Patents by Inventor Ulf Weidenmuller

Ulf Weidenmuller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Shadow mask and method for producing a shadow mask
    Patent number: 7183043
    Abstract: The disclosed device is directed towards a shadow mask for ion beams comprising a silicon wafer with a hole pattern arranged therein, wherein the silicon wafer is provided at a side confronting the incident ion beams with a metallic coating which stops the ion beams and dissipates heat, wherein an apertured region of the silicon wafer has a thickness from about 20 ?m to about 200 ?m and apertures in the shadow mask have lateral dimensions from about 0.5 ?m to about 3 ?m.
    Type: Grant
    Filed: August 14, 2001
    Date of Patent: February 27, 2007
    Assignee: Universitat Kassel
    Inventors: Jan Meijer, Andreas Stephan, Ulf Weidenmuller, Ivo Rangelow
  • Shadow mask and method for producing a shadow mask
    Publication number: 20040219465
    Abstract: The disclosed device is directed towards a shadow mask for ion beams comprising a silicon wafer with a hole pattern arranged therein, wherein the silicon wafer is provided at a side confronting the incident ion beams with a metallic coating which stops the ion beams and dissipates heat, wherein an apertured region of the silicon wafer has a thickness from about 20 &mgr;m to about 200 &mgr;m and apertures in the shadow mask have lateral dimensions from about 0.5 &mgr;m to about 3 &mgr;m.
    Type: Application
    Filed: October 10, 2003
    Publication date: November 4, 2004
    Inventors: Jan Meijer, Andreas Stephan, Ulf Weidenmuller, Ivo Rangelow