yuta Iwasawa
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Patent number: 8227169Abstract: There are provided a compound preferable as an acid generator for a resist composition, an acid generator including the compound, a resist composition containing the acid generator, and a method of forming a resist pattern using the resist composition, and the compound is represented by general formula (b1-12) shown below: R2—CH2—O—Y1—SO3?A+??(b1-12) wherein R2 represents a monovalent aromatic organic group; Y1 represents an alkylene group of 1 to 4 carbon atoms which may be fluorinated; and A+ represents a cation.Type: GrantFiled: April 4, 2008Date of Patent: July 24, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Takehito Seo, Hideo Hada, Kotaro Endo, Daisuke Kawana, Yasuhiro Yoshii, Tsuyoshi Kurosawa
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Patent number: 8221956Abstract: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.Type: GrantFiled: June 18, 2009Date of Patent: July 17, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Daiju Shiono, Tomoyuki Hirano, Sanae Furuya, Takahiro Dazai, Hiroaki Shimizu, Tsuyoshi Kurosawa, Hideto Nito, Tsuyoshi Nakamura
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Publication number: 20120164578Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, an acid generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound component (D), wherein the acid generator component (B) includes an acid generator (B1) containing a compound represented by general formula (b1-1) shown below, and the nitrogen-containing organic compound component (D) includes a compound (D1) represented by general formula (d1) shown below. In the formula, Y0 represents an alkylene group of 1 to 4 carbon atoms which may have a substituent, R0 represents an alkyl group, alkoxy group, halogen atom, halogenated alkyl group, hydroxyl group or oxygen atom (?O), p represents 0 or 1, and Z+ represents an organic cation.Type: ApplicationFiled: December 16, 2011Publication date: June 28, 2012Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Tsuyoshi Kurosawa, Kotaro Endo, Yuichi Suzuki, Yuta Iwasawa
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Publication number: 20120094236Abstract: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.Type: ApplicationFiled: December 23, 2011Publication date: April 19, 2012Inventors: Daiju SHIONO, Tomoyuki Hirano, Sanae Furuya, Takahiro Dazai, Hiroaki Shimizu, Tsuyoshi Kurosawa, Hideto Nito, Tsuyoshi Nakamura
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Patent number: 8142979Abstract: A resist composition for immersion exposure, including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing compound (C) represented by general formula (c-1) (in formula (c-1), R1 represents an organic group which may contain a polymerizable group; X represents a divalent organic group having an acid dissociable portion; and R2 represents an organic group having a fluorine atom).Type: GrantFiled: June 10, 2009Date of Patent: March 27, 2012Assignee: Tokyo Ohka Tokyo Co., Ltd.Inventors: Tsuyoshi Kurosawa, Hiroaki Shimizu
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Publication number: 20110311917Abstract: A resist composition for immersion exposure, including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing compound (C) represented by general formula (c-1) (in formula (c-1), R1 represents an organic group which may contain a polymerizable group; X represents a divalent organic group having an acid dissociable portion; and R2 represents an organic group having a fluorine atom).Type: ApplicationFiled: August 26, 2011Publication date: December 22, 2011Inventors: Tsuyoshi KUROSAWA, Hiroaki SHIMIZU
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Patent number: 7927780Abstract: A compound represented by formula (I); and a compound represented by formula (b1-1): wherein X represents —O—, —S—, —O—R3— or —S—R4—, wherein each of R3 and R4 independently represents an alkylene group of 1 to 5 carbon atoms; R2 represents an alkyl group of 1 to 6 carbon atoms, an alkoxy group of 1 to 6 carbon atoms, a halogenated alkyl group of 1 to 6 carbon atoms, a halogen atom, a hydroxyalkyl group of 1 to 6 carbon atoms, a hydroxyl group or a cyano group; a represents an integer of 0 to 2; Q1 represents an alkylene group of 1 to 12 carbon atoms or a single bond; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group; M+ represents an alkali metal ion; and A+ represents an organic cation.Type: GrantFiled: September 10, 2008Date of Patent: April 19, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Akiya Kawaue, Takeshi Iwai, Hideo Hada, Shinichi Hidesaka, Tsuyoshi Kurosawa, Natsuko Maruyama, Kensuke Matsuzawa, Takehiro Seshimo, Hiroaki Shimizu, Tsuyoshi Nakamura
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Publication number: 20100233623Abstract: A positive resist composition including: a polymeric compound (A1) having a structural unit (a0) that contains a “cyclic group containing —SO2—” on the side chain terminal, and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group; an acid generator component (B); and a fluorine-containing resin component having a structural unit (f1) represented by general formula (f1-0): wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Q0 represents a single bond or a divalent linking group having a fluorine atom; and RX0 represents an acid dissociable, dissolution inhibiting group-containing group which may contain a fluorine atom, with the provision that at least one fluorine atom is contained in formula (f1-0).Type: ApplicationFiled: March 4, 2010Publication date: September 16, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Tsuyoshi Kurosawa, Hiroaki Shimizu