Patents by Inventor Walter A. Wolk

Walter A. Wolk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Copper-based metal polishing compositions and polishing processes
    Publication number: 20070218692
    Abstract: A copper-based metal polishing composition includes abrasive particles, a borate, an oxidizing agent, and water. A process for polishing a semiconductor substrate includes positioning the semiconductor substrate; polishing the positioned semiconductor substrate with a first polishing composition including abrasive particles, an ammonium borate, an oxidizing agent, and water, and having a pH of from 6.5 to 9; and further polishing the polished semiconductor substrate with a second polishing composition including abrasive particles, a potassium borate, an oxidizing agent, and water, and having a pH of from 7 to 10.
    Type: Application
    Filed: July 19, 2006
    Publication date: September 20, 2007
    Applicant: Nissan Chemical Industries, Ltd.
    Inventors: Jonathan J. Wolk, Walter A. Wolk