Abstract: Embodiments described herein generally relate to a method of updating a software routine with subprograms and subroutines that can be accessed by an end user on an as-needed basis. In one embodiment, a method of providing a control function for a semiconductor process to a pre-existing software architecture is described. The method includes providing a plug-in to the pre-existing software architecture, providing an upgrade library file having the control function therein, and uploading the upgrade library file to the pre-existing software architecture at the plug-in to facilitate process control of the semiconductor process.

Abstract: Aspects of the present invention include methods and apparatuses that may be used for monitoring substrate processing systems. One embodiment may provide an apparatus for obtaining in-situ data regarding processing of a substrate in a substrate processing chamber, comprising a data collecting assembly for acquiring training data related to a substrate disposed in a processing chamber, an electromagnetic radiation source, at least one in-situ metrology module to provide measurement data, and a computer, wherein the computer includes a neural network software, wherein the neural network software is adapted to model a relationship between the plurality of the training and other data related to substrate processing.