Abstract: Systems and methods are disclosed by which patterns of various materials can be formed on flexible substrates by a continuous roll-to-roll manufacturing process. The patterns may include metallic, transparent conductive, or non-metallic elements with lateral dimensions including in the range from below 100 nanometers to millimeters and with thickness dimensions including the range from tens of Angstroms to greater than 10,000 Angstroms. The substrate may be any material capable of sufficient flexibility for compatibility with roll-based processing equipment, including polymeric films, metallic foils, and thin glass, with polymeric films representing a particularly broad field of application. Methods may include the continuous roll-to-roll formation of a temporary polymeric structure with selected areas open to the underlying substrate, the continuous addition or subtraction of constituent materials, and the continuous removal, where necessary, of the polymeric structure and any excess material.

Abstract: Means, apparatus, systems, and/or methods are described for forming improved rigid or flexible semi-transparent imprinting templates. These templates can be used to produce patterning masks having improved resolution that do not require plasma etching for residue removal. The methods and apparatus are compatible with roll-to-roll manufacturing processes and enable roll-to-roll formation of a wide range of metal patterned films.

Abstract: Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrodeposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.

Abstract: Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrode-position cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.

Abstract: Durable replication tools are disclosed for replication of relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including recording and developing a relief pattern on a selected surface of a support cylinder, creating a durable layer with a complementary relief replica of the pattern, separating the durable layer from the support cylinder. Apparatus are disclosed for fabricating such replication tools, including systems and apparatus for recording a desired relief pattern on a surface of a support cylinder. Also disclosed are electro deposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.

Abstract: The invention relates to an integrated solar cell which includes a plasmonic layer which includes a pattern configured to support plasmon waves, The plasmonic layer is configured to receive as input light energy of an incident light and at least one photon of light received from one or more layers in optical communication with the plasmonic layer and to re-emit as output a guided light to the one or more layers in optical communication with the plasmonic layer. A wavelength conversion layer is configured to receive as input at least one photon having a first wavelength and to provide as output at least one photon having a second wavelength different than the first wavelength. A photovoltaic layer is optically coupled to both the wavelength conversion layer and the plasmonic layer, the photovoltaic layer configured to convert at least one photon having the second wavelength to electrical energy.

Abstract: The invention relates to an integrated film which includes a plasmonic layer including a pattern configured to support plasmon waves. The plasmonic layer is configured to receive as input light energy of an incident light including at least one photon having a first wavelength and an at least one photon of light received from one or more layers in optical communication with the plasmonic layer and to re-emit as output a guided light to the one or more layers in optical communication with the plasmonic layer. The integrated film also includes a wavelength conversion layer optically coupled to the plasmonic layer. The wavelength conversion layer is configured to receive as input the at least one photon having a first wavelength and to provide as output at least one photon having a second wavelength different than the first wave length.

Abstract: Durable replication tools are disclosed for replication of relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including recording and developing a relief pattern on a selected surface of a support cylinder, creating a durable layer with a complementary relief replica of the pattern, separating the durable layer from the support cylinder. Apparatus are disclosed for fabricating such replication tools, including systems and apparatus for recording a desired relief pattern on a surface of a support cylinder. Also disclosed are electro deposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.

Abstract: An aspect of the present disclosure provides for a quarter-wave retarder film that is overlaid onto a linearly-polarized stereoscopic image pair in an appropriate orientation in order to produce an image that is viewable using circularly polarized viewing glasses for increased viewing comfort and head-tilt resistance. Another aspect of the present disclosure enables the production of StereoJet-type ink jet images through the use of two separate single-sided clear polarizer substrates with the stretch orientation parallel to the running edge of the support layer. A further aspect of the present disclosure is directed to the production of laminated stereoscopic images in which the spacing of the image planes of the members of the image pair can be made in close proximity, farther proximity, or at an intermediate proximity to achieve desired optical, mechanical and/or visual results.

Abstract: Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrodeposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.

Abstract: Techniques are described for improving the quality and yield of vacuum-processed substrates. A system can include a tape-like substrate that is supplied by unwind spool to a web guide, tension control roller, and additional idler rolls. The substrate can then enter a coating zone, following an essentially spiral pathway and traversing the coating source a number of times before exiting the coating zone and rewinding on spool. The effect of multiple passes through various flux areas of source is to smooth and average out the coating thickness non-uniformities resulting from a non-uniform flux. Related methods are described. Embodiments can be particularly well suited for the manufacture of data tapes including, but not limited to, metal evaporated magnetic, magneto-optical, phase change optical, and preformatted, or thin-film electronics, sensors, RFID tags, and solar films, to name a few examples.

Abstract: Techniques are described for fabricating multilayer structures having arrays of conducting elements or apertures in a conductive grid which can be used to form frequency selective surfaces (FSSs), antenna arrays and the like on flexible substrates. Fabrication techniques can include use of a polymer mask or direct dielectric molding. In embodiments utilizing a polymer mask, a temporary 3D polymeric relief pattern is formed on a substrate and used as a mask or stencil to form the desired pattern elements. In an additive process, the conductive material is deposited over the masked surface. Deposition can be followed by mask removal In the subtractive process, the conductive layer can be deposited prior to formation of the polymer mask, and the exposed parts of the underlying conductive layer can be etched. Other embodiments utilize dielectric molding in which the molded structure itself becomes an integral and permanent part of the FSS structure.

Abstract: Systems and methods are disclosed by which patterns of various materials can be formed on flexible substrates by a continuous roll-to-roll manufacturing process. The patterns may include metallic, transparent conductive, or non-metallic elements with lateral dimensions including in the range from below 100 nanometers to millimeters and with thickness dimensions including the range from tens of Angstroms to greater than 10,000 Angstroms. The substrate may be any material capable of sufficient flexibility for compatibility with roll-based processing equipment, including polymeric films, metallic foils, and thin glass, with polymeric films representing a particularly broad field of application. Methods may include the continuous roll-to-roll formation of a temporary polymeric structure with selected areas open to the underlying substrate, the continuous addition or subtraction of constituent materials, and the continuous removal, where necessary, of the polymeric structure and any excess material.

Abstract: Systems, methods, and apparatus are disclosed for making patterning tools from one or more discrete elements. Such tools can have one or more “seams” or joints where the individual elements abut which can limit the tools' performance and utility in roll-to-roll manufacturing. Methods are described herein for producing “near-seamless” tools, that is, tools having seams that exhibit minimum disruption of the tool pattern and thus improved material produced by such tools. The patterning tools can be cylindrical and/or closed in shape.

Abstract: A pre-formatted optical data storage tape (10) including an elongated linear polymer layer having at least one pattern of optically readable embossments (114) on at least one surface of the polymer layer, and an optical recording layer covering the pattern of optically readable embossments (114) of the elongated linear polymer layer, wherein the optical recording layer is adapted such that recorded marks (120) may be made in the recording layer by directing a focused source of energy into the recording layer.

Abstract: An apparatus for manufacturing pre-formatted linear optical data storage media including an elongated linear polymer layer. The apparatus includes a drum mounted for rotation about a rotation axis, and the drum includes a circumferential outer surface having a predetermined pattern of protrusions for embossing at least one pattern of optically readable embossments in the elongated linear polymer layer as the layer is rolled on the drum. The apparatus also includes a thermal radiation source positioned adjacent the drum for heating the embossments of the elongated linear polymer layer prior to the layer being removed from the protrusions of the outer surface of the drum.