Abstract: Disclosed is Z-axis stage driving apparatus to move a stage on which a workpiece such as a wafer is placed along a Z-axis. The Z-axis stage driving apparatus includes a motor, a plurality of elevating devices to move a stage along a Z-axis, a power transmission device to transmit power of the motor to the plurality of elevating devices, and a clutch to control power transmission between the power transmission device and the elevating devices.

Abstract: According to an example embodiment a substrate processing apparatus includes a supporting unit, a lifting unit on at least a side of the supporting unit, a tray supported by the lifting unit, and a transfer unit configured to transfer a substrate to the tray such that the substrate is positioned on the tray. The lifting unit moves the tray up and down to load or unload the substrate located on the tray on or from the supporting unit.

Abstract: An exposure apparatus and a method to measure a beam position and assigning an address using the same are disclosed. The exposure apparatus includes a Digital Micromirror Device (DMD) having a plurality of micromirrors, each micromirror to modulate light projected from a light source and project a modulated DMD beam onto an exposed surface, a measurement mask to measure positions of the DMD beams projected onto the exposed surface, a sensor to detect light intensities of the DMD beams measured by the measurement mask, and a controller to determine the positions of the DMD beams according to the detected light intensities.