Patents by Inventor Tsuyoshi Masuda

Tsuyoshi Masuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210277282
    Abstract: Provided is a polishing means that can improve the flatness of a substrate without significantly reducing the polishing speed. More specifically, provided is a polishing composition comprising inorganic particles, water, and a water-soluble polymer, wherein (i) a 1 mass (wt/wt) % aqueous solution of the water-soluble polymer has a normal stress (N) of 1 or more at a shear rate of 10000 (1/S), or (ii) a 0.25 mass (wt/wt) % aqueous solution of the water-soluble polymer has a normal stress (N) of 1 or more at a shear rate of 10000 (1/S).
    Type: Application
    Filed: July 1, 2019
    Publication date: September 9, 2021
    Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Tsuyoshi MASUDA, Hideaki NISHIGUCHI
  • Publication number: 20190282821
    Abstract: A wearable medical device is provided for monitoring a cardiac condition of a patient, where the device is releasably mounted to the patient's chest and includes at least two skin-facing electrodes forming a first one or more ECG leads for ongoing monitoring of heart functioning and at least one touch electrode for intermittently obtaining additional circuit vectors for deriving additional metrics regarding the functioning of the patient's heart. Each touch electrode is configured to form an additional lead/vector that is a larger vector and/or separated by at least 15° from a corresponding first lead/vector formed from the first one or more ECG leads in a vector cardiogram representation of the first one or more ECG leads and the additional lead/vector.
    Type: Application
    Filed: March 16, 2018
    Publication date: September 19, 2019
    Inventors: Tsuyoshi Masuda, Gary A. Freeman, Kent Volosin
  • Publication number: 20190263938
    Abstract: A water-soluble hydroxyethyl cellulose is produced by reacting ethylene oxide with an alkali cellulose such that an average additional molar number of ethylene oxide per glucose unit of the alkali cellulose is 0.1 to 1.0 mol to prepare hydroxyethyl cellulose, and mechanically pulverizing the prepared hydroxyethyl cellulose. According to this producing method, it is possible to produce a water-soluble hydroxyethyl cellulose from an alkali cellulose with the usage of ethylene oxide reduced. In addition, the water-soluble hydroxyethyl cellulose produced by this producing method has a loss tangent (tan ?) of a 2% by mass aqueous solution of less than 1.0 in a frequency range of 0.1 to 100 rad/s in general, and exhibits a gel physical property.
    Type: Application
    Filed: September 19, 2017
    Publication date: August 29, 2019
    Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Yoh YAMAUCHI, Tsuyoshi MASUDA, Yusuke NISHIKAWA, Yuji SHINGAI
  • Patent number: 10192669
    Abstract: A vector-magnetic-property-controlling material according to the present embodiment is subjected to a scratching process in two directions that intersect on the surface of a steel material. An iron core according to the present embodiment is configured from an oriented magnetic steel material which has been subjected to a scratching process in two directions that intersect on the surface thereof.
    Type: Grant
    Filed: November 21, 2014
    Date of Patent: January 29, 2019
    Assignees: TOSHIBA INDUSTRIAL PRODUCTS & SYSTEMS CORPORATION, NATIONAL UNIVERSITY CORPORATION OITA UNIVERSITY
    Inventors: Masato Enokizono, Hiromu Shiota, Eiji Shimomura, Tsuyoshi Masuda
  • Patent number: 10126460
    Abstract: In order to accurately identify a hold state of a mobile device held by a user while the user is moving, provided is a hold state change detection apparatus including an acquiring section that acquires an output signal of a sensor mounted in the mobile device held by the user; a change detecting section that detects a change in a hold state of the mobile device based on the output signal of the sensor; and a hold state judging section that judges the hold state based on the output signal of the sensor. During a prescribed time from the time when the change detecting section detects the change in the hold state, information indicating the hold state prior to the detection of the change in the hold state is output. Also provided is a hold state change detection method and program.
    Type: Grant
    Filed: August 19, 2015
    Date of Patent: November 13, 2018
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Shiro Kobayashi, Yuko Akagi, Masahiro Konda, Tsuyoshi Masuda
  • Publication number: 20180182541
    Abstract: The present embodiment provides a wound-core production method for winding and laminating a plurality of pieces of core material which has at least one cut in each winding and thereby producing a wound core having a rectangular aperture in a central part, the wound-core production method comprising laminating the plurality of pieces of the cut core material while winding the core material into a shape of a rectangular frame using a winding device.
    Type: Application
    Filed: February 9, 2016
    Publication date: June 28, 2018
    Applicant: Toshiba Industrial Products and Systems Corp.
    Inventors: HIROMU SHIOTA, YOSHINORI YAMAZAKI, TSUYOSHI MASUDA, EIJI SHIMOMURA, YUJI ISHIKAWA
  • Patent number: 9914853
    Abstract: Provided are a slurry composition to be used in chemical mechanical polishing (CMP), and a method for polishing a substrate. This slurry composition contains water, abrasive grains, and an alkylene polyalkylene oxide amine polymer having a solubility parameter in a range of 9-10. A preferred alkylene polyalkylene oxide amine polymer is given by general formula (1). (In general formula (1), m and n are positive integers, and A and R are alkylene oxide groups.
    Type: Grant
    Filed: March 17, 2015
    Date of Patent: March 13, 2018
    Assignee: Nihon Cabot Microelectronics K.K.
    Inventors: Tsuyoshi Masuda, Hiroshi Kitamura, Yoshiyuki Matsumura
  • Patent number: 9795557
    Abstract: The present invention provides a cosmetic composition that is stable, not sticky when used, has excellent moisture and smoothness, and maintains the effects for a long time without deterioration due to washing and/or sweating. Specifically, the present invention provides a cosmetic composition that comprises: (i) a polyalkylene oxide-modified product obtained by reacting a polyalkylene oxide compound, a diol compound, and a diisocyanate compound; and (ii) water or a lower alcohol aqueous solution, wherein the cosmetic composition comprises 0.3 mass % or more polyalkylene oxide-modified product.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: October 24, 2017
    Assignee: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Hitoshi Ozawa, Tsuyoshi Masuda, Yusuke Nishikawa
  • Publication number: 20170278617
    Abstract: A vector-magnetic-property-controlling material according to the present embodiment is subjected to a scratching process in two directions that intersect on the surface of a steel material. An iron core according to the present embodiment is configured from an oriented magnetic steel material which has been subjected to a scratching process in two directions that intersect on the surface thereof.
    Type: Application
    Filed: November 21, 2014
    Publication date: September 28, 2017
    Inventors: MASATO ENOKIZONO, HIROMU SHIOTA, EIJI SHIMOMURA, TSUYOSHI MASUDA
  • Patent number: 9763869
    Abstract: A hydrophilic thickener comprising a polymer obtainable by subjecting a water-soluble ethylenically unsaturated monomer to a reversed phase suspension polymerization in the presence of a polyoxyethylene polyoxypropylene alkyl ether; and a cosmetic composition containing the hydrophilic thickener. The hydrophilic thickener according to the present invention can be used in the fields of cosmetics such as powder foundations, liquid foundations, emulsions, lotions, liquid cosmetics, moisturizing gel, all-in-one gels, cleansing foams, hair setting agents, emollient creams; toiletries, sundries, and the like.
    Type: Grant
    Filed: June 6, 2014
    Date of Patent: September 19, 2017
    Assignee: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Ayami Wajima, Junichi Mizukawa, Tsuyoshi Masuda, Hitoshi Ozawa
  • Publication number: 20170162313
    Abstract: A wound iron core according to an embodiment of the present invention is provided with an iron core main body part around which a plurality of iron core materials are wound, and a window part formed at the center of the iron core main body part. The iron core materials each have a cut part at least at one location per winding. The cut parts are disposed so as to be dispersed in the periphery of the window part.
    Type: Application
    Filed: May 11, 2015
    Publication date: June 8, 2017
    Applicant: TOSHIBA INDUSTRIAL PRODUCTS & SYSTEMS CORPORATION
    Inventors: Hiromu SHIOTA, Tsuyoshi MASUDA, Yoshinori YAMAZAKI, Eiji SHIMOMURA
  • Patent number: 9644165
    Abstract: The present invention provides a lubricating resin composition for personal care, wherein the composition not only maintains its excellent lubricity and roughness-resistant property under a wet condition even during repeated use thereof, but also represents a low swelling ratio and no slimy feeling under a wet condition. The lubricating resin composition for personal care Of the present invention comprises 100 parts by mass of a water-absorbent modified polyalkylene oxide and 25 to 500 parts by mass of a low-melting point polyamide resin.
    Type: Grant
    Filed: July 26, 2013
    Date of Patent: May 9, 2017
    Assignee: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Hitoshi Ozawa, Shinichi Takemori, Tsuyoshi Masuda
  • Patent number: 9622961
    Abstract: The present invention provides a water-soluble polyalkylene oxide-modified product which is nonionic, has a high thickening effect and is also excellent in transparency, and an emulsion composition and a cosmetic material containing the same. More specifically, the present invention provides a water-soluble polyalkylene oxide-modified product obtained by reacting a monovalent hydrophobic alcohol, a linear diol compound, a polyalkylene oxide compound and a diisocyanate compound, and an emulsion composition and a cosmetic material containing the same.
    Type: Grant
    Filed: December 26, 2011
    Date of Patent: April 18, 2017
    Assignee: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Hitoshi Ozawa, Yusuke Nishikawa, Tatsuo Ohtani, Tsuyoshi Masuda
  • Patent number: 9605107
    Abstract: The object of the present invention is to provide a modified polyalkylene oxide capable of yielding an aqueous solution excellent in transparency with high viscosity, even when combined with a cationic surfactant.
    Type: Grant
    Filed: July 5, 2013
    Date of Patent: March 28, 2017
    Assignee: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Hitoshi Ozawa, Tsuyoshi Masuda, Yusuke Nishikawa
  • Publication number: 20170037278
    Abstract: Provided are a slurry composition to be used in chemical mechanical polishing (CMP), and a method for polishing a substrate. This slurry composition contains water, abrasive grains, and an alkylene polyalkylene oxide amine polymer having a solubility parameter in a range of 9-10. A preferred alkylene polyalkylene oxide amine polymer is given by general formula (1). (In general formula (1), m and n are positive integers, and A and R are alkylene oxide groups.
    Type: Application
    Filed: March 17, 2015
    Publication date: February 9, 2017
    Inventors: Tsuyoshi MASUDA, Hiroshi KITAMURA, Yoshiyuki MATSUMURA
  • Patent number: 9528031
    Abstract: Slurry composition and a method of substrate polishing used in chemical mechanical polishing (CMP). The present invention concerns a slurry composition containing a polishing agent and a water soluble polymer. The slurry composition contains a water soluble polymer that has a solubility parameter in the range of 9.0 to 14.0 and that may contain hetero atoms at a level sufficient to lower the polishing rate near the edges of the polished substrate defined as the region within 1 mm of the outer edge of the polished substrate to a level below the mean polishing rate of the polished substrate. The water soluble polymer may have a mean molecular weight in the range of 200 to about 3,000,000, and the mean molecular weight may be in the range of 200 to 110,000 if hetero atoms are present in the main-chain structure and the SP value is under 9.5.
    Type: Grant
    Filed: April 25, 2014
    Date of Patent: December 27, 2016
    Assignee: Cabot Microelectronics Corporation
    Inventors: Hiroshi Kitamura, Tsuyoshi Masuda, Yoshiyuki Matsumura
  • Publication number: 20160367465
    Abstract: A hydrophilic thickener comprising a polymer obtainable by subjecting a water-soluble ethylenically unsaturated monomer to a reversed phase suspension polymerization in the presence of a polyoxyethylene polyoxypropylene alkyl ether; and a cosmetic composition containing the hydrophilic thickener. The hydrophilic thickener according to the present invention can be used in the fields of cosmetics such as powder foundations, liquid foundations, emulsions, lotions, liquid cosmetics, moisturizing gel, all-in-one gels, cleansing foams, hair setting agents, emollient creams; toiletries, sundries, and the like.
    Type: Application
    Filed: June 6, 2014
    Publication date: December 22, 2016
    Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Ayami Wajima, Junichi Mizukawa, Tsuyoshi Masuda, Hitoshi Ozawa
  • Publication number: 20160336100
    Abstract: A wound core is provided with plural wound core materials each having at least one cut portion for every one winding thereof. The wound core is provided with a rectangular window portion at the center thereof. A space factor of the core materials at each of corner portions is less than a space factor of the core materials at each of side portions.
    Type: Application
    Filed: July 27, 2016
    Publication date: November 17, 2016
    Applicant: TOSHIBA INDUSTRIAL PRODUCTS & SYSTEMS CORPORATION
    Inventors: Hiromu SHIOTA, Tsuyoshi MASUDA, Yoshinori YAMAZAKI, Takashi IKEDA
  • Publication number: 20160068713
    Abstract: Slurry composition and a method of substrate polishing used in chemical mechanical polishing (CMP). The present invention concerns a slurry composition containing a polishing agent and a water soluble polymer. The slurry composition contains a water soluble polymer that has a solubility parameter in the range of 9.0 to 14.0 and that may contain hetero atoms at a level sufficient to lower the polishing rate near the edges of the polished substrate defined as the region within 1 mm of the outer edge of the polished substrate to a level below the mean polishing rate of the polished substrate. The water soluble polymer may have a mean molecular weight in the range of 200 to about 3,000,000, and the mean molecular weight may be in the range of 200 to 110,000 if hetero atoms are present in the main-chain structure and the SP value is under 9.5.
    Type: Application
    Filed: April 25, 2014
    Publication date: March 10, 2016
    Inventors: Hiroshi KITAMURA, Tsuyoshi MASUDA, Yoshiyuki MATSUMURA
  • Publication number: 20160057269
    Abstract: To quickly and accurately measure offset of an angular velocity sensor mounted in a mobile device, provided is an offset estimation apparatus including an acquiring section that acquires an output signal of an angular velocity sensor mounted in a mobile device; an offset estimating section that estimates an offset of the angular velocity sensor based on a first AC component included in the output signal of the angular velocity sensor in a period during which a level of the first AC component cycles; a hold state judging section that judges a hold state of the mobile device; and a control section that controls whether the offset estimating section estimates the offset of the angular velocity sensor, according to a judgment result of the hold state judging section.
    Type: Application
    Filed: November 4, 2015
    Publication date: February 25, 2016
    Applicant: Asahi Kasei Kabushiki Kaisha
    Inventors: Masahiro KONDA, Tsuyoshi MASUDA, Shiro KOBAYASHI