Patents by Inventor Venkatacha Parameswaran

Venkatacha Parameswaran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Augmented reactor for chemical vapor deposition of ultra-long carbon nanotubes
    Patent number: 9359207
    Abstract: Apparatus to produce carbon nanotubes (CNTs) of arbitrary length using a chemical vapor deposition (CVD) process reactor furnace is described, where the CNTs are grown axially along a portion of the length of the furnace. The apparatus includes a spindle and a mechanism for rotating the spindle. The spindle located within a constant temperature region of the furnace and operable to collect the CNT around the rotating spindle as the CNT is grown within the furnace.
    Type: Grant
    Filed: March 19, 2014
    Date of Patent: June 7, 2016
    Assignee: The Boeing Company
    Inventors: Keith Daniel Humfeld, Venkatacha Parameswaran
  • AUGMENTED REACTOR FOR CHEMICAL VAPOR DEPOSITION OF ULTRA-LONG CARBON NANOTUBES
    Publication number: 20140212353
    Abstract: Apparatus to produce carbon nanotubes (CNTs) of arbitrary length using a chemical vapor deposition (CVD) process reactor furnace is described, where the CNTs are grown axially along a portion of the length of the furnace. The apparatus includes a spindle and a mechanism for rotating the spindle. The spindle located within a constant temperature region of the furnace and operable to collect the CNT around the rotating spindle as the CNT is grown within the furnace.
    Type: Application
    Filed: March 19, 2014
    Publication date: July 31, 2014
    Applicant: THE BOEING COMPANY
    Inventors: Keith Daniel Humfeld, Venkatacha Parameswaran
  • Augmented reactor for chemical vapor deposition of ultra-long carbon nanotubes
    Patent number: 8715609
    Abstract: Apparatus to produce carbon nanotubes (CNTs) of arbitrary length using a chemical vapor deposition (CVD) process reactor furnace is described, where the CNTs are grown axially along a portion of the length of the furnace. The apparatus includes a spindle and a mechanism for rotating the spindle. The spindle located within a constant temperature region of the furnace and operable to collect the CNT around the rotating spindle as the CNT is grown within the furnace.
    Type: Grant
    Filed: December 14, 2010
    Date of Patent: May 6, 2014
    Assignee: The Boeing Company
    Inventors: Keith Daniel Humfeld, Venkatacha Parameswaran
  • AUGMENTED REACTOR FOR CHEMICAL VAPOR DEPOSITION OF ULTRA-LONG CARBON NANOTUBES
    Publication number: 20120148475
    Abstract: Apparatus to produce carbon nanotubes (CNTs) of arbitrary length using a chemical vapor deposition (CVD) process reactor furnace is described, where the CNTs are grown axially along a portion of the length of the furnace. The apparatus includes a spindle and a mechanism for rotating the spindle. The spindle located within a constant temperature region of the furnace and operable to collect the CNT around the rotating spindle as the CNT is grown within the furnace.
    Type: Application
    Filed: December 14, 2010
    Publication date: June 14, 2012
    Inventors: Keith Daniel Humfeld, Venkatacha Parameswaran