Patents by Inventor Volker Heydemann

Volker Heydemann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing process for producing damage free surfaces on semi-insulating silicon carbide wafers
    Publication number: 20060108325
    Abstract: A polishing mixture and related method of polishing a material wafer surface, such as silicon carbide, are disclosed. The polishing mixture comprises; an abrasive and an oxidizer mixed in an acidic solution. Alumina may be used as the abrasive and the polishing mixture may have a pH less than or equal to seven (7).
    Type: Application
    Filed: November 14, 2005
    Publication date: May 25, 2006
    Inventors: William Everson, David Snyder, Richard Gamble, Volker Heydemann