Patents by Inventor Wai Yip Kwok

Wai Yip Kwok has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of repairing a photolithographic mask
    Publication number: 20080057410
    Abstract: A method is described for repairing a defect detected in a photolithographic mask. A phase voxel cavity is formed in the photolithographic mask to compensate for the defect in the photolithographic mask. The phase voxel cavity and features of the mask both create a phase shift of approximately ?.
    Type: Application
    Filed: August 31, 2006
    Publication date: March 6, 2008
    Inventors: Wen-Hao Cheng, Jeffrey N. Farnsworth, Rajesh Nagpal, Eric A. Frendberg, Wai Yip Kwok