Abstract: Micro-lenses for use in imagers and their method of manufacture from intermediate lens structures are described. Lithographic masks are used to remove unwanted portions from the intermediate lens structures and to remove cut-out portions from the intermediate lens structures to alter the radius of the resultant micro-lenses. Lithographic masks are also used to inhibit pull-back of the micro-lenses during a reflow step.

Abstract: Ellipse-shaped microlenses focus light onto unbalanced photosensitive areas, increase area coverage for a gapless layout of microlenses, and allow pair-wise or other individual shifts of the microlenses to account for asymmetrical pixels and pixel layout architectures. The microlenses may be fabricated in sets, with one set oriented differently from another set, and may be arranged in various patterns, for example, in a checkerboard pattern or radial pattern. The microlenses of at least one set may be substantially elliptical in shape. To fabricate a first set of microlenses, a first set of microlens material is patterned onto a support, reflowed under first reflow conditions, and cured. To fabricate a second set of microlenses, a second set of microlens material is patterned onto the support, reflowed under second reflow conditions, which may be different from the first conditions, and cured.

Abstract: A micro-lens and a method for forming the micro-lens is provided. A micro-lens includes a substrate and lens material located within the substrate, the substrate having a recessed area serving as a mold for the lens material. The recessed can be shaped such that the lens material corrects for optical aberrations. The micro-lens can be part of a micro-lens array. The recessed area can serve as a mold for lens material for the micro-lens array and can be shaped such that the micro-lens array includes arcuate, non-spherical, or non-symmetrical micro-lenses.

Abstract: A pixel cell with a photosensitive region formed in association with a substrate, a color filter formed over the photosensitive region, the color filter comprising a first material layer and a second material layer formed in association with the first shaping material layer.

Abstract: A micro-lens and a method for forming the micro-lens is provided. A micro-lens includes a substrate an lens material located within the substrate, the substrate having a recessed area serving as a mold for the lens material. The recessed can be shaped such that the lens material corrects for optical aberrations. The micro-lens can be part of a micro-lens array. The recessed area can serve as a mold for lens material for the micro-lens array and can be shaped such that the micro-lens array includes arcuate, non-spherical, or non-symmetrical micro-lenses.

Abstract: An imager pixel array capable of separating and detecting the spectral components of an incident light without the use of a color filter array. The imager pixel array employs a grating layer which allows one or more spectral components of incident light to be transmitted therethrough, but diffracts other spectral components of the incident light. Both the transmitted and diffracted spectral components can be sensed by photosensors in the imager pixel array and used in subsequent data processing, thereby improving the quantum efficiency of the imager device. The grating layer can be formed of first and second materials each having a refractive index which are substantially the same at a predetermined wavelength.

Abstract: A microlens array having first and second sets of spherically-shaped microlenses. The second set of spherically-shaped microlenses are located in the areas between individual microlenses of the first set in such a way that there is minimized gapping over the entire microlens array. A semiconductor-based imager includes a pixel array having embedded pixel cells, each with a photosensor, and a microlens array having spherically-shaped microlenses as just described.

Abstract: Microfeature workpieces having microlenses and methods of forming microlenses on microfeature workpieces are disclosed herein. In one embodiment, a method for forming microlenses includes forming a plurality of shaping members on a microfeature workpiece between adjacent pixels, reflowing the shaping members to form a shaping structure between adjacent pixels, depositing lens material onto the workpiece, removing selected portions of the lens material adjacent to the shaping structure such that discrete masses of lens material are located over corresponding pixels, and heating the workpiece to reflow the discrete masses of lens material and form a plurality of microlenses.

Abstract: A method and apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation. The method can include directing the radiation along a radiation path in a first direction toward a reticle, passing the radiation from the reticle and to the microlithographic substrate along the radiation path in a second direction, and moving the reticle relative to the radiation path along a reticle path generally normal to the first direction. The microlithographic substrate can move relative to the radiation path along a substrate path having a first component generally parallel to the second direction, and a second component generally perpendicular to the second direction. The microlithographic substrate can move generally parallel to and generally perpendicular to the second direction in a periodic manner while the reticle moves along the reticle path to change a relative position of a focal plane of the radiation.

Abstract: Methods of forming color filters having a light blocking material therebetween. A color filter is formed such that a trench is defined between a color filter and an adjacent color filter. The trench may be formed by exposing the color filter to polymerizing conditions such as, for example, ultraviolet radiation and heat. The trench may also be formed by etching between adjacent color filters. A material is formed within the trench.

Abstract: Asymmetrical structures and methods are used to adjust the orientation of a microlens for a pixel array. The asymmetrical structures affect volume and surface force parameters during microlens formation. Exemplary microlens structures include an asymmetrical microlens frame, base, material or a combination thereof to affect the focal characteristics of the microlens. The asymmetrical frame alters the microlens flow resulting from the heating of the microlens during fabrication such that orientation of the microlens relative to an axis of the imager can be controlled.

Abstract: A variety of structures and methods used to adjust the shape, radius and/or height of a microlens for a pixel array. The structures affect volume and surface force parameters during microlens formation. Exemplary microlens structures include a microlens frame, base, material, protrusions or a combination thereof to affect the shape, height and/or radius of the microlens. The frame, base and/or protrusions alter the microlens flow resulting from the heating of the microlens during fabrication such that a height or radius of the microlens can be controlled. The radius can be adjusted by the height differences between the microlens and frame. The bigger the difference, the smaller the radius will be.

Abstract: A micro-lens and a method for forming the micro-lens is provided. A micro-lens includes a substrate and lens material located within the substrate, the substrate having a recessed area serving as a mold for the lens material. The recessed can be shaped such that the lens material corrects for optical aberrations. The micro-lens can be part of a micro-lens array. The recessed area can serve as a mold for lens material for the micro-lens array and can be shaped such that the micro-lens array includes arcuate, non-spherical, or non-symmetrical micro-lenses.

Abstract: A method and apparatus for controlling an intensity distribution of a radiation beam directed to a microlithographic substrate. The method can include directing a radiation beam from a radiation source along the radiation path, with the radiation beam having a first distribution of intensity as the function of location in a plane generally transverse to the radiation path. The radiation beam impinges on an adaptive structure positioned in the radiation path and an intensity distribution of the radiation beam is changed from the first distribution to a second distribution by changing a state of the first portion of the adaptive structure relative to a second portion of the adaptive structure. For example, the transmissivity of the first portion, or inclination of the first portion can be changed relative to the second portion. The radiation is then directed away from the adaptive structure to impinge on the microlithographic substrate.

Abstract: A micro-lens array with reduced or no empty space between individual micro-lenses and a method for forming same. The micro-lens array is formed by patterning a first set of micro-lens material in a checkerboard pattern on a substrate. The first set of micro-lens material is reflowed and cured into first micro-lenses impervious to subsequent reflows. Then, a second set of micro-lens material is patterned in spaces among the first micro-lenses, reflowed and cured into second micro-lenses. The reflows and cures can be conducted under different conditions, and the micro-lenses may be differently sized. The conditions of the reflows can be chosen to ensure that the focal lengths of micro-lenses are optimized for maximum sensor signal.

Abstract: A semi-conductor based imager includes a microlens array having microlenses with modified focal characteristics. The microlenses are made of a microlens material, the melting properties of which are selectively modified to obtain different shapes after a reflow process. Selected microlenses, or portions of each microlens, are modified, by exposure to ultraviolet light, for example, to control the microlens shape produced by reflow melting. Controlling the microlens shape allows for modification of the focal characteristics of selected microlenses in the microlens array.

Abstract: A microlens array with reduced or no empty space between individual microlenses and a method for forming the same. The microlens array is formed by patterning a first set of microlens precursors in a checkerboard pattern on a substrate. The first set of microlens precursors is reflowed and cured into first microlenses impervious to subsequent reflows. Then, a second set of microlens precursors is patterned in spaces among the first microlenses, reflowed and cured into second microlenses. The reflows and cures can be conducted under different conditions, and the microlenses may be differently sized. The conditions of the reflows can be chosen to ensure that the focal lengths of microlenses are optimized for maximum sensor signal.

Abstract: Microelectronic imagers with shaped image sensors and methods for manufacturing curved image sensors. In one embodiment, a microelectronic imager device comprises an imaging die having a substrate, a curved microelectronic image sensor having a face with a convex and/or concave portion at one side of the substrate, and integrated circuitry in the substrate operatively coupled to the image sensor. The imaging die can further include external contacts electrically coupled to the integrated circuitry and a cover over the curved image sensor.

Abstract: A patterned mask can be formed as follows. A first patterned photoresist is formed over a masking layer and utilized during a first etch into the masking layer. The first etch extends to a depth in the masking layer that is less than entirely through the masking layer. A second patterned photoresist is subsequently formed over the masking layer and utilized during a second etch into the masking layer. The combined first and second etches form openings extending entirely through the masking layer and thus form the masking layer into the patterned mask. The patterned mask can be utilized to form a pattern in a substrate underlying the mask. The pattern formed in the substrate can correspond to an array of capacitor container openings. Capacitor structure can be formed within the openings. The capacitor structures can be incorporated within a DRAM array.

Abstract: A semi-conductor based imager includes a microlens array having microlenses with modified focal characteristics. The microlenses are made of a microlens material, the melting properties of which are selectively modified to obtain different shapes after a reflow process. Selected microlenses, or portions of each microlens, are modified, by exposure to ultraviolet light, for example, to control the microlens shape produced by reflow melting. Controlling the microlens shape allows for modification of the focal characteristics of selected microlenses in the microlens array.