Patents by Inventor Vincent Martin Rotello

Vincent Martin Rotello has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7846642
    Abstract: Disclosed herein is a method for generating a three-dimensional structure on a surface. The method comprises forming a layer comprising a plurality of nanoparticles on a surface; and exposing a portion of the layer to incident radiation having a defined pattern at a dosage effective to aggregate the nanoparticles in the exposed portion of the layer into a three-dimensional structure, wherein the three-dimensional structure has a shape defined by the pattern of the radiation and a height defined by the dosage of the incident radiation and a thickness of the nanoparticle layer. Alternatively, the method comprises forming a layer comprising a plurality of nanoparticles on a surface of a three-dimensional template; and exposing at least a portion of the layer to incident radiation at a dosage effective to aggregate the nanoparticles in the exposed portion of the layer into a three-dimensional structure that corresponds to the three-dimensional template.
    Type: Grant
    Filed: August 18, 2008
    Date of Patent: December 7, 2010
    Assignee: The University of Massachusetts
    Inventors: Yuval Ofir, Vincent Martin Rotello, Mark Thomas Tuominen, Qijun Xiao, Bappaditya Samanta
  • Publication number: 20090264317
    Abstract: Disclosed is a method comprising disposing a functionalized patternable material on a substrate, wherein the functionalized patternable material comprises a first click chemical moiety; patterning the functionalized patternable material; and reacting the first click chemical moiety with a complementary reactant to form an functionalized patterned surface, the complementary reactant comprising a second click chemical moiety that reacts with the first click chemical moiety; the complementary reactant comprising an functional group.
    Type: Application
    Filed: April 9, 2009
    Publication date: October 22, 2009
    Applicant: UNIVERSITY OF MASSACHUSETTS
    Inventors: Yuval Ofir, Vincent Martin Rotello, Brian John Jordan, Kenneth Raymond Carter
  • Publication number: 20090047485
    Abstract: Disclosed herein is a method for generating a three-dimensional structure on a surface. The method comprises forming a layer comprising a plurality of nanoparticles on a surface; and exposing a portion of the layer to incident radiation having a defined pattern at a dosage effective to aggregate the nanoparticles in the exposed portion of the layer into a three-dimensional structure, wherein the three-dimensional structure has a shape defined by the pattern of the radiation and a height defined by the dosage of the incident radiation and a thickness of the nanoparticle layer. Alternatively, the method comprises forming a layer comprising a plurality of nanoparticles on a surface of a three-dimensional template; and exposing at least a portion of the layer to incident radiation at a dosage effective to aggregate the nanoparticles in the exposed portion of the layer into a three-dimensional structure that corresponds to the three-dimensional template.
    Type: Application
    Filed: August 18, 2008
    Publication date: February 19, 2009
    Inventors: Yuval Ofir, Vincent Martin Rotello, Mark Thomas Tuominen, Qijun Xiao, Bappaditya Samanta