Patents by Inventor Urs T. Duerig

Urs T. Duerig has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110199887
    Abstract: The present invention is directed to a method for producing a data storage medium on a surface of a substrate for storing data in the form of topographic features. The method comprises a first step wherein a crosslinking agent containing at least three alkyne groups is deposited on the surface of the substrate. In a second step the deposited cross linking agent is cured so as to obtain the data storage medium in the form of a crosslinked polymeric layer on the surface of the substrate.
    Type: Application
    Filed: October 15, 2009
    Publication date: August 18, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Urs T. Duerig, Bernd W. Gotsmann, Armin W. Knoll, David S. Pires
  • Publication number: 20110128840
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.
    Type: Application
    Filed: January 28, 2011
    Publication date: June 2, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Patent number: 7952369
    Abstract: A device for sensing a position of a probe relative to a reference medium, the probe comprising a heater element with a temperature dependent electrical resistance and being adapted to determine probe position by measuring a parameter associated to a thermal relaxation time of the heater element.
    Type: Grant
    Filed: August 20, 2009
    Date of Patent: May 31, 2011
    Assignee: International Business Machines Corporation
    Inventors: Urs T. Duerig, Bernd W. Gotsmann, Armin W. Knoll
  • Publication number: 20110113517
    Abstract: A method and a scanning probe microscope (SPM) for scanning a surface of a material. The method and SPM have a cantilever sensor configured to exhibit both a first spring behavior and a second, stiffer spring behavior. While operating the SPM in contact mode, the sensor is scanned on the material surface and a first spring behavior of the sensor (e.g. a fundamental mode of flexure thereof) is excited by deflection of the sensor by the material surface. Also while operating the SPM in contact mode, excitation means are used to excite a second spring behavior of the sensor at a resonance frequency thereof (e.g. one or more higher-order resonant modes) of the cantilever sensor to modulate an interaction of the sensor and the material surface and thereby reduce the wearing of the material surface.
    Type: Application
    Filed: November 5, 2010
    Publication date: May 12, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Urs T. Duerig, Bernd W. Gotsmann, Armin W. Knoll, Mark Alfred Lantz
  • Patent number: 7939620
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.
    Type: Grant
    Filed: March 27, 2008
    Date of Patent: May 10, 2011
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Patent number: 7906887
    Abstract: A microsystem, comprising a first static element (1), a second, movable and unattached element (2), an actuator (3) for effecting a force between the first and the second element (1, 2), which actuator (3) is designed for controlling a temperature (T1, T2) of one of the first element (1) and the second element (2). A corresponding method for positioning a second element (2) with respect to a first element (1) in a microsystem is introduced.
    Type: Grant
    Filed: September 29, 2005
    Date of Patent: March 15, 2011
    Assignee: International Business Machines Corporation
    Inventors: Bernd Gotsmann, Michel Despont, Urs T. Duerig
  • Patent number: 7889629
    Abstract: A data storage system includes a read/write head having a tip connected to a resistive path locally exerting heat at the tip when an electrical current is applied; and a data storage medium from which information is reproduced by scanning a surface of the medium with a tip positioned in contact therewith, the medium comprising: a substrate; and a polymer recording surface within which data bit values are determined by the topographical state at the bit location, characterized in that the polymer contains thermally reversible crosslinkages.
    Type: Grant
    Filed: November 21, 2008
    Date of Patent: February 15, 2011
    Assignee: International Business Machines Corporation
    Inventors: Jane Frommer, Robert D. Miller, Craig Hawker, Urs T. Duerig, Bernd Gotsmann, Peter Vettiger, Mark A. Lantz
  • Publication number: 20110020533
    Abstract: A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed are methods that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.
    Type: Application
    Filed: October 7, 2010
    Publication date: January 27, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Michel Despont, Urs T. Duerig, Jane E. Frommer, Bernd W. Gotsmann, James L. Hedrick, Craig Jon Hawker, Robert D. Miller
  • Patent number: 7862858
    Abstract: A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed are methods that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.
    Type: Grant
    Filed: December 17, 2008
    Date of Patent: January 4, 2011
    Assignee: International Business Machines Corporation
    Inventors: Michel Despont, Urs T. Duerig, Jane E. Frommer, Bernd W. Gotsmann, James L. Hedrick, Craig Jon Hawker, Robert D. Miller
  • Publication number: 20100316960
    Abstract: The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g. thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g. into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.
    Type: Application
    Filed: June 11, 2009
    Publication date: December 16, 2010
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Urs T. Duerig, Jane E. Frommer, Bernd W. Gotsmann, James L. Hedrick, Armin W. Knoll, Robert D. Miller, David Pires, Charles G. Wade
  • Patent number: 7849731
    Abstract: The present invention provides a novel method for determining the mechanical properties of the surfaces of materials including thin films. Generally, the method is comprised of laterally scanning the surface of the film with an array of cantilever tips varying temperature, load and time to obtain a measurement of mechanical properties, such as hardness and glass transition temperature. The method can be used to obtain mechanical properties of films that would otherwise be unobtainable using standard methods.
    Type: Grant
    Filed: October 14, 2008
    Date of Patent: December 14, 2010
    Assignee: International Business Machines Corporation
    Inventors: Richard L. Bradshaw, Bernd W. Gotsmann, Urs T. Duerig
  • Publication number: 20100284264
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone copolymers, each of the one or more polyaryletherketone copolymers comprising (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a first phenylethynyl moiety, each of the one or more polyaryletherketone copolymers having two terminal ends, each terminal end having a phenylethynyl moiety the same as or different from the first phenylethynyl moiety. The one or more polyaryletherketone copolymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layer in an atomic force data storage device.
    Type: Application
    Filed: July 14, 2010
    Publication date: November 11, 2010
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Patent number: 7811499
    Abstract: An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyaryletherketone polymers are used as the recording layers in atomic force data storage devices, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyaryletherketone polymers may be tuned to match thermal and force parameters required in read-write-erase cycles.
    Type: Grant
    Filed: June 26, 2006
    Date of Patent: October 12, 2010
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Publication number: 20100196661
    Abstract: Probe-based methods for patterning a surface of a material are described. In particular, high resolution patterning of molecules on a surface of a material, such as nano-scale patterns with feature sizes of less than 30 nanometers, are described. In one aspect, a method for patterning a surface of a material includes providing a material having a polymer film. A heated, nano-scale dimensioned probe is then used to desorb molecules upon interacting with the film. The film includes a network of molecules (such as molecular glasses) which are cross-linked via intermolecular (noncovalent) bonds, such as hydrogen bonds.
    Type: Application
    Filed: January 30, 2009
    Publication date: August 5, 2010
    Inventors: Urs T. Duerig, Bernd W. Gotsmann, James Lupton Hedrick, Armin W. Knoll, David Santos Pires
  • Patent number: 7755373
    Abstract: A device for sensing a position of a probe relative to a reference medium, including a heater element with a temperature dependent electrical resistance which determines probe position by measuring a parameter related to a thermal relaxation time of the heater element.
    Type: Grant
    Filed: September 8, 2006
    Date of Patent: July 13, 2010
    Assignee: International Business Machines Corporation
    Inventors: Urs T. Duerig, Bernd W. Gotsmann, Armin W. Knoll
  • Patent number: 7749915
    Abstract: A method of protecting a polymeric layer from contamination by a photoresist layer. The method includes: (a) forming a polymeric layer over a substrate; (b) forming a non-photoactive protection layer over the polymeric layer; (c) forming a photoresist layer over the protection layer; (d) exposing the photoresist layer to actinic radiation and developing the photoresist layer to form a patterned photoresist layer, thereby exposing regions of the protection layer; (e) etching through the protection layer and the polymeric layer where the protection layer is not protected by the patterned photoresist layer; (f) removing the patterned photoresist layer in a first removal process; and (g) removing the protection layer in a second removal process different from the first removal process.
    Type: Grant
    Filed: March 31, 2008
    Date of Patent: July 6, 2010
    Assignee: International Business Machines Corporation
    Inventors: Ute Drechsler, Urs T. Duerig, Jane Elizabeth Frommer, Bernd W. Gotsmann, James Lupton Hedrick, Armin W. Knoll, Tobias Kraus, Robert Dennis Miller
  • Patent number: 7723458
    Abstract: An approach is presented for designing a polymeric layer for nanometer scale thermo-mechanical storage devices. Cross-linked polyaryletherketone polymers are used as the recording layers in atomic force data storage devices, giving significantly improved performance when compared to previously reported cross-linked and linear polymers. The cross-linking of the polyaryletherketone polymers may be tuned to match thermal and force parameters required in read-write-erase cycles.
    Type: Grant
    Filed: March 25, 2008
    Date of Patent: May 25, 2010
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Publication number: 20100085056
    Abstract: A topography sensor and method include a probe configured to traverse a surface to determine a topography. A stray magnetic field is disposed in proximity to the probe. A magneto-resistive sensor is configured so that the stray magnetic field passing through it changes in accordance with positional changes of the probe as the probe tip traverses the surface.
    Type: Application
    Filed: October 3, 2008
    Publication date: April 8, 2010
    Inventors: Peter Baechtold, Urs T. Duerig, Walter Haeberle, Armin W. Knoll, Charalampos Pozidis, Deepak Ranjan Sahoo, Gian R. Salis, Abu Sebastian
  • Publication number: 20100059383
    Abstract: The present invention relates to a device for forming topographic features on a surface of a polymer layer comprising: a polymer layer (1); a substrate (2) comprising a conductor, a first surface (1a) of the polymer layer (1) being provided on the substrate (2); and at least one electrode (3) which, when the device is in use, interacts with a second surface (1b) of the polymer layer (1), wherein, when in use, the device is operable to apply a first electrical potential (P1) to the at least one electrode (3) relative to the substrate (2), thereby to cause a protrusion (4) to be formed on the second surface (1b) of the polymer layer (1).
    Type: Application
    Filed: July 18, 2007
    Publication date: March 11, 2010
    Applicant: International Business Machines Corporation
    Inventors: Urs T. Duerig, Bernd W. Gotsmann, Armin W. Knoll
  • Patent number: 7675837
    Abstract: The present invention provides data storage devices, systems and methods. An example device includes: a storage medium for storing data in the form of marks; and at least one probe. The probe(s) and storage medium are operable to move relative to each other, with each probe comprising a tip facing the storage medium and having a force creating unit associated thereto. The force creating units are operable to create a force acting between the tip and said storage medium. The data storage device is operable to erase an indentation mark in the storage medium by way of controlling the force creating unit for creating at least one erase force pulse with a force rise time being less than or equal to the order of 1 microsecond.
    Type: Grant
    Filed: May 26, 2008
    Date of Patent: March 9, 2010
    Assignee: International Business Machines Corporation
    Inventors: Bernd W. Gotsman, Urs T. Duerig, Charalampos Pozidie, Hugo E. Rothuizen, Gerd K. Binnig