Patents by Inventor Valentin Cherepin

Valentin Cherepin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • DIRECTED MULTI-DEFLECTED ION BEAM MILLING OF A WORK PIECE AND DETERMINING AND CONTROLLING EXTENT THEREOF
    Publication number: 20130180843
    Abstract: Method, device, and system, for directed multi-deflected ion beam milling of a work piece, and, determining and controlling extent thereof. Providing an ion beam; and directing and at least twice deflecting the provided ion beam, for forming a directed multi-deflected ion beam, wherein the directed multi-deflected ion beam is directed towards, incident and impinges upon, and mills, a surface of the work piece. Device includes an ion beam source assembly; and an ion beam directing and multi-deflecting assembly, for directing and at least twice deflecting the provided ion beam, for forming a directed multi-deflected ion beam, wherein the directed multi-deflected ion beam is directed towards, incident and impinges upon, and mills, a surface of the work piece.
    Type: Application
    Filed: July 17, 2012
    Publication date: July 18, 2013
    Applicant: CAMTEK LTD.
    Inventors: Dimitri BOGUSLAVSKY, Valentin CHEREPIN, Colin SMITH
  • Directed Multi-Deflected Ion Beam Milling of a Work Piece and Determining and Controlling Extent Thereof
    Publication number: 20080078750
    Abstract: Method, device, and system, for directed multi-deflected ion beam milling of a work piece, and, determining and controlling extent thereof. Providing an ion beam; and directing and at least twice deflecting the provided ion beam, for forming a directed multi-deflected ion beam, wherein the directed multi-deflected ion beam is directed towards, incident and impinges upon, and mills, a surface of the work piece. Device includes an ion beam source assembly; and an ion beam directing and multi-deflecting assembly, for directing and at least twice deflecting the provided ion beam, for forming a directed multi-deflected ion beam, wherein the directed multi-deflected ion beam is directed towards, incident and impinges upon, and mills, a surface of the work piece.
    Type: Application
    Filed: August 24, 2005
    Publication date: April 3, 2008
    Applicant: SELA SEMICONDUCTOR ENGINEERING LABORATORIES LTD.
    Inventors: Dimitri Boguslavsky, Valentin Cherepin, Colin Smith