Patents by Inventor Ullrich Steiner

Ullrich Steiner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • MESOPOROUS INORGANIC COATINGS WITH PHOTOCATALYTIC PARTICLES IN ITS PORES
    Publication number: 20150376441
    Abstract: This invention relates to coatings for substrates, in particular antireflective coatings (ARCs) and self-cleaning coatings (SCCs). A coating for a substrate comprises a mesoporous inorganic skeleton having photocatalytic particles provided therein and/or thereon, the coating having a porosity in excess of 50 v/v %, for example, greater than 55%, 60%, 65%, 70 v/v %.
    Type: Application
    Filed: January 8, 2015
    Publication date: December 31, 2015
    Inventors: Stefan Guldin, Ullrich Steiner
  • Methods and apparatus for forming submicron patterns on films
    Patent number: 7014786
    Abstract: A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film.
    Type: Grant
    Filed: May 14, 2002
    Date of Patent: March 21, 2006
    Assignees: Universitat Konstanz, University of Massachusetts
    Inventors: Erik Schaffer, Jurgen Mlynek, Ullrich Steiner, Thomas Thurn-Albrecht, Thomas P. Russell
  • Process for producing antireflection coatings
    Patent number: 6605229
    Abstract: The invention relates to a method for producing an element comprising a substrate and at least one anti-reflection coating with pores. The dimensions of the anti-reflection coating are below the wavelength of visible light or the neighboring spectral ranges. The invention also relates to an element produced according to this method with at least one anti-reflection coating, for example optical lenses, mirrors or other optical components. The optical anti-reflection coating of these elements is essentially improved.
    Type: Grant
    Filed: December 19, 2000
    Date of Patent: August 12, 2003
    Assignee: Universitat Konstanz
    Inventors: Ullrich Steiner, Stefan Walheim, Erik Schäffer, Stefan Eggert, Jürgen Mlynek
  • Methods and apparatus for forming submicron patterns on films
    Publication number: 20020170879
    Abstract: A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film.
    Type: Application
    Filed: May 14, 2002
    Publication date: November 21, 2002
    Applicant: University of Massachusetts, a Massachusetts corporation
    Inventors: Erik Schaffer, Jurgen Mlynek, Ullrich Steiner, Thomas Thurn-Albrecht, Thomas P. Russell
  • Methods and apparatus for forming submicron patterns on films
    Patent number: 6391217
    Abstract: A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface; and hardening the structure in the first flowable medium to form the patterned film.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: May 21, 2002
    Assignees: University of Massachusetts, Universitat Konstanz
    Inventors: Erik Schäffer, Jurgen Mlynek, Ullrich Steiner, Thomas Thurn-Albrecht, Thomas P. Russell
  • Methods and apparatus for forming submicron patterns on films
    Publication number: 20020005391
    Abstract: A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface; and hardening the structure in the first flowable medium to form the patterned film.
    Type: Application
    Filed: December 22, 2000
    Publication date: January 17, 2002
    Inventors: Erik Schaffer, Jurgen Mlynek, Ullrich Steiner, Thomas Thurn-Albrecht, Thomas P. Russell
  • Process for producing antireflection coatings
    Publication number: 20010024684
    Abstract: The invention relates to a method for producing an element comprising a substrate and at least one anti-reflection coating with pores. The dimensions of the anti-reflection coating are below the wavelength of visible light or the neighbouring spectral ranges. The invention also relates to an element produced according to this method with at least one anti-reflection coating, for example optical lenses, mirrors or other optical components. The optical anti-reflection coating of these elements is essentially improved.
    Type: Application
    Filed: December 19, 2000
    Publication date: September 27, 2001
    Inventors: Ullrich Steiner, Stefan Walheim, Erik Schaffer, Stefan Eggert, Jurgen Mlynek