Patents by Inventor Vadim Yourievich TIMOSHKOV

Vadim Yourievich TIMOSHKOV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230076218
    Abstract: Methods related to improving a simulation processes and solutions (e.g., retargeted patterns) associated with manufacturing of a chip. A method includes obtaining a plurality of dose-focus settings, and a reference distribution based on measured values of a characteristic of a printed pattern associated with each setting of the plurality of dose-focus settings. The method further includes, based on an adjustment model and the plurality of dose-focus settings, determining a probability density function (PDF) of the characteristic such that an error between the PDF and the reference distribution is reduced. The PDF can be a function of the adjustment model and variance associated with dose, the adjustment model being configured to change a proportion of non-linear dose sensitivity contribution to the PDF. A process window can be adjusted based on the determined PDF of the characteristic.
    Type: Application
    Filed: February 18, 2021
    Publication date: March 9, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Koenraad VAN INGEN SCHENAU, Abraham SLACHTER, Vadim Yourievich TIMOSHKOV, Marleen KOOIMAN, Marie-Claire VAN LARE, Hermanus Adrianus DILLEN, Stefan HUNSCHE, Luis Alberto Colina Sant COLINA, Aiqin JIANG, Fuming WANG, Sudharshanan RAGHUNATHAN
  • Publication number: 20210407112
    Abstract: A method for determining an image-metric of features on a substrate, the method including: obtaining a first image of a plurality of features on a substrate; obtaining one or more further images of a corresponding plurality of features on the substrate, wherein at least one of the one or more further images is of a different layer of the substrate than the first image; generating aligned versions of the first and one or more further images by performing an alignment process on the first and one or more further images; and calculating an image-metric in dependence on a comparison of the features in the aligned version of the first image and the corresponding features in the one or more aligned versions of the one or more further images.
    Type: Application
    Filed: September 23, 2019
    Publication date: December 30, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wim Tjibbo TEL, Antoine Gaston Marie KIERS, Vadim Yourievich TIMOSHKOV, Hermanus Adrianus DILLEN, Yichen ZHANG, Te-Sheng WANG, Tzu-Chao CHEN
  • Publication number: 20210397172
    Abstract: A method for analyzing a process, the method including obtaining a multi-dimensional probability density function representing an expected distribution of values for a plurality of process parameters; obtaining a performance function relating values of the process parameters to a performance metric of the process; and using the performance function to map the probability density function to a performance probability function having the process parameters as arguments.
    Type: Application
    Filed: October 30, 2019
    Publication date: December 23, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Abraham SLACHTER, Wim Tjibbo TEL, Daan Maurits SLOTBOOM, Vadim Yourievich TIMOSHKOV, Koen Wilhelmus Cornelis Adrianus VAN DER STRATEN, Boris MENCHTCHIKOV, Simon Philip Spencer HASTINGS, Cyrus Emil TABERY, Maxime Philippe Frederic GENIN, Youping ZHANG, Yi ZOU, Chenxi LIN, Yana CHENG