Patents by Inventor Tzu Chuang
Tzu Chuang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240153895Abstract: Semiconductor dies of a semiconductor die package are directly bonded, and a top metal region may be formed over the semiconductor dies. A plurality of conductive terminals may be formed over the top metal region. The conductive terminals are formed of copper (Cu) or another material that enables low-temperature deposition process techniques, such as electroplating, to be used to form the conductive terminal. In this way, the conductive terminals of the semiconductor die packages described herein may be formed at a relatively low temperature. This reduces the likelihood of thermal deformation of semiconductor dies in the semiconductor die packages. The reduced thermal deformation reduces the likelihood of warpage, breakage, and/or other types of damage to the semiconductor dies of the semiconductor die packages, which may increase performance and/or increase yield of semiconductor die packages.Type: ApplicationFiled: April 19, 2023Publication date: May 9, 2024Inventors: Harry-HakLay CHUANG, Wei-Cheng WU, Chung-Jen HUANG, Yung Chun TU, Chien Lin LIU, Shun-Kuan LIN, Ping-tzu CHEN
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Patent number: 11939268Abstract: A method of forming low-k material is provided. The method includes providing a plurality of core-shell particles. The core of the core-shell particles has a first ceramic with a low melting point. The shell of the core-shell particles has a second ceramic with a low melting point and a low dielectric constant. The core-shell particles are sintered and molded to form a low-k material. The shell of the core-shell particles is connected to form a network structure of a microcrystal phase.Type: GrantFiled: December 23, 2020Date of Patent: March 26, 2024Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Kuo-Chuang Chiu, Tzu-Yu Liu, Tien-Heng Huang, Tzu-Chi Chou, Cheng-Ting Lin
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Publication number: 20230405571Abstract: A catalyst is provided for fuel reformation with its preparation method. The catalyst is an oxide catalyst of nickel (Ni), lanthanum (La), and cerium (Ce); and is loaded on a honeycomb support substrate. The catalyst comprises an oxide layer of Ni and La; and an oxide layer of Ce between the honeycomb support substrate and the oxide layer of Ni and La. The oxide layer of Ni and La comprises a 10˜20 weight percent (wt %) of Ni and a 1˜20 wt % of rare earth element La. The oxide layer of Ce comprises a 1˜20 wt % of rare earth element Ce. The present invention is applied to solid oxide fuel cell (SOFC) for enhancing the methane conversion rate, heightening the reliability and durability of long-term operation, and improving the energy use efficiency.Type: ApplicationFiled: March 30, 2023Publication date: December 21, 2023Inventors: Men-Han Huang, Wen-Tang Hong, Ruey-Yi Lee, Fang-Tzu Chuang, Ming-Ruei Jiang
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Publication number: 20230183571Abstract: The present invention relates to an LC medium comprising two or more polymerizable compounds, at least one of which contains a substituent comprising a tertiary OH group, to its use for optical, electro-optical and electronic purposes, in particular in LC displays, especially in LC displays of the PSA (polymer sustained alignment) or SA (self-aligning) mode, to an LC display of the PSA or SA mode comprising the LC medium, and to a process of manufacturing the LC display using the LC medium, especially an energy-saving LC display and energy-saving LC display production process.Type: ApplicationFiled: December 8, 2022Publication date: June 15, 2023Applicant: MERCK PATENT GMBHInventors: Min Tzu CHUANG, I-Wen CHEN, Cheng-Jui LIN, Jer-Lin CHEN, Kuang-Ting CHOU
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Publication number: 20230061307Abstract: The invention relates to a liquid-crystalline medium having a nematic phase comprising one or more compounds of formula X wherein the parameters have the meaning given in the text, to the use thereof in an electro-optical display, particularly in an active-matrix display based on the IPS or FFS effect, to displays of this type which contain a liquid-crystalline medium of this type and to the use of the compounds of formula X for improvement of the transmission and/or response times of a liquid-crystalline medium which comprises one or more additional mesogenic compounds, as well as to certain compounds of formula X, as specified in the text.Type: ApplicationFiled: December 17, 2019Publication date: March 2, 2023Applicant: MERCK PATENT GMBHInventors: Atsutaka MANABE, Constanze BROCKE, Susan (Min Tzu) CHUANG, Sven Christian LAUT, Sabrina PFEIFFER, Ramin TAVAKOLI
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Patent number: 11258263Abstract: An apparatus of solid oxide fuel cells (SOFC) is provided. The SOFCs generate power and are grid-tied. The apparatus comprises a power-generating side; and a grid-connecting side using an elementary household power management. The apparatus solves problems like low voltage, high current, voltage oscillation, voltage dips, long generator-starting time, etc. The apparatus is not only used as a stable power supply (base load), but also helps adjust the regional peak electricity demands. The features include the following: 1. A grid is tied, where output power does not pass through a direct-current boost converter and, thus, has no loss from it. 2. Injures, including voltage oscillation and sudden unloading after dumping, are reduced for avoiding further damages to cell sheets. 3. With the coordination of elementary power management and the integration of grid, the limitation of long-awaiting generator-starting time is crossed out and convenience of immediate power use is achieved.Type: GrantFiled: March 3, 2021Date of Patent: February 22, 2022Assignee: Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan, R.O.C.Inventors: Fang-Tzu Chuang, Chen-Min Chan, Ruey-Yi Lee
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Publication number: 20220045515Abstract: An apparatus of solid oxide fuel cells (SOFC) is provided. The SOFCs generate power and are grid-tied. The apparatus comprises a power-generating side; and a grid-connecting side using an elementary household power management. The apparatus solves problems like low voltage, high current, voltage oscillation, voltage dips, long generator-starting time, etc. The apparatus is not only used as a stable power supply (base load), but also helps adjust the regional peak electricity demands. The features include the following: 1. A grid is tied, where output power does not pass through a direct-current boost converter and, thus, has no loss from it. 2. Injures, including voltage oscillation and sudden unloading after dumping, are reduced for avoiding further damages to cell sheets. 3. With the coordination of elementary power management and the integration of grid, the limitation of long-awaiting generator-starting time is crossed out and convenience of immediate power use is achieved.Type: ApplicationFiled: March 3, 2021Publication date: February 10, 2022Inventors: Fang-Tzu Chuang, Chen-Min Chan, Ruey-Yi Lee
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Publication number: 20180042144Abstract: A method is provided to dissipate heat for an electric-vehicle controller. A heat-dissipation case having a hollow shape is obtained. The controller is put in the case. A few first heat-sink strips are set on at least one surface of the controller. A few second heat-sink strips are also set on at least one surface of the controller. An end of each of the second heat-sink strips is contacted with an inner surface of the case. Thus, with coordination of the heat-sink strips and the case, heat of the controller is directed out the case. The present invention has a simple structure, has good heat dissipation, reduces production cost and reduces controller volume.Type: ApplicationFiled: August 3, 2016Publication date: February 8, 2018Inventors: Kuei-Piao Lee, Yung-Tzu Chuang
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Patent number: 8795928Abstract: A wave-shaped mask for fabricating a nano-scale structure is disclosed. The wave-shaped mask comprises an elastomeric transparent substrate having an upper surface and a lower surface, and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate. The upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape, and the lower surface of the elastomeric transparent substrate is in a plate shape.Type: GrantFiled: March 16, 2012Date of Patent: August 5, 2014Assignee: National Taiwan UniversityInventors: Si-Chen Lee, Fang-Tzu Chuang, Yu-Wei Jiang
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Patent number: 8795932Abstract: A method of fabricating a polarized color filter wherein a transparent substrate is provided and coated with a photoresist layer. A wave-shaped mask may then be prepared and a periodic wave-shaped surface may be placed in contact with the photoresist layer, treating the photoresist layer with a primary exposure process. An external force may be applied to the wave-shaped mask, and the transparent substrate or wave-shaped mask by be rotated by a predetermined degree. The photoresist layer may be treated with a secondary exposure process, wherein the photoresist layer is developed in order to obtain a photoresist pattern layer. A metal layer may be coated on the transparent substrate with the photoresist pattern layer. The photoresist pattern layer and the portion of the metal layer on the photoresist pattern layer may then be removed such that the remaining metal layer forms a periodic hole substrate.Type: GrantFiled: June 22, 2012Date of Patent: August 5, 2014Assignee: National Taiwan UniversityInventors: Si-Chen Lee, Fang-Tzu Chuang, Yu-Wei Jiang, Hung-Hsin Chen
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Patent number: 8748061Abstract: A method of fabricating wave-shaped mask is disclosed. The method of fabricating wave-shaped mask comprises the steps of providing an elastomeric transparent substrate comprising an upper surface and a lower surface, applying a stable force to the elastomeric transparent substrate for deforming the elastomeric transparent substrate, forming a light-penetrable thin film layer on the upper surface of the elastomeric transparent substrate, and removing the force applying to the elastomeric transparent substrate, whereby the upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape and the lower surface of the elastomeric transparent substrate is in a plate shape.Type: GrantFiled: March 19, 2012Date of Patent: June 10, 2014Assignee: National Taiwan UniversityInventors: Si-Chen Lee, Fang-Tzu Chuang, Yu-Wei Jiang
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Publication number: 20130244145Abstract: A method of fabricating a polarized color filter wherein a transparent substrate is provided and coated with a photoresist layer. A wave-shaped mask may then be prepared and a periodic wave-shaped surface may be placed in contact with the photoresist layer, treating the photoresist layer with a primary exposure process. An external force may be applied to the wave-shaped mask, and the transparent substrate or wave-shaped mask by be rotated by a predetermined degree. The photoresist layer may be treated with a secondary exposure process, wherein the photoresist layer is developed in order to obtain a photoresist pattern layer. A metal layer may be coated on the transparent substrate with the photoresist pattern layer. The photoresist pattern layer and the portion of the metal layer on the photoresist pattern layer may then be removed such that the remaining metal layer forms a periodic hole substrate.Type: ApplicationFiled: June 22, 2012Publication date: September 19, 2013Applicant: NATIONAL TAIWAN UNIVERSITYInventors: Si-Chen Lee, Fang-Tzu Chuang, Yu-Wei Jiang, Hung-Hsin Chen
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Publication number: 20130065161Abstract: A wave-shaped mask for fabricating a nano-scale structure is disclosed. The wave-shaped mask comprises an elastomeric transparent substrate having an upper surface and a lower surface, and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate. The upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape, and the lower surface of the elastomeric transparent substrate is in a plate shape.Type: ApplicationFiled: March 16, 2012Publication date: March 14, 2013Applicant: NATIONAL TAIWAN UNIVERSITYInventors: Si-Chen Lee, Fang-Tzu Chuang, Yu-Wei Jiang
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Publication number: 20130065162Abstract: A method of fabricating wave-shaped mask is disclosed. The method of fabricating wave-shaped mask comprises the steps of providing an elastomeric transparent substrate comprising an upper surface and a lower surface, applying a stable force to the elastomeric transparent substrate for deforming the elastomeric transparent substrate, forming a light-penetrable thin film layer on the upper surface of the elastomeric transparent substrate, and removing the force applying to the elastomeric transparent substrate, whereby the upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape and the lower surface of the elastomeric transparent substrate is in a plate shape.Type: ApplicationFiled: March 19, 2012Publication date: March 14, 2013Applicant: NATIONAL TAIWAN UNIVERSITYInventors: Si-Chen Lee, Fang-Tzu Chuang, Yu-Wei Jiang
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Publication number: 20050221229Abstract: Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate for analysis includes removing a portion of a material on the substrate proximate to a defect using chemical etching in combination with an electron beam. The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate for analysis includes removing a portion of a material on a substrate proximate to a defect using chemical etching in combination with an electron beam and a light beam.Type: ApplicationFiled: March 22, 2005Publication date: October 6, 2005Inventors: Mehran Nasser-Ghodsi, Mark Borowicz, Dave Bakker, Mehdi Vaez-Iravani, Prashant Aji, Rudy Garcia, Tzu Chuang
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Publication number: 20030136550Abstract: A heat sink adapted for dissipating heat from a semiconductor device. The heat sink has lower heat sink body, an upper heat sink body soldered to the lower heat sink body, an airtight chamber defined in between the upper heat sink body and the lower heat sink body and drawn into a vacuum status, a working fluid filled in the airtight chamber for circulation between gas phase and liquid phase to transfer heat energy from the bottom side of the heat sink toward the top side thereof, and a porous structure formed in the upper heat sink body and the lower heat sink body inside the airtight chamber for accelerating the circulation of the working fluid between gas phase and liquid phase.Type: ApplicationFiled: January 24, 2002Publication date: July 24, 2003Applicant: Global WIN TechnologyInventors: Chao-Nien Tung, Shih-Jen Lin, Tien-Tzu Chuang
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Patent number: 6209777Abstract: A fusion welding method for binding the surfaces of two metals including the steps of (a) coating a layer of a powdery media capable of forming eutectics with both the two metals for lowering the melting points of the two metals, onto at least one of the binding surfaces of the two metal to be bound; and (b) sintering, in a vacuum furnace, the two metals with said powdery media being coated on their binding surfaces as produced in step (a) until the two metals are fused together by eutectic welding, and the sintering temperature being controlled at a temperature higher than the eutectic points of the two metals and the powdery medium, but lower than the melting points of the two metals.Type: GrantFiled: September 13, 1999Date of Patent: April 3, 2001Assignee: New Century Technology Co., Ltd.Inventors: Chao-nien Tung, Tien-tzu Chuang