Patents by Inventor Viacheslav PLOTNIKOV

Viacheslav PLOTNIKOV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
    Publication number: 20230326717
    Abstract: Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.
    Type: Application
    Filed: May 24, 2023
    Publication date: October 12, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Leonid DORF, Evgeny KAMENETSKIY, James ROGERS, Olivier LUERE, Rajinder DHINDSA, Viacheslav PLOTNIKOV
  • Feedback loop for controlling a pulsed voltage waveform
    Patent number: 11699572
    Abstract: Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.
    Type: Grant
    Filed: January 22, 2020
    Date of Patent: July 11, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Leonid Dorf, Evgeny Kamenetskiy, James Rogers, Olivier Luere, Rajinder Dhindsa, Viacheslav Plotnikov
  • Apparatus and method of generating a pulsed waveform
    Patent number: 10923321
    Abstract: Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.
    Type: Grant
    Filed: February 13, 2020
    Date of Patent: February 16, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Leonid Dorf, Evgeny Kamenetskiy, James Rogers, Olivier Luere, Rajinder Dhindsa, Viacheslav Plotnikov
  • Apparatus and method of forming plasma using a pulsed waveform
    Patent number: 10916408
    Abstract: Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.
    Type: Grant
    Filed: February 13, 2020
    Date of Patent: February 9, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Leonid Dorf, Evgeny Kamenetskiy, James Rogers, Olivier Luere, Rajinder Dhindsa, Viacheslav Plotnikov
  • Feedback loop for controlling a pulsed voltage waveform
    Publication number: 20200234921
    Abstract: Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.
    Type: Application
    Filed: January 22, 2020
    Publication date: July 23, 2020
    Inventors: Leonid DORF, Evgeny KAMENETSKIY, James ROGERS, Olivier LUERE, Rajinder DHINDSA, Viacheslav PLOTNIKOV
  • APPARATUS AND METHOD OF GENERATING A PULSED WAVEFORM
    Publication number: 20200234922
    Abstract: Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.
    Type: Application
    Filed: February 13, 2020
    Publication date: July 23, 2020
    Inventors: Leonid DORF, Evgeny KAMENETSKIY, James ROGERS, Olivier LUERE, Rajinder DHINDSA, Viacheslav PLOTNIKOV
  • APPARATUS AND METHOD OF FORMING PLASMA USING A PULSED WAVEFORM
    Publication number: 20200234923
    Abstract: Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.
    Type: Application
    Filed: February 13, 2020
    Publication date: July 23, 2020
    Inventors: Leonid DORF, Evgeny KAMENETSKIY, James ROGERS, Olivier LUERE, Rajinder DHINDSA, Viacheslav PLOTNIKOV