Patents by Inventor Ulrich Loering
Ulrich Loering has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8228483Abstract: A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength ?. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>?.Type: GrantFiled: February 2, 2010Date of Patent: July 24, 2012Assignee: Carl Zeiss SMT GmbHInventors: Ulrich Loering, Gerd Reisinger, Franz-Josef Stickel, Sonja Schneider, Johann Trenkler, Stefan Kraus, Gordon Doering, Aksel Goehnermeier
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Publication number: 20120019800Abstract: A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis.Type: ApplicationFiled: September 26, 2011Publication date: January 26, 2012Applicant: CARL ZEISS SMT GMBHInventors: Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra
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Publication number: 20110285979Abstract: A projection objective for imaging an object arranged in an object plane of the projection objective into an image of the object lying in an image plane of the projection objective has a multiplicity of transparent optical elements and holding devices for holding the optical elements at prescribable positions along an imaging beam path of the projection objective. Each of the optical elements has an optical useful region lying in the imaging beam path and an edge region lying outside the optical useful region. At least one holding element of the holding device assigned to the optical element acts at the edge region in the region of a contact zone. At least one of the optical elements is assigned a diaphragm arrangement with a false light diaphragm arranged directly upstream of the optical element and a second false light diaphragm arranged directly downstream of the optical element.Type: ApplicationFiled: May 13, 2011Publication date: November 24, 2011Applicant: CARL ZEISS SMT GMBHInventors: Nils Dieckmann, Alexander Wolf, Christian Holland, Ulrich Loering, Franz Sorg
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Patent number: 8054557Abstract: Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.Type: GrantFiled: March 2, 2010Date of Patent: November 8, 2011Assignee: Carl Zeiss SMT GmbHInventors: Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra
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Publication number: 20100195070Abstract: A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength ?. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>?.Type: ApplicationFiled: February 2, 2010Publication date: August 5, 2010Applicant: Carl Zeiss SMT AGInventors: Ulrich Loering, Gerd Reisinger, Franz-Josef Stickel, Sonja Schneider, Johann Trenkler, Stefan Kraus, Gordon Doering, Aksel Goehnermeier
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Publication number: 20100157435Abstract: Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.Type: ApplicationFiled: March 2, 2010Publication date: June 24, 2010Applicant: CARL ZEISS SMT AGInventors: Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra
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Publication number: 20100141912Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.Type: ApplicationFiled: February 9, 2010Publication date: June 10, 2010Applicant: CARL ZEISS SMT AGInventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
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Patent number: 7697211Abstract: The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.Type: GrantFiled: October 23, 2008Date of Patent: April 13, 2010Assignee: Carl Zeiss SMT AGInventors: David R. Shafer, Aurelian Dodoc, Johannes Zellner, Heiko Feldmann, Wilhelm Ulrich, Holger Walter, Ulrich Loering, Daniel Kraehmer, Gerhard Fuerter
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Patent number: 7692868Abstract: Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.Type: GrantFiled: November 5, 2008Date of Patent: April 6, 2010Assignee: Carl Zeiss SMT AGInventors: Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra
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Publication number: 20090244509Abstract: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.Type: ApplicationFiled: March 24, 2009Publication date: October 1, 2009Applicant: CARL ZEISS SMT AGInventors: Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering, Dirk Hellweg, Peter Meyer, Stefan Xalter, Jens Kugler, Bernhard Gellrich, Stefan Hembacher, Bernhard Geuppert, Aksel Goehnermeier
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Patent number: 7570343Abstract: A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.Type: GrantFiled: November 23, 2005Date of Patent: August 4, 2009Assignee: Carl Zeis SMT AGInventors: Aurelian Dodoc, Karl Heinz Schuster, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski, Hubert Holderer, Bernhard Gellrich, Juergen Fischer, Susanne Beder, Andreas Wurmbrand, Ulrich Loering, Albrecht Ranck
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Publication number: 20090103184Abstract: Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.Type: ApplicationFiled: November 5, 2008Publication date: April 23, 2009Applicant: CARL ZEISS SMT AGInventors: Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra
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Publication number: 20090080086Abstract: The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.Type: ApplicationFiled: October 23, 2008Publication date: March 26, 2009Applicant: CARL ZEISS SMT AGInventors: David R. Shafer, Aurelian Dodoc, Johannes Zellner, Heiko Feldmann, Wilhelm Ulrich, Holger Walter, Ulrich Loering, Daniel Kraehmer, Gerhard Fuerter
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Publication number: 20080309894Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.Type: ApplicationFiled: August 21, 2008Publication date: December 18, 2008Applicant: CARL ZEISS SMT AGInventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
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Patent number: 7463423Abstract: A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis.Type: GrantFiled: December 13, 2007Date of Patent: December 9, 2008Assignee: Carl Zeiss SMT AGInventors: Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra
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Publication number: 20080297745Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: ApplicationFiled: August 6, 2008Publication date: December 4, 2008Inventors: Karl-Stefan WEISSENRIEDER, Alexander HIRNET, Alexander PAZIDIS, Karl-Heinz SCHUSTER, Christoph ZACZEK, Michael LILL, Patrick SCHEIBLE, Guenter SCHEIBLE, Sigrid SCHEIBLE, Harald SCHINK, Markus BROTSACK, Ulrich LOERING, Toralf GRUNER
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Patent number: 7460206Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: GrantFiled: December 20, 2004Date of Patent: December 2, 2008Assignee: Carl Zeiss SMT AGInventors: Karl-Stefan Weissenrieder, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill, Guenter Scheible, legal representative, Harald Schink, Markus Brotsack, Ulrich Loering, Toralf Gruner, Patrick Scheible
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Publication number: 20080291419Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: ApplicationFiled: August 6, 2008Publication date: November 27, 2008Inventors: Karl-Stefan Weissenrieder, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill, Patrick Scheible, Guenter Scheible, Harald Schink, Markus Brotsack, Ulrich Loering, Toralf Gruner, Sigrid Scheible
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Publication number: 20080144184Abstract: A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis.Type: ApplicationFiled: December 13, 2007Publication date: June 19, 2008Applicant: CARL ZEISS SMT AGInventors: Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra
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Publication number: 20070070316Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.Type: ApplicationFiled: July 18, 2006Publication date: March 29, 2007Inventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra