Patents by Inventor Tsuyoshi Tsunatori

Tsuyoshi Tsunatori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Film forming method and film forming apparatus
    Patent number: 9466478
    Abstract: A method of forming an oxide film on an object to be processed, includes: supplying a film-forming raw material gas into a processing chamber; performing at least one of exhausting the processing chamber and supplying a purge gas into the processing chamber to remove gas remaining in the processing chamber; supplying an oxidant gas into the processing chamber; and performing at least one of exhausting the processing chamber and supplying the purge gas into the processing chamber to remove gas remaining in the processing chamber, wherein supplying an oxidant gas includes: supplying a first oxidant gas into the processing chamber at a first concentration; and supplying a second oxidant gas into the processing chamber at a second concentration higher than the first concentration.
    Type: Grant
    Filed: March 28, 2014
    Date of Patent: October 11, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akira Shimizu, Tsuyoshi Tsunatori, Shigeru Nakajima
  • FILM FORMING METHOD AND FILM FORMING APPARATUS
    Publication number: 20140295677
    Abstract: A method of forming an oxide film on an object to be processed, includes: supplying a film-forming raw material gas into a processing chamber; performing at least one of exhausting the processing chamber and supplying a purge gas into the processing chamber to remove gas remaining in the processing chamber; supplying an oxidant gas into the processing chamber; and performing at least one of exhausting the processing chamber and supplying the purge gas into the processing chamber to remove gas remaining in the processing chamber, wherein supplying an oxidant gas includes: supplying a first oxidant gas into the processing chamber at a first concentration; and supplying a second oxidant gas into the processing chamber at a second concentration higher than the first concentration.
    Type: Application
    Filed: March 28, 2014
    Publication date: October 2, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akira Shimizu, Tsuyoshi Tsunatori, Shigeru Nakajima