Patents by Inventor Vijayalakshmi SESHACHALAM

Vijayalakshmi SESHACHALAM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140346648
    Abstract: A low-K nitride film and a method of making are disclosed. Embodiments include forming a nitride film on a substrate by plasma enhanced chemical vapor deposition (PECVD) and periodically fluctuating a production of radicals during the PECVD based, at least in part, on plural cycles of a radiofrequency (RF) induced plasma.
    Type: Application
    Filed: May 23, 2013
    Publication date: November 27, 2014
    Applicant: GLOBALFOUNDRIES INC.
    Inventors: Huy CAO, Huang LIU, Vijayalakshmi SESHACHALAM