Patents by Inventor Tsuyoshi Uda

Tsuyoshi Uda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6525336
    Abstract: A superfine electronic device is disclosed, which is constructed by atomic fine lines having a structure in which a plurality of atoms are arranged on one or a plurality of straight lines, in a ring shape or on curves with a size of atomic level, and which includes elements for doping electrons and holes. Using these atomic fine lines, it is possible to integrate semiconductor elements utilizing pn junctions at an atomic level with a high density. A groove having a sufficiently small size is formed in an insulating film disposed on a substrate. Then, atoms or molecules are supplied on the substrate and in the groove, which and are heated to a temperature sufficiently high for moving the atoms or molecules during or after the supply thereof to form a quantum fine line at edge portions of the groove.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: February 25, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Seiichi Kondo, Yasuo Wada, Tsuyoshi Uda, Tokuo Kure, Tsuneo Ichiguchi, Shinji Okazaki, Yoshimasa Murayama
  • Patent number: 5561300
    Abstract: In an atomic switch, opposite ends of an atom wire are connected to an input and output, and a switching gate is connected to a switching power supply. An input signal is outputted when a switching atom is connected to the atom wire, whereas an input signal is not outputted when the switching atom is moved to disconnect from the atom wire. There are provided an atom wire having a plurality of atoms arranged in a line or in a plurality of lines, in a ring shape, or in a curved line, and a switching gate made of an atom wire. The atom wire is switched by the field effect of the switching gate.
    Type: Grant
    Filed: December 22, 1992
    Date of Patent: October 1, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Yasuo Wada, Seiichi Kondo, Tsuyoshi Uda, Masukazu Igarashi, Hiroshi Kajiyama, Hisashi Nagano, Akito Sakurai, Tsuneo Ichiguchi
  • Patent number: 5323375
    Abstract: An information storage apparatus in which one unit (or one bit) of information is stored by bringing a fine tip electrode with a tip portion of a dimension on the order of an inter-atomic distance (or several angstroms) in proximity to an atom on a flat surface of a material (for example, a semiconductor) with a gap on the order of an inter-atomic distance being provided between the tip electrode and the atom, and applying a voltage to the tip electrode so that the alignment of a dimer (or a pair of atoms) on the material surface in the vicinity of the tip electrode is changed by virtue of a tunnelling effect which is a quantum mechanical effect.
    Type: Grant
    Filed: March 9, 1992
    Date of Patent: June 21, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Sigeo Ihara, Tsuyoshi Uda, Ryo Imura
  • Patent number: 5233265
    Abstract: A photoconductive device having a photoconductive layer which includes an amorphous semiconductor layer capable of charge multiplication in at least a part thereof is disclosed. The method of operating such a photoconductive device is also disclosed. By using the avalanche effect of the amorphous semiconductor layer, it is possible to realize a highly sensitive photoconductive device while maintaining low lag property. In one aspect of the present invention, the amorphous semiconductor layer is amorphous Se. In another aspect of the present invention, the amorphous semiconductor layer is composed mainly of tetrahedral elements including at least an element of hydrogen or halogens. When using the amorphous semiconductor layer composed mainly of tetrahedral elements, the charge multiplication effect is produced mainly in the interior of the amorphous semiconductor, and thus it is possible to obtain a thermally stable photoconductive device having a high sensitivity while keeping a good photoresponse.
    Type: Grant
    Filed: August 1, 1990
    Date of Patent: August 3, 1993
    Assignees: Hitachi, Ltd., Nippon Hoso Kyokai
    Inventors: Yukio Takasaki, Kazutaka Tsuji, Tatsuo Makishima, Tadaaki Hirai, Sachio Ishioka, Tatsuro Kawamura, Keiichi Shidara, Eikyu Hiruma, Kenkichi Tanioka, Junichi Yamazaki, Kenji Sameshima, Hirokazu Matsubara, Kazuhisa Taketoshi, Mitsuo Kosugi, Shiro Suzuki, Takashi Yamashita, Masaaki Aiba, Yoshizumi Ikeda, Tsuyoshi Uda, Naohiro Goto, Yasuhiko Nonaka, Eisuke Inoue, Hirofumi Ogawa
  • Patent number: 5010517
    Abstract: A semiconductor optical apparatus of the invention has a quantum well super-lattice structure essentially of only direct transition semiconductor or comprising a direct transition semiconductor and an indirect transiton semiconductor. In the semiconductor optical apparatus of the invention, by using an absorption saturation phenomenon of excitions in the direct transition semiconductor constructing the quantum well super-lattice structure, a non-volatile information recording apparatus which can record, reproduce, and erase information at a high speed even at the room temperature or even by irradiating a light of a low intensity is realized.
    Type: Grant
    Filed: November 16, 1988
    Date of Patent: April 23, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Masahito Migita, Tsuyoshi Uda, Osam Kanehisa, Masatoshi Shiiki
  • Patent number: 4952839
    Abstract: A photoconductive device having a photoconductive layer which includes an amorphous semiconductor layer capable of charge multiplication in at least a part thereof is disclosed. The method of operating such a photoconductive device is also disclosed. By using the avalanche effect of the amorphous semiconductor layer, it is possible to realize a highly sensitive photoconductive device while maintaining low lag property.
    Type: Grant
    Filed: October 12, 1989
    Date of Patent: August 28, 1990
    Assignees: Hitachi, Ltd, Nippon Hoso Kyokai
    Inventors: Kenkichi Tanioka, Mitsuo Kosugi, Junichi Yamazaki, Keiichi Shidara, Kazuhisa Taketoshi, Tatsuro Kawamura, Eikyuu Hiruma, Shiro Suzuki, Takashi Yamashita, Masaaki Aiba, Yochizumi Ikeda, Tadaaki Hirai, Yukio Takasaki, Sachio Ishioka, Tatsuo Makishima, Kenji Sameshima, Tsuyoshi Uda, Naohiro Goto, Yasuhiko Nonaka, Eisuke Inoue, Kazutaka Tsuji, Hirofumi Ogawa
  • Patent number: 4888521
    Abstract: A photoconductive device having a photoconductive layer which includes an amorphous semiconductor layer capable of charge multiplication in at least a part thereof is disclosed. The method of operating such a photoconductive device is also disclosed. By using the avalanche effect of the amorphous semiconductor layer, it is possible to realize a highly sensitive photoconductive device while maintaining low lag property.
    Type: Grant
    Filed: July 2, 1987
    Date of Patent: December 19, 1989
    Assignees: Hitachi Ltd., Nippon Hoso Kyokai
    Inventors: Kenkichi Tanioka, Keiichi Shidara, Tatsuro Kawamura, Junichi Yamazaki, Eikyuu Hiruma, Kazuhisa Taketoshi, Shiro Suzuki, Takashi Yamashita, Mitsuo Kosugi, Yochizumi Ikeda, Masaaki Aiba, Tadaaki Hirai, Yukio Takasaki, Sachio Ishioka, Tatsuo Makishima, Kenji Sameshima, Tsuyoshi Uda, Naohiro Goto, Yasuhiko Nonaka, Eisuke Inoue, Kazutaka Tsuji, Hirofumi Ogawa
  • Patent number: 4626885
    Abstract: A photosensor including a transparent electrode for transmitting incident light and a photoconductive layer receiving light from the transparent electrode for performing photoelectric conversion, is disclosed in which the photoconductive layer is made of amorphous silicon, the amorphous silicon contains 5 to 30 atomic percent hydrogen and is doped with at least one selected from elements belonging to the groups II and III in such a manner that a region remote from the transparent electrode is higher in the concentration of the selected element than another region proximate to the transparent electrode, and a voltage is applied across the photoconductive layer so that a surface of the photoconductive layer facing the transparent electrode is at a positive potential with respect to another surface of the photoconductive layer opposite to the surface facing the transparent electrode.
    Type: Grant
    Filed: July 29, 1983
    Date of Patent: December 2, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Sachio Ishioka, Yoshinori Imamura, Tsuyoshi Uda, Yukio Takasaki, Chushirou Kusano, Hirofumi Ogawa, Tatsuo Makishima, Tadaaki Hirai
  • Patent number: 4330733
    Abstract: A photoconductive target having an electrode and a P-type conductive layer mainly made of Se and making rectifying contact at an interface with the electrode, with at least Te being doped in a portion of the P-type conductive layer. At least one metal fluoride forming shallow levels is doped in the region where the signal current is generated for the most part of the P-type conductive layer with an average concentration of not less than 50 ppm and not more than 5% by weight. The metal fluoride is preferably at least one selected from the group consisting of LiF, NaF, MgF.sub.2, CaF.sub.2, BaF.sub.2, AlF.sub.3, CrF.sub.3, MnF.sub.2, CoF.sub.2, PbF.sub.2, CeF.sub.3 and TlF. The high light sticking of the photoconductive target can thus be considerably reduced.
    Type: Grant
    Filed: May 22, 1980
    Date of Patent: May 18, 1982
    Assignees: Nippon Hoso Kyokai, Hitachi, Ltd.
    Inventors: Keiichi Shidara, Naohiro Goto, Tatsuro Kawamura, Eikyu Hiruma, Yohitsumu Ikeda, Kenkichi Tanioka, Tadaaki Hirai, Yukio Takasaki, Chushirou Kusano, Tsuyoshi Uda, Yasuhiko Nonaka