Abstract: A system for moving and processing workpieces includes individual stations isolated from one another and from a main chamber by seals formed by a transport mechanism. Workpieces are moved in a queue in a circular pattern, by a dial turret operated by a bell-crank and a Geneva mechanism. Stations seal to the baseplate from below, and a vacuum chamber encloses the turret assembly which operates on a post through a center hole in the baseplate. Workpieces loaded to one depended chamber are withdrawn from chambers and inserted into next chambers in a circular pattern, passing through the main chamber with each transfer, and ending back in the chamber where they were loaded. In an alternative embodiment passages between the main chamber and each individual chamber have valves allowing processing to take place without carriers attached to the turret being in the processing chambers.

Abstract: A substrate having two parallel planar faces and an edge with a groove is simultaneously coated on both sides in a vacuum chamber. The substrate is raised, lowered and held on edge while the parallel faces are vertically disposed by a blade inserted into the groove so that while the substrate is coated an unobstructed path exists for the coating material to the faces.

Abstract: A novel magnetron sputter coating source is disclosed in which magnetic sputter targets containing relatively large inventories of usable material may be employed. This coating source may also be used efficiently and effectively with sputter target materials having properties which range from nonmagnetic to highly ferromagnetic. Use of an electromagnetic coil with a widely adjustable energizing current, rather than permanent magnets, allows a wide range of magnetic properties to be accommodated. Electrical impedance of the glow discharge is readily controlled using the current flow through the electromagnetic coil, allowing, for example, operation at desired values of voltage and current throughout the life of the sputter target. In addition, a momentary increase in electromagnet coil current can be used to achieve ignition of the glow discharge at a desired sputter gas operating pressure which is below the sputter gas pressure at which the glow discharge can normally be readily ignited.

Abstract: A system for handling and individually processing a plurality of thin substrates is described. The system includes a main chamber, entrance and exit load locks, a plurality of processing stations, a load lock load/unload means, a vertical transport means, and a horizontal transport means. In one embodiment the processing stations are deployed in a U-shaped configuration, allowing the entrance and exit load locks to be positioned at the same end of the machine. Idle stations between processing stations may also be employed. The substrates are vertically oriented and are raised and lowered into and out of load locks and processing stations by means of dedicated lift blades. Substrates are transferred within the main chamber from lift blades of one station to lift blades of an adjacent station by means of substrate carriers affixed to a walking beam mechanism.

Abstract: Relatively wide workpieces, such as auto grilles, are rapidly conveyed into and from a vacuum processing chamber provided with entry and exit air locks and vacuum isolation valves, in which thin metallic coatings are deposited uniformly over workpiece surfaces. The gate member of the valve is supported for sliding vertical movement, as well as limited outward and inward movement for sealing the chamber opening, at the protruding ends of an elongated member backing the gate. Air cylinders act directly on these ends to close the gate. A linkage and air cylinder above the gate vertically propels the gate. The processing chamber is provided with several side by side arrays of sputtering sources with circular cathodes, the workpieces moving thereunder at a steady rate orthogonally to the arrays.