Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt corrosion inhibitor, (c) a cobalt dishing control agent, wherein the cobalt dishing control agent comprises an anionic head group and a C13-C20 aliphatic tail group, (d) an oxidizing agent that oxidizes cobalt, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.

Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt accelerator selected from a compound having the formula: NR1R2R3 wherein R1, R2, and R3 are independently selected from hydrogen, carboxyalkyl, substituted carboxyalkyl, hydroxyalkyl, substituted hydroxyalkyl and aminocarbonylalkyl, wherein none or one of R1, R2, and R3 are hydrogen; dicarboxyheterocycles; heterocyclylalkyl-?-amino acids; N-(amidoalkyl)amino acids; unsubstituted heterocycles; alkyl-substituted heterocycles; substituted-alkyl-substituted heterocycles; N-aminoalkyl-?-amino acids; and combinations thereof, (c) a cobalt corrosion inhibitor, (d) an oxidizing agent that oxidizes a metal, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.

Abstract: Disclosed is a method of chemically-mechanically polishing a substrate. The method comprises, consists of, or consists essentially of (a) contacting a substrate containing a low-k dielectric composition, which includes less than about 80% by weight of carbon, with a polishing pad and a chemical-mechanical polishing composition comprising water and abrasive particles having a positive surface charge, wherein the polishing composition has a pH of from about 3 to about 6; (b) moving the polishing pad and the chemical-mechanical polishing composition relative to the substrate; and (c) abrading at least a portion of the substrate to polish the substrate. In some embodiments, the low-k dielectric composition is carbon-doped silicon oxide.

Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt accelerator selected from a compound having the formula: NR1R2R3 wherein R1, R2, and R3 are independently selected from hydrogen, carboxyalkyl, substituted carboxyalkyl, hydroxyalkyl, substituted hydroxyalkyl and aminocarbonylalkyl, wherein none or one of R1, R2, and R3 are hydrogen; dicarboxyheterocycles; heterocyclylalkyl-?-amino acids; N-(amidoalkyl)amino acids; unsubstituted heterocycles; alkyl-substituted heterocycles; substituted-alkyl-substituted heterocycles; N-aminoalkyl-?-amino acids; and combinations thereof, (c) a cobalt corrosion inhibitor, (d) an oxidizing agent that oxidizes a metal, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.

Abstract: A guidance, navigation and control (GNC) system guides an aircraft based on a special partial differential equation (PDE). The system does not depend on a predetermined desired flight path. To overcome effects of unpredictable wind speed and direction, systems and methods effectively repeatedly determine the worst landing the wind can cause and issue flight control commands that minimize among these worst outcomes. A function C that satisfies the PDE calculates smallest miss distance a guidance system can bring about by appropriately steering an aircraft, given the aircraft's current heading, current location relative to a target and current remaining amount of time to fly. The system repeatedly determines at least a component of a current gradient of the function C. A value of the gradient component is used to select an appropriate flight control command, such as turn left or turn right.

Abstract: The present invention provides a waste receptacle comprising an outer bag having a flexible construction forming an opening at a top side and at least a pair of upper straps capable a third strap for retaining peripheral items, of attaching the receptacle to a rail, a lid attached at a top of bag to close the opening. The receptacle having an inner bag having a backbone circumferentially disposed around the inner bag to help maintain the inner bag in a generally cylindrical shape, the inner bag insertable through the opening of the outer bag and a pull string to disposed at the top of the inner bag being capable to cinch the top of the inner bag closed and a buoyant float member disposed in the outer bag.

Abstract: The invention provides a chemical-mechanical polishing composition that contains (a) abrasive particles, (b) an azole compound having an octanol-water log P of about 1 to about 2, (c) a cobalt corrosion inhibitor, wherein the cobalt corrosion inhibitor comprises an anionic head group and a C8-C14 aliphatic tail group, (d) a cobalt accelerator, (e) an oxidizing agent that oxidizes cobalt, and (f) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.

Abstract: A guidance, navigation and control (GNC) system guides an aircraft based on a special partial differential equation (PDE). The system does not depend on a predetermined desired flight path. To overcome effects of unpredictable wind speed and direction, systems and methods effectively repeatedly determine the worst landing the wind can cause and issue flight control commands that minimize among these worst outcomes. A function C that satisfies the PDE calculates smallest miss distance a guidance system can bring about by appropriately steering an aircraft, given the aircraft's current heading, current location relative to a target and current remaining amount of time to fly. The system repeatedly determines at least a component of a current gradient of the function C. A value of the gradient component is used to select an appropriate flight control command, such as turn left or turn right.

Abstract: An embodiment includes a system for controlling blade pitch in a rotorcraft having an engine; a drive shaft with a first end and a second end and connected at the first end to the engine; a rotor with two or more blades connected to the second end of the drive shaft; and one or more actuators positioned adjacent to the rotor blades operable to change a blade pitch of the rotor blades.

Abstract: A shelfless sliding and removable cup holder assembly for a vehicle includes a console structure disposed within the vehicle. The console structure includes first and second lateral side walls defining a storage bin therebetween. The first lateral side wall defines a recessed track. The cup holder assembly further includes cup holder member slidably and removably mounted within the console structure. The cup holder member has a guide removably received in the recess track and slidably movable along the recessed track.

Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt accelerator selected from a compound having the formula: NR1R2R3 wherein R1, R2, and R3 are independently selected from hydrogen, carboxyalkyl, substituted carboxyalkyl, hydroxyalkyl, substituted hydroxyalkyl and aminocarbonylalkyl, wherein none or one of R1, R2, and R3 are hydrogen; dicarboxyheterocycles; heterocyclylalkyl-?-amino acids; N-(amidoalkyl)amino acids; unsubstituted heterocycles; alkyl-substituted heterocycles; substituted-alkyl-substituted heterocycles; N-aminoalkyl-?-amino acids; and combinations thereof, (c) a cobalt corrosion inhibitor, (d) an oxidizing agent that oxidizes a metal, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.

Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt corrosion inhibitor, (c) a cobalt dishing control agent, wherein the cobalt dishing control agent comprises an anionic head group and a C13-C20 aliphatic tail group, (d) an oxidizing agent that oxidizes cobalt, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.

Abstract: The invention provides methods of inhibiting corrosion of a substrate containing metal. The substrate can be in any suitable form. In some embodiments, the metal is cobalt. The methods can be used with semiconductor wafers in some embodiments. The invention also provides chemical-mechanical polishing compositions and methods of polishing a substrate. A corrosion inhibitor can be used in the methods and compositions disclosed herein. The inhibitor comprises an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, an amino acid derivative, a phosphate ester, an isethionate, a sulfate, a sulfosuccinate, a sulfocinnimate, or any combination thereof.

Abstract: The present invention provides a waste receptacle comprising an outer bag having a flexible construction forming an opening at a top side and at least a pair of upper straps capable of attaching the receptacle to a rail, a lid attached at a top of bag to close the opening. The receptacle having an inner bag having a backbone circumferentially disposed around the inner bag to help maintain the inner bag in a generally cylindrical shape, the inner bag insertable through the opening of the outer bag and a pull string to disposed at the top of the inner bag being capable to cinch the top of the inner bag closed and a bouyant float member disposed in the outer bag.

Abstract: A shelfless sliding and removable cup holder assembly for a vehicle includes a console structure disposed within the vehicle. The console structure includes first and second lateral side walls defining a storage bin therebetween. The first lateral side wall defines a recessed track. The cup holder assembly further includes cup holder member slidably and removably mounted within the console structure. The cup holder member has a guide removably received in the recess track and slidably movable along the recessed track.

Abstract: A removable wavemaker having a self-supporting structure for use in a wave tank has an integrated mounting structure for mounting on a frame of an open top of the wave tank, a linear motor positioned above a waterline in the wave tank having a forcer containing activation coils that is driven in reciprocation motion by electromagnetic interaction with an array of permanent magnets contained in a tubular support structure on which the forcer is configured to slide, and a vertically-oriented wave board mounted on a lower part of the integrated mounting structure below the waterline for generating waves within the wave tank. The forcer is supported on a movable carriage that rides on a rail fixed to the integrated mounting structure and is coupled to the wave board.

Abstract: Apparatus and methods for eliminating back drive in a push pull type control system, are provided. An exemplary apparatus includes a control rod including a pair of spaced apart piston displacement members each configured to carry a check valve. The apparatus also includes a pair of opposite-face check valves each configured to seal against respective opposing face of a piston head to form a hydraulic lock, preventing back drive in the control system.

Abstract: According to some embodiments, the present invention provides a system and method for supporting a carbon nanotube array that involve an entangled carbon nanotube mat integral with the array, where the mat is embedded in an embedding material. The embedding material may be depositable on a carbon nanotube. A depositable material may be metallic or nonmetallic. The embedding material may be an adhesive material. The adhesive material may optionally be mixed with a metal powder. The embedding material may be supported by a substrate or self-supportive. The embedding material may be conductive or nonconductive. The system and method provide superior mechanical and, when applicable, electrical, contact between the carbon nanotubes in the array and the embedding material. The optional use of a conductive material for the embedding material provides a mechanism useful for integration of carbon nanotube arrays into electronic devices.

Abstract: A coated fiber cement article in the form of an unattached fiber cement board roofing tile or roofing slate substrate having a first major surface at least a portion of which is covered with a crush resistant final topcoat composition comprising a multistage latex polymer.