Patents by Inventor Victor E. Hauser, Jr.

Victor E. Hauser, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of coating semiconductor substrates
    Patent number: 4142004
    Abstract: A low-temperature, high-pressure, medium-power process, which utilizes a radio frequency powered radial flow reactor, utilizes only silane and ammonia as the reactant gases for deposition. The methods disclosed result in the deposition on semiconductor wafers of moderately high density silicon-nitrogen films which have low tensile stress and good crack resistance. In addition, these films provide good step coverage, good scratch resistance, and an inert barrier to sodium and moisture.
    Type: Grant
    Filed: January 22, 1976
    Date of Patent: February 27, 1979
    Assignee: Bell Telephone Laboratories, Incorporated
    Inventors: Victor E. Hauser, Jr., Ashok K. Sinha
  • Radial flow reactor including glow discharge limitting shield
    Patent number: RE30244
    Abstract: An improved radio frequency (rf) powered radial flow cylindrical reactor utilizes a gas shield which substantially limits the glow plasma discharge reaction to a section of the reactor over the semiconductor substrates which are to be coated. The gas shield permits the use of higher rf input power which contributes to the formation of protective films that have desirable physical and electrical characteristics.
    Type: Grant
    Filed: September 28, 1978
    Date of Patent: April 1, 1980
    Assignee: Bell Telephone Laboratories, Incorporated
    Inventors: Frank B. Alexander, Jr., Cesar D. Capio, Victor E. Hauser, Jr., Hyman J. Levinstein, Cyril J. Mogab, Ashok K. Sinha, Richard S. Wagner