Patents by Inventor Valeriy Ginzburg

Valeriy Ginzburg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition and method for preparing pattern on a substrate
    Patent number: 9012545
    Abstract: A copolymer composition and a method of processing a substrate to form line space features thereon are provided.
    Type: Grant
    Filed: August 31, 2012
    Date of Patent: April 21, 2015
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Xinyu Gu, Shih-Wei Chang, Rahul Sharma, Valeriy Ginzburg, Phillip Hustad, Jeffrey Weinhold, Peter Trefonas
  • Directed self assembly copolymer composition and related methods
    Patent number: 8822619
    Abstract: A copolymer composition is provided including a block copolymer having a poly(styrene) block and a poly(silyl acrylate) block; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: September 2, 2014
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Peter Trefonas, Phillip Hustad, Xinyu Gu, Erin Vogel, Valeriy Ginzburg, Shih-Wei Chang, Daniel Murray
  • Block copolymer formulation and methods relating thereto
    Patent number: 8822616
    Abstract: A block copolymer formulation is provided including a block copolymer blend including a first poly(acrylate)-b-poly(silyl acrylate) block copolymer; and, a second poly(acrylate)-b-poly(silyl acrylate) block copolymer. Also provided are substrates treated with the block copolymer formulation.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: September 2, 2014
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Phillip Hustad, Peter Trefonas, Xinyu Gu, Shih-Wei Chang, Valeriy Ginzburg, Erin Vogel, Daniel Murray
  • Block copolymer composition and methods relating thereto
    Patent number: 8822615
    Abstract: A copolymer composition is provided including a block copolymer having a poly(acrylate) block and a poly(silyl acrylate) block; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: September 2, 2014
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Peter Trefonas, Phillip Hustad, Xinyu Gu, Erin Vogel, Valeriy Ginzburg, Shih-Wei Chang, Daniel Murray
  • Block coploymer formulation and methods relating thereto
    Publication number: 20140227447
    Abstract: A block copolymer formulation is provided including a block copolymer blend including a first poly(acrylate)-b-poly(silyl acrylate) block copolymer; and, a second poly(acrylate)-b-poly(silyl acrylate) block copolymer. Also provided are substrates treated with the block copolymer formulation.
    Type: Application
    Filed: February 8, 2013
    Publication date: August 14, 2014
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Phillip Hustad, Peter Trefonas, Xinyu Gu, Shih-Wei Chang, Valeriy Ginzburg, Erin Vogel, Daniel Murray
  • Block copolymer composition and methods relating thereto
    Publication number: 20140227448
    Abstract: A copolymer composition is provided including a block copolymer having a poly(acrylate) block and a poly(silyl acrylate) block; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
    Type: Application
    Filed: February 8, 2013
    Publication date: August 14, 2014
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Peter Trefonas, Phillip Hustad, Xinyu Gu, Erin Vogel, Valeriy Ginzburg, Shih-Wei Chang, Daniel Murray
  • Directed self assembly copolymer composition and related methods
    Publication number: 20140227445
    Abstract: A copolymer composition is provided including a block copolymer having a poly(styrene) block and a poly(silyl acrylate) block; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
    Type: Application
    Filed: February 8, 2013
    Publication date: August 14, 2014
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Peter Trefonas, Phillip Hustad, Xinyu Gu, Erin Vogel, Valeriy Ginzburg, Shih-Wei Chang, Daniel Murray
  • Composition and method for preparing pattern on a substrate
    Publication number: 20140061155
    Abstract: A copolymer composition and a method of processing a substrate to form line space features thereon are provided.
    Type: Application
    Filed: August 31, 2012
    Publication date: March 6, 2014
    Applicants: DOW GLOBAL TECHNOLOGIES LLC., ROHM AND HAAS ELECTRONIC MATERIALS LLC.
    Inventors: Xinyu Gu, Shih-Wei Chang, Rahul Sharma, Valeriy Ginzburg, Phillip Hustad, Jeffrey Weinhold, Peter Trefonas