Abstract: The present invention relates to strongly coloured manganese ferrite colour pigments, to the production thereof and to the use thereof.

Abstract: Microlithographic projection exposure apparatus (100) has a projection lens (150) configured to image an object plane (155) onto an image plane (156), wherein an immersion liquid is at least temporarily provided during operation of the projection exposure apparatus between the projection lens and the image plane, wherein a measurement structure (121) is arranged in the immersion liquid, and wherein the measurement structure is configured to generate a measurement pattern. The projection exposure apparatus also has a measurement device (130, 160) configured to measure the measurement pattern. The measurement structure has an absorption layer (125) including silicon oxide and/or silicon oxynitride and/or nitride.

Abstract: Microlithographic projection exposure apparatus (100) has a projection lens (150) configured to image an object plane (155) onto an image plane (156), wherein an immersion liquid is at least temporarily provided during operation of the projection exposure apparatus between the projection lens and the image plane, wherein a measurement structure (121) is arranged in the immersion liquid, and wherein the measurement structure is configured to generate a measurement pattern. The projection exposure apparatus also has a measurement device (130, 160) configured to measure the measurement pattern. The measurement structure has an absorption layer (125) including silicon oxide and/or silicon oxynitride and/or nitride.

Abstract: An arrangement for and a method of characterizing the polarization properties of an optical system, in particular an optical system of a microlithographic projection exposure apparatus. The arrangement includes at least one polarization state generator (130, 230, 330) which sets a defined polarization state of radiation incident on the optical system, and a polarization state detector (140, 240, 340) adapted to measure the exit polarization state of radiation issuing from the optical system, wherein the optical system is designed for a working wavelength of less than 15 nm, and wherein the polarization state generator and/or the polarization state detector are so designed that their polarization-optical action on an incident light beam is substantially constant over an angle spectrum of the light beam of at least 10°.

Abstract: An arrangement for and a method of characterising the polarisation properties of an optical system, in particular an optical system of a microlithographic projection exposure apparatus. The arrangement includes at least one polarisation state generator (130, 230, 330) which sets a defined polarisation state of radiation incident on the optical system, and a polarisation state detector (140, 240, 340) adapted to measure the exit polarisation state of radiation issuing from the optical system, wherein the optical system is designed for a working wavelength of less than 15 nm, and wherein the polarisation state generator and/or the polarisation state detector are so designed that their polarisation-optical action on an incident light beam is substantially constant over an angle spectrum of the light beam of at least 10°.

Abstract: This invention relates to carbon black pellets obtained by compaction of carbon black powder in the presence of auxiliary substances, which pellets, despite the compaction, surprisingly exhibit greater color intensity than the powders on which they are based.