Abstract: Disclosed are methods, systems, and articles of manufactures for implementing multiple-patterning-aware correct-by-construction layout processing for an electronic design by identifying rules for a first layer and for second layer(s) adjacent to the first layer, determining one or more sets of grids based on the rules, extending or implementing shapes to terminate at some grids of the one or more sets of grids, and populating the data of the ends of the shapes in the first layer in a data structure. The one or more sets of grids are in direction(s) perpendicular to the routing direction(s) of the first layer and have one or more grid pitches determined based at least in part upon routing pitch(es) of the second layer(s) and rule(s) for vias.

Abstract: Disclosed are a method, apparatus, and program product for routing an electronic design using double patterning that is correct by construction. The layout that has been routed will by construction be designed to allow successful manufacturing with double patterning, since the router will not allow a routing configuration in the layout that cannot be successfully manufactured with double patterning.

Abstract: Various embodiments identify some constraints for multiple mask designs of multi-patterning lithography processes for manufacturing an electronic design and colors multiple routing tracks in a layer of the electronic design with certain colors. These embodiments color fixed object(s) in the design with one or more of these certain colors based on coloring of the multiple routing tracks. Some embodiments further color movable object(s) based on results of coloring the fixed object(s) or coloring routing track(s). Some embodiments route the physical design with coloring of fixed object(s), coloring of movable object(s), or routing connectivity. Multiple-patterning conflicts may be detected based on the coloring of fixed object(s), coloring of movable object(s), or routing connectivity. Some embodiments route with search-and-repair strategy(ies) to improve or resolve conflict(s). Some embodiments color objects upon their creation, and the layout is thus multiple-patterning design rule clean as constructed.

Abstract: In one embodiment of the invention, a method of analysis of a circuit design with respect to within-die process variation is disclosed to generate a design-specific on chip variation (DS-OCV) de-rating factor. The method includes executing a static timing analysis (STA) in an on-chip variation mode using a process corner library. Collecting timing information of the top N critical timing paths. Executing a statistical static timing analysis (SSTA) on the N critical timing paths using timing models characterized for SSTA with sensitivities of delays to process variables. Compare the two timing results and deriving DS-OCV de-rating factors for the clock/data paths to be used in a STA OCV timing analysis to correctly account for the effects of process variations. A user may select to specify DS-OCV de-rating factors for paths or groups of paths and achieve an accurate timing analysis report in a reduced amount of run-time.

Abstract: In one embodiment of the invention, a method of analysis of a circuit design with respect to within-die process variation is disclosed to generate a design-specific on chip variation (DS-OCV) de-rating factor. The method includes executing a static timing analysis (STA) in an on-chip variation mode using a process corner library. Collecting timing information of the top N critical timing paths. Executing a statistical static timing analysis (SSTA) on the N critical timing paths using timing models characterized for SSTA with sensitivities of delays to process variables. Compare the two timing results and deriving DS-OCV de-rating factors for the clock/data paths to be used in a STA OCV timing analysis to correctly account for the effects of process variations. A user may select to specify DS-OCV de-rating factors for paths or groups of paths and achieve an accurate timing analysis report in a reduced amount of run-time.

Abstract: A system and method for determining the criticality of each timing pin in a circuit design are disclosed. The criticality of a timing pin is the probability that the timing pin is on the path with the worst slack in the circuit design. According to the methodology, the slack for each timing pin is calculated, wherein each slack is a function of a process random variable. Then, the criticality of each timing pin is determined as the probability of the timing pin having the minimum slack among the slacks in an independent critical set of timing pins. The criticality of each timing pin may then be normalized. By determining the criticalities of the timing pins in a circuit design, a circuit design system may be able to more easily identify portions of the circuit design that need modification for timing and other purposes.

Abstract: A method, system, and computer program product are disclosed for performing statistical leakage power characterization to estimate yield of a circuit in terms of leakage power. According to some approaches, this is performed with consideration of state correlation.

Abstract: A method, system, and computer program product are disclosed for performing statistical leakage power characterization to estimate yield of a circuit in terms of leakage power. According to some approaches, this is performed with consideration of bi-exponential modeling.

Abstract: Disclosed are a method, apparatus, and program product for routing an electronic design using double patenting that is correct by construction. The layout that has been routed will by construction be designed to allow successful manufacturing with double patenting, since the router will not allow a routing configuration in the layout that cannot be successfully manufactured with double patterning.

Abstract: A method, system, and computer program product are disclosed for performing statistical leakage power characterization to estimate yield of a circuit in terms of leakage power. According to some approaches, this is performed with consideration of bi-exponential modeling.

Abstract: A method, system, and computer program product are disclosed for performing statistical leakage power characterization to estimate yield of a circuit in terms of leakage power. According to some approaches, this is performed with consideration of state correlation.